Real Time CUSUM Control of Plasma Impedance Matching Network

플라즈마 임피이던스 정합망 실시간 CUSUM 제어

A CUSUM control chart was used to monitor semiconductor plasma equipment. The performance of plasma monitoring was evaluated with various combinations of design variables involved in CUCUM control chart. Experimental data collected by using a real-time matching monitoring system include electrical positions of impedance and phase positions, and reflected power. The evaluation revealed that by determining specific design variables plasma states could be more strictly monitored.