한국정보디스플레이학회:학술대회논문집

The Korean Infomation Display Society (한국정보디스플레이학회)
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Characteristics of directly sputtered AI cathode film using twin target sputtering system for OLEDs

  • Moon, Jong-Min (Department of Information and Nano-Materials Engineering, Kumoh National Institute of Technology) ;
  • Lee, Sang-Hyeon (Core Technology Innovation Team) ;
  • Kim, Han-Ki (Department of Information and Nano-Materials Engineering, Kumoh National Institute of Technology)
  • Published : 2007.08.27
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Abstract

Characteristics of Al cathode films deposited by using specially designed twin target sputter (TTS) system were investigated. It was found that Al cathode films prepared by TTS were amorphous structure with nanocrystallines due to low substrate temperature and OLEDs fabricated using TTS system have low leakage current density at reverse bias because of effective confinement of energetic particles during sputtering process.

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