Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 1995.06a
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- Pages.145-145
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- 1995
Effects of TCA Incorporation During Annealing Process on The Propperties of Oxygen Ion Implanted Silicon Wafers
- Bae, Y.H (Electronic device & system research Lab. Research Institute of Industrial Science & Technology) ;
- Kwon, Y.K (Electronic device & system research Lab. Research Institute of Industrial Science & Technology) ;
- Kim, K.I (Electronic device & system research Lab. Research Institute of Industrial Science & Technology) ;
- Chung, W.J. (Electronic device & system research Lab. Research Institute of Industrial Science & Technology)
- Published : 1995.06.01
Abstract
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