The AC Breakdown Properties of Gate Oxide Layer in MOSFET

MOSFET에서 Gate Oxide층의 교류 절연파괴 특성

In this paper, the AC breakdown properties to investigate the electrical properties of gate oxide layer in MOSFET was studied. 5 inch arsenic epi-wafer is selected as an experimental specimen, the power MOSFET of a general MOS structure was made. In order to analyze the physical properties of the specimen, the SIMS(secondary ion mass spectroscopy) was used. As the experimental condition, the experiment al of the AC breakdown characteristics was performed when the thickness of gate oxide layer is $600[\AA]$ and $800[\AA]$, the resistivity is $1.2[\Omega{\cdot}cm]$, $1.5[\Omega{\cdot}cm]$ and $1.8[\Omega{\cdot}cm]$, and the diffusion time is 110[min] and 150[min] in temperature $30[^{\circ}C]{\sim}100[^{\circ}C]$. From the analysis result of the SIMS spectrum, it is confirmed that the dielectric strength is decreased by contribution of the impurities ad dition as increasing in thickness of the gate oxide layer in MOSFET.