Effect of slurry abrasive particle on dishing in Shallow Trench Isolation Chemical Mechanical Polishing

STI-CMP공정에서 슬러리 연마입자가 dishing에 미치는 영향

  • Ahn Jin-Woo (Department of Material Science and Engineering, Korea University) ;
  • Lim Dae-Soon (Department of Material Science and Engineering, Korea University) ;
  • Lee Sang-Ick (Hynix Semiconductor)
  • Published : 2003.11.01