Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2001.07a
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- Pages.863-865
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- 2001
Etching Properties of $RuO_2$ Thin Film in Inductively Coupled Plasma
ICP에 의한 $RuO_2$ 박막의 식각 특성
Abstract
In this study, RuO