저밀도 이광자 광중합 영역을 이용한 30 nm 이하의 패턴제작

Fabrication of sub-30 nm nanofibers using weakly two-photon induced photopolymerized region

Experimental studies on the fabrication of sub-30 nm nanofibers using weakly two-photon induced photopolymerized region have been carried out. For the generation of nanofibers inside or outside microstructures, an over-polymerizing method involving a long exposure technique (LET) was proposed. Such nanofibers can find meaningful applications as bio-filters, mixers, and many other uses in diverse research field. A multitude of nanofibers with a notably high resolution (about 22 nm) in two-photon polymerization was achieved using the LET. Furthermore, it was demonstrated that the LET can be employed for the direct fabrication of various embossing patterns by controlling the exposure duration and the interval between voxels. Thin interconnecting networks are formed regularly in the boundary of the over-polymerized region, which allows for the creation of various pattern shapes. Overall of this work, some patterns including nanofibers are fabricated by the LET.