• Title/Summary/Keyword: zinc oxide (ZnO)

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Electrical and optical properties of ZnO:Al thin films prepared by reactive sputtering method (반응성 sputtering법으로 제막된 ZnO : Al 박막의 전기.광학적 특성)

  • 유병석;유세웅;이정훈
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.6 no.4
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    • pp.480-492
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    • 1996
  • AZO (Aluminum doped Zinc Oxide) transparent conducting thin films were fabricated by reactive DC mangnetron sputtering method using zinc target containing 2 wt% of Al. Transition range with optimum transmittance and conductivity was obtained by contrlling partial pressure of reactive oxygen gas. Sputtering condition for this transition range could be kept stable by regulating the target voltage. According to XRD analysis, there was only one peak for (002) plane in AZO films and the films deposited in transition range.

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A Study on Wet Etch Behavior of Zinc Oxide Semiconductor in Acid Solutions

  • Seo, Bo-Hyun;Lee, Sang-Hyuk;Jeon, Jea-Hong;Choe, Hee-Hwan;Lee, Kang-Woong;Lee, Yong-Uk;Seo, Jong-Hyun
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08a
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    • pp.926-929
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    • 2007
  • A significant progress has been made in the characterization of zinc oxide (ZnO) semiconductor as a new semiconductor layer instead of amorphous Si semiconductor used in thin film transistor due to its high electron mobility at low deposition temperature which is quite suitable for flexible display and OLED devices. The wet pattering of ZnO is another important issue with regard to mass production of ZnO thin film transistor device. However, the wet behavior of ZnO thin film in aqueous wet etching solutions conventionally used un TFT industry has not been reported yet, in this work, wet corrosion behavior of RF magnetron sputtered ZnO thin film in various wet solutions such as phosphoric and nitric acid solutions was studied using by electrochemical analysis. The effects of deposition parameters such as RF power and oxygen partial pressure on corrosion rate are also examined.

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Effect of Reduced Graphite Oxide as Substrate for Zinc Oxide to Hydrogen Sulfide Adsorption

  • Jeon, Nu Ri;Song, Hoon Sub;Park, Moon Gyu;Kwon, Soon Jin;Ryu, Ho Jeong;Yi, Kwang Bok
    • Clean Technology
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    • v.19 no.3
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    • pp.300-305
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    • 2013
  • Zinc oxide (ZnO) and reduced graphite oxide (rGO) composites were synthesized and tested as adsorbents for the hydrogen sulfide ($H_2S$) adsorption at mid-to-high (300 to $500^{\circ}C$) temperatures. In order to investigate the critical roles of oxygen containing functional groups, such as hydroxyl, epoxy and carboxyl groups, attached on rGO surface for the $H_2S$ adsorption, various characterization methods (TGA, XRD, FT-IR, SEM and XPS) were conducted. For the reduction process for graphite oxide (GO) to rGO, a microwave irradiation method was used, and it provided a mild reduction environment which can remain substantial amount of oxygen functional groups on rGO surface. Those functional groups were anchoring and holding nano-sized ZnO onto the 2D rGO surface; and it prevented the aggregation effect on the ZnO particles even at high temperature ranges. Therefore, the $H_2S$ adsorption capacity had been increased about 3.5 times than the pure ZnO.

Change in the Energy Band Gap and Transmittance IGZO, ZnO, AZO OMO Structure According to Ag Thickness (IGZO, ZnO, AZO OMO 구조의 Ag두께 변화에 따른 투과율과 에너지 밴드 갭의 변화)

  • Lee, Seung-Min;Kim, Hong-Bae;Lee, Sang-Yeol
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.28 no.3
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    • pp.185-190
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    • 2015
  • In this study, we fabricated the indium gallium zinc oxide (IGZO), zinc oxide (ZnO), aluminum zinc oxide (AZO). oxide and silver are deposited by magnetron sputtering and thermal evaporator, respectively transparency and energy bandgap were changed by the thickness of silver layer. To fabricate metal oxide metal (OMO) structure, IGZO sputtered on a corning 1,737 glass substrate was used as bottom oxide material and then silver was evaporated on the IGZO layer, finally IGZO was sputtered on the silver layer we get the final OMO structure. The radio-frequency power of the target was fixed at 30 W. The chamber pressure was set to $6.0{\times}10^{-3}$ Torr, and the gas ratio of Ar was fixed at 25 sccm. The silver thickness are varied from 3 to 15 nm. The OMO thin films was analyzed using XRD. XRD shows broad peak which clearly indicates amorphous phase. ZnO, AZO, OMO show the peak [002] direction at $34^{\circ}$. This indicate that ZnO, AZO OMO structure show the crystalline peak. Average transmittance of visible region was over 75%, while that of infrared region was under 20%. Energy band gap of OMO layer was increased with increasing thickness of Ag layer. As a result total transmittance was decreased.

Conformal Zinc Oxide Thin Film Deposition on Graphene using molecular linker by Atomic Layer Deposition

  • Park, Jin-Seon;Han, Gyu-Seok;Jo, Bo-Ram;Seong, Myeong-Mo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.280.2-280.2
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    • 2016
  • The graphene, a single atomic sheet of graphite, has attracted tremendous interest owing to its novel properties including high intrinsic mobility, optical transparency and flexibility. However, for more diverse application of graphene devices, it is essential to tune its transport behavior by shifting Dirac Point (DP) of graphene. So, in the following context, we suggest a method to tune structural and electronic properties of graphene using atomic layer deposition. By atomic layer deposition of zinc oxide (ZnO) on graphene using 4-mercaptophenol as linker, we can fabricate n-doped graphene. Through ${\pi}-{\pi}$ stacking between chemically inert graphene and 4-mercaptophenol, conformal deposition of ZnO on graphene was enabled. The electron mobility of graphene TFT increased more than 3 times without considerably decreasing the hole mobility, compared to the pristine graphene. Also, it has high air stability. This ZnO doping method by atomic layer deposition can be applicable to large scale array of CVD graphene TFT.

