• 제목/요약/키워드: 이광자 광중합

검색결과 17건 처리시간 0.021초

저밀도 이광자 광중합 영역을 이용한 30 nm 이하의 패턴제작 (Fabrication of sub-30 nm nanofibers using weakly two-photon induced photopolymerized region)

  • 박상후;임태우;양동열
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2007년도 춘계학술대회A
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    • pp.1249-1253
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    • 2007
  • Experimental studies on the fabrication of sub-30 nm nanofibers using weakly two-photon induced photopolymerized region have been carried out. For the generation of nanofibers inside or outside microstructures, an over-polymerizing method involving a long exposure technique (LET) was proposed. Such nanofibers can find meaningful applications as bio-filters, mixers, and many other uses in diverse research field. A multitude of nanofibers with a notably high resolution (about 22 nm) in two-photon polymerization was achieved using the LET. Furthermore, it was demonstrated that the LET can be employed for the direct fabrication of various embossing patterns by controlling the exposure duration and the interval between voxels. Thin interconnecting networks are formed regularly in the boundary of the over-polymerized region, which allows for the creation of various pattern shapes. Overall of this work, some patterns including nanofibers are fabricated by the LET.

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저밀도 이광자 광중합 영역의 중첩방법을 이용한 기능성 마이크로 채널 제작에 관한 연구 (Fabrication of Microchannels Having Sub-30 nm Nanofibers Inside of Them via Overlapping Weakly Two-Photon Polymerized Region)

  • 박상후;임태우;양동열
    • 대한기계학회논문집A
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    • 제31권12호
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    • pp.1144-1149
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    • 2007
  • Experimental studies on the fabrication of sub-30 nm nanofibers using weakly two-photon induced photopolymerized region have been carried out. For the generation of nanofibers inside or outside microstructures, an over-polymerizing method involving a long exposure technique (LET) was proposed. Such nanofibers can find meaningful applications as bio-filters, mixers, and many other uses in diverse research field. A multitude of nanofibers with a notably high resolution (about 22 nm) in two-photon polymerization was achieved using the LET. Furthermore, it was demonstrated that the LET can be employed for the direct fabrication of various embossing patterns by controlling the exposure duration and the interval between yokels. Thin interconnecting networks are formed regularly in the boundary of the over-polymerized region, which allows for the creation of various pattern shapes. Overall of this work, some patterns including nanofibers are fabricated by the LET.

긴 레이저 조사방식에 의한 저밀도 이광자 광중합 영역을 이용한 Sub-100nm 정밀도의 엠보싱 패턴제작 (Fabrication of Sub-100 nm Embossing Patterns using Weakly-Polymerized Region via Long-Exposure Technique (LET) in Two-Photon Polymerization)

  • 박상후;임태우;양동열
    • 한국정밀공학회지
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    • 제24권1호
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    • pp.64-70
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    • 2007
  • A long-exposing technique (LET) has been conducted to create nanoscale patterns applicable to diverse micro-devices using two-photon polymerization (TPP). By the weakly-polymerized region via the LET, double-layered embossing patterns can be fabricated simply in a single step. The LET makes possible a voxel and its surrounding to be fully grown into more than 500 nm in lateral size and weakly-polymerized region (WPR), respectively. In the WPR. interconnecting ribs between voxels are generated, and they lead to the creation of double-layered dot patterns. Moreover, by controlling the distance between voxels, various shapes of interconnecting rib can be fabricated when the LET is applied. Various embossing patterns were fabricated to evaluate the usefulness of the proposed technique as a novel nanopatterning technique in TPP.

이광자흡수 광중합현상에서 3차원 미세구조의 제작 (3D Micro-fabrication with Two-Photon Absorption Photopolymerization)

  • 강보영;우정원;이광섭;이범구
    • 한국광학회:학술대회논문집
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    • 한국광학회 2003년도 하계학술발표회
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    • pp.162-163
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    • 2003
  • 이광자흡수는 Χ$^{(3)}$ 의 허수부로 표현되는 3차 비선형 흡수 효과로, 이광자 흡수확률은 입사빛 세기의 제곱에 비례한다. 특수한 단량체 분자들은 이광자흡수를 통해 빛을 흡수하여 중합과정의 에너지원으로 사용한다. 이 때 에너지의 threshold가 있으므로 초점 부근에서만 반응이 일어나게 되어, 이광자흡수를 통한 광중합과정은 회절효율 한계를 벗어난 미세구조 제작에 응용된다. 또 긴 파장의 빛을 이용하므로 입사 빛이 시료에 깊이 침투하여 3차원 구조제작, 3차원 data 저장 등의 분야에서 높은 응용성을 지닌다. (중략)

