Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)

1992.05a
/
Pages.59-60
/
1992

Materials Research Society of Korea (한국재료학회)

권호 표지

Effect of $O_2$ or $NF_3$ plasma treatments on contaminated silicon surface due to $CHF_{3}/C_{2}F_{6}$ reactive ion etching

박형호 (한국전자통신연구소) ;
권광호 (한국전자통신연구소) ;
곽병화 (한국전자통신연구소) ;
이상환 (한국전자통신연구소) ;
권오준 (한국전자통신연구소) ;
김보우 (한국전자통신연구소)

Published : 1992.05.01

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