대한기계학회:학술대회논문집 (Proceedings of the KSME Conference)
- 대한기계학회 2001년도 춘계학술대회논문집A
- /
- Pages.102-107
- /
- 2001
Analysis of Propagating Crack Along Interface of Isotropic-Orthotropic Bimaterial by Photoelastic Experiment
- Lee, K.H. (Sangju National University) ;
- Shukla, A. (University of Rhode Island) ;
- Parameswaran, V. (University of Rhode Island) ;
- Chalivendra, V. (University of Rhode Island) ;
- Hawong, J.S. (Yeoungnam University)
- 발행 : 2001.06.27
초록
Interfacial cracks between an isotropic and orthotropic material, subjected to static far field tensile loading are analyzed using the technique of photoelasticity. The fracture parameters are extracted from the full-field isochromatic data and the same are compared with that obtained using boundary collocation method. Dynamic Photoelasticity combined with high-speed digital photography is employed for capturing the isochromatics in the case of propagating interfacial cracks. The normalized stress intensity factors for static crack is greater when
키워드