Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)

Materials Research Society of Korea (한국재료학회)
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Effect of Post Plasma Treatment on Water Absorption and Dielectric Properties of Fluorine Doped $SiO_2$ Films Formed by ECRCVD with $SiF_4$ and $O_2$

  • Yoo, Jae-Yoon (Department of Metallurgical Engineering, Hanyang University) ;
  • Lee, Seonghyeong (Department of Metallurgical Engineering, Hanyang University) ;
  • Park, Jong-Wan (Department of Metallurgical Engineering, Hanyang University)
  • Published : 1996.11.01
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