• 제목/요약/키워드: wafer drop

검색결과 38건 처리시간 0.028초

Development of MEMS based Piezoelectric Inkjet Print Head and Its Applications

  • Shin, Seung-Joo;Lee, Hwa-Sun;Lee, Tae-Kyung;Kim, Sung-Jin
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2010년도 춘계학술발표대회
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    • pp.20.2-20.2
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    • 2010
  • Recently inkjet printing technology has been developed in the areas of low cost fabrication in environmentally friendly manufacturing processes. Although inkjet printing requires the interdisciplinary researches including development of materials, manufacturing processes and printing equipment and peripherals, manufacturing a printhead is still core of inkjet technology. In this study, a piezoelectric driven DOD (drop on demand) inkjet printhead has been fabricated on three layers of the silicon wafer in MEMS Technology because of its chemical resistance to industrial inks, strong mechanical properties and dimensional accuracy to meet the drop volume uniformity in printed electronics and display industries. The flow passage, filter and nozzles are precisely etched on the layers of the silicon wafers and assembled through silicon fusion bonding without additional adhesives. The piezoelectric is screen-printed on the top the pressure chamber and the nozzle plate surface is treated with non-wetting coating for jetting fluids. Printheads with nozzle number of 16 to 256 have been developed to get the drop volume range from 5 pL to 80 pL in various industrial applications. Currently our printheads are successfully utilized to fabricating color-filters and PI alignment layers in LCD Flat Panel Display and legend marking for PCB in Samsung Electronics.

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공정개선을 통한 고전류이득 저포화전압 전력 트랜지서터의 성능향상 (Performance improvement of high $\beta$ and low saturation voltage power transistor through new process)

  • 김준식;이재곤;최시영
    • 전자공학회논문지D
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    • 제35D권8호
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    • pp.8-14
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    • 1998
  • A new process is developed to improve the electrical characteristics of high .beta. and low saturation voltage power transistor for lamp solenoid driver application. To prevent punch-through breakdown, appropriate combination of base doping and base width is necessary in the range of operating voltage of the circuit. The optimum values of base doping and sheet resistance are $Q_{D}$= $1.5{\times}10^{14}$atoms/$\textrm{cm}^2$ and $R_{s}$= 350 $\Omega/\square$ base wodtj $W_{B}$= $2.5{\mu}m$respectively. Under this condition it is possible to control $\beta$ of the transistor to 1500, maintaining $VB_{CBO}$ =200V. To reduce scattered distribution of .beta. of the devices on the wafer, it is necessary to improve emittter predeposition process. As a result, scattered distribution of .beta. of the devices on the wafer was reduced to 1/6 by using the new process. To improve collector to emitter forward voltage drop, $V_{ECF}$ of damper diode, an additional silicon etching process is used, which resulted in improving the value of $V_{eCF}$ from 2.8 V to 1.8V. With the suggested process superior device performance and higher yield are achieved.

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MEMS 자이로스코프 센서의 신뢰성 문제 (Reliability Assessment of MEMS Gyroscope Sensor)

  • 최민석;좌성훈;김종석;정희문;송인섭;조용철
    • 대한기계학회논문집A
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    • 제28권9호
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    • pp.1297-1305
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    • 2004
  • Reliability of MEMS devices is receiving more attention as they are heading towards commercial production. In particular are the reliability and long-term stability of wafer level vacuum packaged MEMS gyroscope sensors subjected to cyclic mechanical stresses at high frequencies. In this study, we carried out several reliability tests such as environmental storage, fatigue, shock, and vibration, and we investigated the failure mechanisms of the anodically bonded vacuum gyroscope sensors. It was found that successful vacuum packaging could be achieved through reducing outgassing inside the cavity by deposition of titanium as well as by pre-taking process. The current gyroscope structure is found to be safe from fatigue failure for 1000 hours of operation test. The gyroscope sensor survives the drop and vibration tests without any damage, indicating robustness of the sensor. The reliability test results presented in this study demonstrate that MEMS gyroscope sensor is very close to commercialization.

