Proceedings of the KSME Conference (대한기계학회:학술대회논문집)
- 2003.04a
- /
- Pages.1069-1072
- /
- 2003
UV transparent stamp fabrication for UV nanoimprint lithography
UV 나노임프린트 리소그래피용 UV 투과성 나노스탬프 제작
-
Jeong, Jun-Ho
;
- Sim, Young-Suk ;
-
Sohn, Hyon-Kee
;
-
Shin, Young-Jae
;
-
Lee, Eung-Suk
;
- Hur, Ik-Boum ;
- Kwon, Sung-Won
-
정준호
(한국기계연구원 지능형정밀기계연구부) ;
- 심영석 (한국기계연구원 지능형정밀기계연구부) ;
-
손현기
(한국기계연구원 지능형정밀기계연구부) ;
-
신영재
(한국기계연구원 지능형정밀기계연구부) ;
-
이응숙
(한국기계연구원 지능형정밀기계연구부) ;
- 허익범 (듀폰포토마스크(주) 기술부) ;
- 권성원 (듀폰포토마스크(주) 기술부)
- Published : 2003.04.23
Abstract
Ultraviolet-nanoimprint lithography (UV-NIL) is a promising nanoimprint method for cost-effectively defining nanometer scale structures at room temperature and low pressure. Nanostamp fabrication technology is a key technology for UV-NIL because fabricating a high resolution nanostamp is the first step for defining high resolution nanostructures in a substrate. We used quartz as an UV transparent stamp material for the UVNIL. A