한국마이크로전자및패키징학회:학술대회논문집 (Proceedings of the International Microelectronics And Packaging Society Conference)
- 한국마이크로전자및패키징학회 2002년도 추계기술심포지움논문집
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- Pages.115-121
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- 2002
ALD를 이용한 극박막 $HfO_2 /SiON$ stack structure의 특성 평가
Characterization of $HfO_2 /SiON$ stack structure for gate dielectrics
- Kim, Youngsoon (Department of Materials Science & Engineering, Hanyang University) ;
- Lee, Taeho (Department of Materials Science & Engineering, Hanyang University) ;
- Jaemin Oh (Department of Materials Science & Engineering, Hanyang University) ;
- Jinho Ahn (Department of Materials Science & Engineering, Hanyang University) ;
- Jaehak Jung (Evertek corporation)
- 발행 : 2002.11.01
초록
In this research we have investigated the characteristics of ultra thin
키워드