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이광자 흡수 광중합에 의한 3차원 마이크로 쉘 구조물 제작 (Fabrication of Three-Dimensional Micro-Shell Structures Using Two-Photon Polymerization)

  • 박상후;임태우;양동열
    • 대한기계학회논문집A
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    • 제29권7호
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    • pp.998-1004
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    • 2005
  • A nano-stereolithography (NSL) process has been developed for fabrication of 3D shell structures which can be applied to various nano/micro-fluidic devices. By the process, a complicated 3D shell structure on a scale of several microns can be fabricated using lamination of layers with a resolution of 150 nm in size, so it does not require the use of my sacrificial layer or any supporting structure. A layer was fabricated by means of solidifying liquid-state monomers using two-photon absorption (TPA) induced using a femtosecond laser processing. When the polymerization process is finished, unsolidified liquid state resins can be removed easily by dropping several droplets of ethanol fur developing the fabricated structure. Through this work, some 3D shell structures, which can be applied to various applications such as nano/micro-fluidic devices and MEMS system, were fabricated using the developed process.

이광자 광중합의 윤곽선 스캐닝법에 의한 마이크로 입체형상 제작 (Fabrication of Microstructures Using Double Contour Scanning (DCS) Method by Two-Photon Polymerization)

  • 박상후;임태우;이상호;양동열;공흥진;이광섭
    • 폴리머
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    • 제29권2호
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    • pp.146-150
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    • 2005
  • 본 연구는 수십 마이크로미터 크기의 임의의 3차원 형상제작을 위한 이광자 광중합에 의한 나노 입체 리소그래피(nano-stereolithography) 공정개발에 관한 것이다. 본 연구에서 제안한 공정은 3차원 CAD 파일을 이용하여 형상의 윤곽선을 고화시켜서 연속적으로 적층하여 구조물을 제작하는 공정으로 기존의 리소그래피 공정과 달리 복잡한 형상제작이 가능하다. 형상제작은 펨토초 레이저를 이용하여 이광자 흡수 색소가 첨가된 아크릴레이트 계열의 단량체에 이광자 중합반응으로 제작하였으며 선 폭 정밀도는 150 nm수준이었다. 이광자 광중합법으로 윤곽선을 고화시켜 쉘(shell) 형태로 3차원 형상을 제작할 때에는 기계적 강성이 약하여 고화 후에 용매로 중합반응이 일어나지 않는 부분을 제거할 때 변형이 쉽게 발생하게 된다. 본 연구에서는 이러한 문제점을 해결하고자 윤곽 쉘 두께를 증가시켜 윤곽선을 중첩으로 제작하는 이중 윤곽선 스캐닝 방법(double contour scanning)을 시도하였으며 이를 통하여 제작된 형상의 강도가 향상됨을 확인할 수 있었다.

이광자 광중합 공정을 이용한 3차원 미세구조물 제작기술 동향 (Recent Progress in the Nanoscale Additive Layer Manufacturing Process Using Two-Photon Polymerization for Fabrication of 3D Polymeric, Ceramic, and Metallic Structures)

  • 하철우;임태우;손용;박석희;박상후;양동열
    • 한국정밀공학회지
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    • 제33권4호
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    • pp.265-270
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    • 2016
  • Recently, many studies have been conducted on the nano-scale fabrication technology using twophoton- absorbed polymerization induced by a femtosecond laser. The nano-stereolithography process has many advantages as a technique for direct fabrication of true three-dimensional shapes in the range over several microns with sub-100 nm resolution, which might be difficult to obtain by using general nano/microscale fabrication technologies. Therefore, two-photon induced nano-stereolithography has been recently recognized as a promising candidate technology to fabricate arbitrary 3D structures with sub-100 nm resolution. Many research works for fabricating novel 3D nano/micro devices using the two-photon nano-stereolithography process, which can be utilized in the NT/BT/IT fields, are rapidly advancing.