한국정보디스플레이학회:학술대회논문집
- 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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- Pages.1254-1257
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- 2004
Effects of $H_2$ vs. $O_2$ Plasma Pretreatment of Gate Oxide on the Degradation Phenomenon of Low-Temperature Polysilicon Thin-Film Transistors
- Lee, Seok-Woo (LG. Philips LCD R&D Center) ;
- Kang, Ho-Chul (LG. Philips LCD R&D Center) ;
- Yang, Joon-Young (LG. Philips LCD R&D Center) ;
- Kim, Eu-Gene (LG. Philips LCD R&D Center) ;
- Kim, Sang-Hyun (LG. Philips LCD R&D Center) ;
- Lim, Kyoung-Moon (LG. Philips LCD R&D Center) ;
- Kim, Chang-Dong (LG. Philips LCD R&D Center) ;
- Chung, In-Jae (LG. Philips LCD R&D Center)
- 발행 : 2004.08.23
초록
Comparative study on the effects of
키워드