Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2005.05a
- /
- Pages.72-75
- /
- 2005
Preparing of the AI electrode for OLED by Sputtering Methode
스퍼터링법을 이용한 OLED용 Al 전극의 제작
- Kim, Kyung-Hwan (KyungWon Univ.) ;
- Keum, Min-Jong (KyungWon Univ.)
- Published : 2005.05.13
Abstract
In this study Al electrode for OLED was deposited by FTS(Facing Targets Sputtering) system which can deposit thin films with low substrate damage. The Al thin films were deposited on the cell(LiF/EML/HTL/Bottom electrode) as a function of working gas such as Ar, Kr or mixed gas. Also Al thin films were prepared with working gas pressure (1, 6 mTorr ). The film thickness and I-V curve of Al/cell were evaluated by