Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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GROWTH OF CARBON NANOTUBES ON GLASS BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION

마이크로웨이브 플라즈마 화학기상증착장비를 사용한 유리기판상의 탄소나노튜브의 합성

  • 이재형 (군산대학교 전자정보공학부) ;
  • 최성헌 (군산대학교 전자정보공학부) ;
  • 최원석 (성균관대학교 정보통신공학부) ;
  • 홍병유 (성균관대학교 정보통신공학부) ;
  • 김정태 (성균관대학교 정보통신공학부) ;
  • 임동건 (충주대학교 전자공학과) ;
  • 양계준 (충주대학교 전자공학과)
  • Published : 2005.11.10
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Abstract

We have grown carbon nanotubes (CNTs) with a microwave plasma chemical vapor deposition (MPECVD) method, which has been regard as one of the most promising candidates for the synthesis of CNTs due to the vertical alignment, the low temperature and the large area growth. We use methane ($CH_4$) and hydrogen ($H_2$) gas for the growth of CNTs. 60 nm thick Ni catalytic layer were deposited on the TiN coated glass substrate by RF magnetron sputtering method. In this work, we report the effects of pressure on the growth of CNTs. We have changed pressure of processing (10 $\sim$ 20 Torr) deposition of CNTs. SEM (Scanning electron microscopy) images show diameter, length and cross section state CNTs.

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