한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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- Pages.284-287
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- 2004
X-ray 식각된 PMMA의 다양한 현상조건에 따른 현상특성
Development Characteristics of PMMA fabricated by X-ray Lithography in Various Development Conditions
- Kim, Yun-Ho (Hankuk Aviation Uni) ;
- Park, Joon-Shik (Korea Electronics Technology Institute) ;
- Lee, In-Gyu (Hankuk Aviation Uni) ;
- Park, Soon-Sup (Korea Electronics Technology Institute)
- 발행 : 2004.07.05
초록
Micro-structures fabricated by X-ray lithography are largely affected by doses, development conditions and other factors. For these reasons, PMMA development rates and its surface profiles under various development conditions were obseued. Development rates were measured in the rage from 1 to 6