한국정보디스플레이학회:학술대회논문집
- 2007.08a
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- Pages.900-903
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- 2007
Surface Modification of Thin Film using Trimethylchlorosilane Vaporization Treatment
- Choo, Byoung-Kwon (Dept. of Information Display, Kyung Hee University) ;
- Kim, Ki-Hwan (Dept. of Information Display, Kyung Hee University) ;
- Song, Na-Young (Dept. of Information Display, Kyung Hee University) ;
- Choi, Jung-Su (Dept. of Physics, Kyung Hee University) ;
- Park, Kyu-Chang (Dept. of Information Display, Kyung Hee University) ;
- Ang, Jin (Dept. of Information Display, Kyung Hee University) ;
- Kim, Jin-Ook (R & D Center, LG.Philips LCD) ;
- Nam, Yeon-Heui (R & D Center, LG.Philips LCD) ;
- Chae, Gi-Sung (R & D Center, LG.Philips LCD) ;
- Chung, In-Jae (R & D Center, LG.Philips LCD)
- Published : 2007.08.27
Abstract
We introduce non-contact surface modification using trimethylchlorosilane (TMCS) for thin film transistor application. The surface is not contacted to the TMCS solution because it is vaporized at room temperature. The hydrophobic surface with contact angle
Keywords
- surface modification;
- vapor treatment;
- trimethylchlorosilane;
- surface energy;
- self assembly monolayer