Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2007.11a
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- Pages.118-119
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- 2007
Electrical characteristics of 3-D stacked CMOS Inverters using laser crystallization method
레이저 결정화 방법을 적용한 3차원 적층 CMOS 인버터의 전기적 특성 개선
- Lee, Woo-Hyun (Kwangwoon Univ.) ;
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Cho, Won-Ju
(Kwangwoon Univ.) ;
- Oh, Soon-Young (ETRI) ;
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Ahn, Chang-Geun
(ETRI) ;
- Jung, Jong-Wan (Sejong Univ.)
- Published : 2007.11.01
Abstract
High performance three-dimensional (3-D) stacked poly-Si complementary metal-oxide semiconductor (CMOS) inverters with a high quality laser crystallized channel were fabricated. Low temperature crystallization methods of a-Si film using the excimer-laser annealing (ELA) and sequential lateral solidification (SLS) were performed. The NMOS thin-film-transistor (TFT) at lower layer of CMOS was fabricated on oxidized bulk Si substrate, and the PMOS TFT at upper layer of CMOS was fabricated on interlayer dielectric film. The 3-D stacked poly-Si CMOS inverter showed excellent electrical characteristics and was enough for the vertical integrated CMOS applications.