Surface Modification of Thin Film using Trimethylchlorosilane Vaporization Treatment

  • 발행 : 2007.08.27

초록

We introduce non-contact surface modification using trimethylchlorosilane (TMCS) for thin film transistor application. The surface is not contacted to the TMCS solution because it is vaporized at room temperature. The hydrophobic surface with contact angle $of\;{\sim}\;70^{\circ}$ can be achieved by the transfer of TMCS using a PDMS mold.

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