실리콘 웨이퍼 상에 제작된 미소 유로에서의 유동특성 (Flow Characteristics in a Microchannel Fabricated on a Silicon Wafer)

  • 김형우;원찬식;정시영;허남건
    • 대한기계학회논문집B
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    • 제25권12호
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    • pp.1844-1852
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    • 2001
  • Recent developments in microfluidic devices based on microelectromechanical systems (MEMS) technique find many practical applications, which include electronic chip cooling devices, power MEMS devices, micro sensors, and bio-medical devices among others. For the design of such micro devices, flows characteristics inside a microchannel have to be clarified which exhibit somewhat different characteristics compared to conventional flows in a macrochannel. In the present study microchannels of various hydraulic diameters are fabricated on a silicon wafer to study the pressure drop characteristics. The effect of abrupt contraction and expansion is also studied. It is found from the results that the friction factor in a straight microchannel is about 15% higher than that in a conventional macrochannel, and the loss coefficients in abrupt expansion and contraction are about 10% higher than that obtained through conventional flow analysis.

Characteristics of Ni/SiC Schottky Diodes Grown by ICP-CVD

  • Gil, Tae-Hyun;Kim, Han-Soo;Kim, Yong-Sang
    • KIEE International Transactions on Electrophysics and Applications
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    • 제4C권3호
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    • pp.111-116
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    • 2004
  • The Ni/SiC Schottky diode was fabricated with the $\alpha$-SiC thin film grown by the ICP-CVD method on a (111) Si wafer. $\alpha$-SiC film has been grown on a carbonized Si layer in which the Si surface was chemically converted to a very thin SiC layer achieved using an ICP-CVD method at $700^{\circ}C$. To reduce defects between the Si and $\alpha$-SiC, the surface of the Si wafer was slightly carbonized. The film characteristics of $\alpha$-SiC were investigated by employing TEM (Transmission Electron Microscopy) and FT-IR (Fourier Transform Infrared Spectroscopy). Sputterd Ni thin film was used as the anode metal. The boundary status of the Ni/SiC contact was investigated by AES (Auger Electron Spectroscopy) as a function of the annealing temperature. It is shown that the ohmic contact could be acquired beyond a 100$0^{\circ}C$ annealing temperature. The forward voltage drop at 100A/cm was I.0V. The breakdown voltage of the Ni/$\alpha$-SiC Schottky diode was 545 V, which is five times larger than the ideal breakdown voltage of the silicon device. As well, the dependence of barrier height on temperature was observed. The barrier height from C- V characteristics was higher than those from I-V.

미소구조물의 표면온도 측정 및 제어를 위한 다이오드 온도 센서 어레이 설계 (Diode Temperature Sensor Array for Measuring and Controlling Micro Scale Surface Temperature)

  • 한일영;김성진
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2004년도 추계학술대회
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    • pp.1231-1235
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    • 2004
  • The needs of micro scale thermal detecting technique are increasing in biology and chemical industry. For example, Thermal finger print, Micro PCR(polymer chain reaction), ${\mu}TAS$ and so on. To satisfy these needs, we developed a DTSA(Diode Temperature Sensor Array) for detecting and controlling the temperature on small surface. The DTSA is fabricated by using VLSI technique. It consists of 32 ${\times}$ 32 array of diodes (1,024 diodes) for temperature detection and 8 heaters for temperature control on a 8mm ${\times}$ 8mm surface area. The working principle of temperature detection is that the forward voltage drop across a silicon diode is approximately proportional to the inverse of the absolute temperature of diode. And eight heaters ($1K{\Omega}$) made of poly-silicon are added onto a silicon wafer and controlled individually to maintain a uniform temperature distribution across the DTSA. Flip chip packaging used for easy connection of the DTSA. The circuitry for scanning and controlling DTSA are also developed

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Phophorus External Gettering for High Quality Wafer of Silicon Heterojunction Solar Cells

  • 박효민;탁성주;김찬석;박성은;김영도;김동환
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2011년도 춘계학술발표대회
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    • pp.43.2-43.2
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    • 2011
  • Minority Carrier recombination should be suppressed for high efficiency solar cells. However, impurities in the silicon bulk region deteriorate the minority carrier lifetimes, causes conversion efficiency drop. In this study, we introduced phosphorus external gettering for silicon heterojunction solar cell substrates. Gettering was undergone at 750, 800, 850 and $900^{\circ}C$ in furnace for 30 minutes. Bulk lifetimes and calculated diffusion length were improved. We applied phosphorus gettering to silicon heterojunction solar cells. Gettered group and ungettered group were used as substrate of silicon heterojunction solar cells. After fabrication, characteristics of solar cells were analyzed. The results were observed to see the enhancement of substrate quality which directly connects with solar cell properties.