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The Study on the Aging Characteristics of the Arrester Block(ZnO) (피뢰기 소자(ZnO)의 열화특성에 관한 연구)

  • Kim, Chan-Young;Song, Il-Keun;Kim, Ju-Yong;Jeoung, Nyeon-Ho
    • Proceedings of the KIEE Conference
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    • 1998.07d
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    • pp.1459-1461
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    • 1998
  • This paper provides the results of analysis of lightening arrester failed in the field. XRD was used for qualitative analysis and SEM for microstructure analysis of zinc oxide (ZnO) block. The failure of lightening arrester might occur due to the following reasons: the uneven size of zinc oxide grains and cement layers. the re-crystallization of zinc oxide grains resulting from electrical stress around impurities, and the presence of too large pores($\simeq$ 50 ${\mu}m$).

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C-axis orientation of ZnO thin films on sputtering conditions (증착 조건 변화에 따른 ZnO 박막의 c-축 배향성)

  • 성하윤;금민종;손인환;박용욱;전영하;박용서;김경환
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.901-904
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    • 2000
  • In order to investigate the effect of deposition conditions on crystallographic properties of ZnO thin films by Facing Targets Sputtering system which can deposit thin films in plasma-free situation and change the deposition conditions in wide range. The characteristics of zinc oxide thin films on power, inter targets distance, and substrate temperature were investigated by XRD(x-ray diffractometer), alpha-step (Tencor) analyses. The excellently c-axis oriented zinc oxide thin films were obtained at sputter pressure 1mTorr, sputtering current 0.4A, substrate temperature 300$^{\circ}C$, inter target distance 100mm. In these conditions, the rocking curve of zinc oxide thin films deposited on Glass was 3.9$^{\circ}$.

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Study on the Seasoning Effect for Amorphous In-Ga-Zn-O Thin Film Transistors with Soluble Hybrid Passivation

  • Yun, Su-Bok;Kim, Du-Hyeon;Hong, Mun-Pyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.256-256
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    • 2012
  • Oxide semiconductors such as zinc tin oxide (ZTO) or indium gallium zinc oxide (IGZO) have attracted a lot of research interest owing to their high potential for application as thin film transistors (TFTs) [1,2]. However, the instability of oxide TFTs remains as an obstacle to overcome for practical applications to electronic devices. Several studies have reported that the electrical characteristics of ZnO-based transistors are very sensitive to oxygen, hydrogen, and water [3,4,5]. To improve the reliability issue for the amorphous InGaZnO (a-IGZO) thin-film transistor, back channel passivation layer is essential for the long term bias stability. In this study, we investigated the instability of amorphous indium-gallium-zinc-oxide (IGZO) thin film transistors (TFTs) by the back channel contaminations. The effect of back channel contaminations (humidity or oxygen) on oxide transistor is of importance because it might affect the transistor performance. To remove this environmental condition, we performed vacuum seasoning before the deposition of hybrid passivation layer and acquired improved stability. It was found that vacuum seasoning can remove the back channel contamination if a-IGZO film. Therefore, to achieve highly stable oxide TFTs we suggest that adsorbed chemical gas molecules have to be eliminated from the back-channel prior to forming the passivation layers.

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Preparation of ZnO Nano Powder and High-transparent UV Shielding Dispersion Sol (ZnO 나노분말 및 고투명성 자외선 차단 분산 졸의 제조)

  • Lee, Hun Dong;Kim, Jin Mo;Son, Dae Hee;Lee, Seung-Ho;Park, Seong Soo
    • Applied Chemistry for Engineering
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    • v.24 no.4
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    • pp.391-395
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    • 2013
  • In this study, zinc oxide (ZnO) nano powder, well known as an UV absorbing material, was synthesized with three synthetic conditions by the hydrothermal method. After ZnO nano powder was surface-modified with various silane coupling agents to improve dispersion property, a dispersion sol was prepared with dispersant for 72 h by the ball-milling of surface-modified ZnO nano powder. The dispersion sol, prepared by modifying the surface of the ZnO nano powder with an average size of about 30 nm using 3-chloropropyl trimethoxy silane, showed an excellent dispersion stability with a high UV-shielding and visible trnasparency.

Hydrogen Sensing Properties of ZnO-SWNTs Composite (산화아연과 단중벽 탄소나노튜브 복합체의 수소가스 감응 특성)

  • Jung, Jin-Yeun;Song, Hye-Jin;Kang, Young-Jin;Oh, Dong-Hoon;Jung, Hyuk;Cho, You-Suk;Kim, Do-Jin
    • Korean Journal of Materials Research
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    • v.18 no.10
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    • pp.529-534
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    • 2008
  • The hydrogen gas sensing properties of a zinc oxide nanowire structure were studied. Porous zinc oxide nanowire structures were fabricated by oxidizing zinc deposited on a single-wall carbon nanotube (SWNT) template. This revealed a porous ZnO-SWNT composite due to the porosity in the SWNT film. The gas sensing properties were compared with those of zinc oxide thin films deposited on SiO2/Si substrates in sensitivity and operating temperature. The composite structure showed higher sensitivity and lower operating temperature than the zinc oxide film. It showed a response even at room temperature while the film structure did not.