Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 1995.06a
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- Pages.144-144
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- 1995
Effect of $SiF_4$ addition on the structures of silicon films deposited at low temperature by remote plasma enhanced chemical vapor deposition
- Xiaodong-Li (Department of Metals and Technology, Harbin Institute of Technology) ;
- Park, Young-Bae (Laboratory for Advanced Materials pprocessing (LAMpp), Deppartment of Chemical Engineering ppohang University of Science and Technology(POSTECH)) ;
- Kim, Dong-Hwan (Laboratory for Advanced Materials pprocessing (LAMpp), Deppartment of Chemical Engineering ppohang University of Science and Technology(POSTECH)) ;
- Rhee, Shi-Woo (Laboratory for Advanced Materials pprocessing (LAMpp), Deppartment of Chemical Engineering ppohang University of Science and Technology(POSTECH))
- Published : 1995.06.01
Abstract
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