• Title/Summary/Keyword: x-ray reflectivity

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Interface study of ion irradiated Cu/Ni/Cu(001)/Si thin film by X-ray reflectivity (이온 조사된 Cu/Ni/Cu(001)/Si 자성박막에 있어서 X-ray reflectivity를 이용한 계면 연구)

  • Kim, T.G.;Song, J.H.;Lee, T.H.;Chae, K.H.;Hwang, H.M.;Jeon, G.Y.;Lee, J;Jeong, K.;Whang, C.N.;Lee, J.S.;Lee, K.B.
    • Journal of the Korean Magnetics Society
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    • v.12 no.5
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    • pp.184-188
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    • 2002
  • The Cu/Ni/Cu(002)/Si(100) films which have perpendicular magnetic anisotropy were deposited by e-beam evaporation methods. From the reflection high energy electron diffraction pattern, the films were confirmed to be grown epitaxially on silicon. After 2X lots ions/$\textrm{cm}^2$ C+ irradiation, magnetic easy-axis was changed from surface normal to in-plane as shown in the hysteresis loop of magneto-optical Kerr effects. It became manifest from analysis of X-ray reflectivity and grazing incident X-ray diffraction that even though interface between top Cu layer and Ni layer became rougher, the contrast of Cu and Ni's electron density became manifest after ion irradiation. In addition, the strain after deposition of the films was relaxed after ion irradiation. Strain relaxation related with change of magnetic properties and mechanism of intermixed layer's formation was explained by thermo-chemical driving force due to elastic and inelastic collision of ions.

Synchrotron X-ray Reflectivity Studies on Nanoporous Low Dielectric Constant Organosilicate Thin Films

  • Oh, Weon-Tae;Park, Yeong-Do;Hwang, Yong-Taek;Ree, Moon-Hor
    • Bulletin of the Korean Chemical Society
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    • v.28 no.12
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    • pp.2481-2485
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    • 2007
  • Spatially resolved, quantitative, non-destructive analysis using synchrotron x-ray reflectivity (XR) with subnano-scale resolution was successfully performed on the nanoporous organosilicate thin films for low dielectric applications. The structural information of porous thin films, which were prepared with polymethylsilsesquioxane and thermally labile 4-armed, star-shaped poly(ε-caprolactone) (PCL) composites, were characterized in terms of the laterally averaged electron density profile along with a film thickness as well as a total thickness. The thermal process used in this work caused to efficiently undergo sacrificial thermal degradation, generating closed nanopores in the film. The resultant nanoporous films became homogeneous, well-defined structure with a thin skin layer and low surface roughness. The average electron density of the calcined film reduced with increase of the initial porogen loading, and finally leaded to corresponding porosity ranged from 0 to 22.8% over the porogen loading range of 0-30 wt%. In addition to XR analysis, the surface and the inner structures of films are investigated and discussed with atomic force and scanning electron microscopy images.

Improvement of Genetic Algorithm for Evaluating X-ray Reflectivity on Multilayer Mirror (다층박막 거울의 반사율 평가를 위한 유전 알고리즘의 개선)

  • Chon, Kwon Su
    • Journal of the Korean Society of Radiology
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    • v.14 no.1
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    • pp.69-75
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    • 2020
  • Multilayer mirrors have widely been used not only in the industry but also in the medical field. X-ray reflectivity was measured by X-ray diffractometer to evaluate the performance of W/C multilayer mirror with 40 layers. Genetic algorithm are used to obtain thickness, density, and interfacial roughness for each of the 40 layers. The existing uniform random selection causes a problem that the solution does not converge or the error increases even if it convergence. To reduce the time to calculate the fitness of the genetic algorithm, the genetic algorithm was written in C/C++ parallel programming. The genetic algorithm showed excellent scalability of linear time increase with increasing number of generation and population. The genetic algorithm was selected with uniform and Gaussian randomness of 1:1 to improve the convergence of solution. The improved genetic algorithm can be applied to characterize each layer of a sample with more than a few tens of layers, such as a multilayer mirror.

Effects of Sputtering Conditions on the Growth of Ag/CoFeB Layer on MgO(100) Substrate (MgO(100) 기판 위에 증착된 Ag/CoFeB 박막의 스퍼터링 조건에 따른 미세성장구조 변화 연구)

  • Jeon, Bo-Geon;Jeong, Jong-Ryul;Takahashi, Hirokazu;Tsunoda, Masakiyo;Takahashi, Migaku
    • Journal of the Korean Magnetics Society
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    • v.21 no.6
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    • pp.214-218
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    • 2011
  • In this study, we have systematically investigated the effect of sputtering conditions on the microstructural properties of Ag/CoFeB thin film on MgO substrate. It was found that the crystallinity and surface roughness of the Ag film strongly depends on the Ar sputtering pressure and sputtering power. Epitaxial growth of Ag(100) film on MgO(100) substrate was achieved under the sputtering conditions of high sputtering power and elevated temperature. XRR (X-ray reflectivity) and high-resolution TEM (transmission electron microscopy) measurements also revealed the interfacial roughening in the Ag/CoFeB interface due to the island structure formation and intermixing between Ag and CoFeB.