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1,200 V급 Trench Si IGBT의 설계 및 전기적인 특성 분석 (Design and Analyzing of Electrical Characteristics of 1,200 V Class Trench Si IGBT with Small Cell Pitch)

  • 강이구
    • 한국전기전자재료학회논문지
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    • 제33권2호
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    • pp.105-108
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    • 2020
  • In this study, experiments and simulations were conducted for a 1,200-V-class trench Si insulated-gate bipolar transistor (IGBT) with a small cell pitch below 2.5 ㎛. Presently, as a power device, the 1,200-V-class trench Si IGBT is used for automotives including electric vehicles, hybrid electric vehicles, and industrial motors. We obtained a breakdown voltage of 1,440 V, threshold of 6 V, and state voltage drop of 1.75 V. This device is superior to conventional IGBTs featuring a planar gate. To derive its electrical characteristics, we extracted design and process parameters. The cell pitch was 0.95 ㎛ and total wafer thickness was 140 ㎛ with a resistivity of 60 Ω·cm. We will apply these results to achieve fine-pitch gate power devices suitable for electrical automotive industries.

Effects of Substrate and Surface Energy on Ink-jet Printing

  • Lee, Jin-Ho;Kim, Hong-Doo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.1457-1458
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    • 2009
  • The fundamental parameters controlling ink-jet printing liquids are the viscosity and surface energy. The wetting contact angle determines the spread of a liquid drop on the surface and depends on the relative surface energy. The characteristics of silver ink-jet printing were studied with control of surface energy and head temperature. Polyethylene terephthalate(PET) film and Si-wafer(ptype) were used as substrates and atmospheric plasma was treated to control the surface energy. With silver ink, the hydrophilic surface treatment could reduce the radius of droplets due to the hydrophobic nature of silver ink.

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금속 범프와 마이크로 채널 액체 냉각 구조를 이용한 소자의 열 관리 연구 (IC Thermal Management Using Microchannel Liquid Cooling Structure with Various Metal Bumps)

  • 원용현;김성동;김사라은경
    • 마이크로전자및패키징학회지
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    • 제23권2호
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    • pp.73-78
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    • 2016
  • 집적회로(Integrated Circuit) 소자의 트랜지스터(transistor) 밀도 증가는 소자에서 발생하는 열 방출(heat dissipation)의 급격한 상승을 초래하여 열 문제를 발생시키고, 이는 소자의 성능과 열적 신뢰성에 영향을 크게 미친다. 열문제의 해결방안 중 본 연구에서는 냉매를 이용한 액체 냉각방법을 연구하였으며, 실리콘 웨이퍼에 관통실리콘비아(through Si via)와 마이크로 채널(microchannel)을 딥 반응성 이온 애칭(deep reactive ion etching)로 구현한 후 유리기판과 어노딕본딩을 통하여 액체 냉각 구조를 제작하였다. 제작된 마이크로 채널 위에 Ag, Cu 또는 Cr/Au/Cu bump를 스크린프린팅(screen printing) 방법으로 형성하였고, 범프의 유무를 통해 액체 냉각 전후의 냉각 모듈의 실리콘 표면온도의 변화를 적외선현미경으로 분석하였다. Cr/Au/Cu bump가 탑재된 액체 냉각 모듈의 경우 가열온도 $200^{\circ}C$에서 냉각 전후의 실리콘 표면 온도 차이는 약 $45.2^{\circ}C$이고, 전력밀도 감소는 약 $2.8W/cm^2$ 이었다.