A Study on the characteristics of ultra precision about Buffing and Electropolishing for Semiconductor Large Radius Pipe

반도체용 대구경관의 전해 복합연마에 대한 초정밀 가공 특성연구

On this study, electrochemical polishing is adapted to ultra-fine surface for semiconductor large radius gas-tube. The system which buffing and electrochemical polishing can be performed simultaneously was constructed in connection with developing exclusive system. Based on existing papers and the research of background, electrode gap and electrolyte flow were fixed. Current density and electrochemical precision time were chosen as variables. On this study, it is objected to find optimal precision condition and precision variables on the in-process electrochemical polishing.