Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1993.07b
- /
- Pages.1183-1185
- /
- 1993
The Study on the application of plasma co-polymerized (MMA-Styrene) thin film as E-beam resist
플라즈마중합법에 의한 (MMA+Styrene) 박막의 E-beam용 레지스트 특성에 대한 연구
- Jung, Y. (Inha Univ.) ;
- Park, J.K. (Inha Univ.) ;
- Park, S.K. (Inha Univ.) ;
- Park, J.Y. (Kyungnam Univ.) ;
-
Park, S.H.
(Kyungnam Univ.)
;
- Lee, D.C. (Inha Univ.)
- 정윤 (인하대학교 전기공학과) ;
- 박종관 (인하대학교 전기공학과) ;
- 박상근 (인하대학교 전기공학과) ;
- 박재윤 (경남대학교 전기공학과) ;
-
박상현
(경남대학교 전기공학과)
;
- 이덕출 (인하대학교 전기공학과)
- Published : 1993.07.18
Abstract
The plasma polymerized thin film of MMA+Sty was prepared using a capacitively coupled gas-flow-type reactor. This thin films were also delincated by the electron-beam apparatus with an acceleration voltage 30KV, and the pattern in the resist was developed with the gas-flow-type reactor using an argon as an etchant. The effect of discharge power on groth rate and etching rate of the thin film were studied. The molacular structure of the resist was investigated by ESCA and FT-IR.
Keywords