Conceptual Design of Soft X-ray Microscopy for Live Biological Samples

  • Kim, Kyong-Woo;Nam, Ki-Yong;Kwon, Young-Man;Shim, Seong-Taek;Kim, Kyu-Gyeom;Yoon, Kwon-Ha
    • Journal of the Optical Society of Korea
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    • v.7 no.4
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    • pp.230-233
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    • 2003
  • This study describes the conceptual design of a soft x-ray microscope system based on a laserbased source for biomedical application with high resolution (${\leq}$50nm). The laboratory scale soft x-ray microscope consists of high power laser plasma x-ray source and grazing incidence mirrors with high reflectivity. The laser plasma source used for developing this system employs Q-switched Nd-YAG pulsed laser. The laser beam is focused on a tantalum (Ta) target. The Wolter type I mirror was used as condenser optics for sample illumination and as objective mirror for focusing on a detector. The fabrication of the Wolter type I mirror was direct internal cutting using ultraprecision DTM. A hydrated biological specimen was put between the two silicon wafers, the center of which was $Si_3N_4$ windows of 100㎚ thickness. The main issues in the future development work are to make a stable, reliable and reproducible x-ray microscope system.

Optimum Design and Tolerance Analysis of Multilayer Mirror for Obtaining Characteristic X-ray of 17.5 keV (몰리브덴(Mo) 특성방사선 획득을 위한 다층박막 거울의 최적 설계 및 공차 분석)

  • Chon, Kwon-Su
    • Journal of the Korean Society of Radiology
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    • v.3 no.4
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    • pp.23-28
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    • 2009
  • Monochromatic X-ray can make a medical image of high contrast under a low radiation dose and can be easily generated by combining an X-ray tube and a multilayer mirror. A W/C multilayer mirror was optimally designed for a characteristic X-ray generated from a X-ray tube with Mo target. The d-spacing and the thickness ratio in design parameters were determined under the maximum-reflectivity condition. Tolerances for deposition and alignment of the W/C multilayer mirror were calculated. Within a deposition tolerance of 0.2nm and a alignment tolerance of ${\pm}0.01^{\circ}$, 85% of the theoretical peak reflectivity could be achieved. A multilayer mirror can be widely used for making medical images because of generating high fluence monochromatic X-ray.

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X-Ray Resonant Magnetic Scattering Study of Magnetic Structures and Magnetic Switching Mechanism in Magnetic Multilayers and Nanostructures (엑스선 공명 자기 산란을 이용한 자성 다층박막 및 나노 구조체의 자기 구조와 자기 스위칭 메커니즘의 연구)

  • Lee, Dong-Ryeol
    • Journal of the Korean Magnetics Society
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    • v.20 no.4
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    • pp.160-166
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    • 2010
  • X-ray resonant magnetic scattering (XRMS) allows us to extract magnetic depth profiles in magnetic multilayers and magnetization distribution in magnetic nanostructures in element-specific manner using x-ray reflectivity and diffraction. XRMS is explained with a brief introduction and examples of magnetic structures and magnetic switching mechanism in magnetic multilayers and nanostructures.

Structural characterization of oxynitride films by synchrotron x-ray reflectivity analysis (방사광 X-선 반사도론 이용한 oxynitride 나노박막의 두께와 계면 거칠기 측정)

  • 장창환;주만길;신광수;오원태;이문호
    • Proceedings of the Korea Crystallographic Association Conference
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    • 2002.11a
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    • pp.44-44
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    • 2002
  • 방사광 X-선 반사도를 이용하여 나노 스케일의 두께를 가진 oxynitride 박막의 계면 구조 및 두께를 측정하였다. Oxynitride 박막에서 nitrogen 분포의 분석은 두께가 극도로 얇아지는 요즘의 반도체 제작에서 매우 중요한 과제로 대두되고 있다. (1) X-선 반사도 측정을 분석하여 박막 깊이에 따른 전자밀도분포와 계면에서의 거칠기 및 각 층의 두께가 결정되었다. X-선 반사도 측정 분석으로부터 Nitrogen은 SiO₂와 Si substrate 계면에 위치하며, 화학조성분포와 층 구조의 상관성을 SIMS를 이용한 조성분포 측정과 비교하였다.

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