• 한국재료학회:학술대회논문집
• /
• 한국재료학회 2011년도 추계학술발표대회
• /
• pp.21.1-21.1
• /
• 2011

Vertically aligned single-crystal ZnO nanowires have been successfully grown on c-plane sapphire substrate using chemical vapor deposition (CVD) without catalyst. According to growth temperatures, it was changed ZnO growth characteristic. We investigated the effect of substrate temperatures on the growth ZnO films or nanowires on c-plane (0001) sapphire substrates. The ZnO films were acquired at $500^{\circ}C$, whereas the ZnO nanowires were obtained at $600^{\circ}C$, $700^{\circ}C$, and $800^{\circ}C$. The growth behavior diameter and growth rate of ZnO were changed due to different temperature. As a result of analyzing in-plane residual stress by X-ray diffraction, the optimized condition of ZnO nanowires were at $600^{\circ}C$.

• 대한기계학회:학술대회논문집
• /
• 대한기계학회 2008년도 추계학술대회A
• /
• pp.1582-1584
• /
• 2008

This paper reports a simple fabrication method for creating the superhydrophobic polymer surface using a plasma etching. Generally, it is necessary for the superhydrophobic surfaces to have a rough structure on surface with the composition of the low surface energy. In this study, Poly(methyl methacrylate) (PMMA), poly(ethylene terephthalate) (PET), acrylonitrile butadiene styrene (ABS) with superhydrophobic surface were fabricated using $O_2$ plasma etching and vapor deposition with the fluoroalkylsilane self-assembled monolayers. The plasma treated polymer surfaces are covered with the nano-pillar shaped structures after treatment for $1{\sim}2min$. And these samples with FOTS SAMs coating are showed the superhydrophobicity having the water contact angle of around $150^{\circ}$ and sometimes around $180^{\circ}$ depending on the treatment time. Furthermore the nanostructured polymer is transparent for the visible light.

• Environmental Engineering Research
• /
• 제7권4호
• /
• pp.227-237
• /
• 2002

Chemical vapor deposition (CVD), ion beam sputtering (IBS) and sol-gel method were used to prepare TiO$_2$ thin films for degradation of hazardous organic compounds exemplified by 2-chlorophenol (2-CP). The influence of supporting materials and coating methods on the photocatalytic activity of the TiO$_2$ thin films were also studied. TiO$_2$ thin films were coated onto various supporting materials including steel cloth (SS), copper cloth, quartz glass tube (QGT), and silica gel (SG). Results indicate that SS (37 μm)- TiO$_2$ thin film prepared by IBS method improves the photodegradation of 2-CP. Among all supporting materials studied, SS(37 μm) is found to be the best support.

• 한국정보디스플레이학회:학술대회논문집
• /
• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
• /
• pp.760-763
• /
• 2007

The properties of carbon nanotube obtained by thermal chemical vapor deposition (CVD) process were investigated as a function of ammonia $(NH_3)$ gas in hydrocarbon gas, Fe catalyst thickness, and growth temperature. Fe catalyst was prepared by DC magnetron sputter and pre-treated with ammonia gas. CNTs were then grown with ammonia-acetylene gas mixture by thermal CVD. The diameter of these CNTs shows a strong correlation with the gas rate, the catalyst film thickness and temperature. From our results, it was found that the factors of grown CNTs positively acted to improve CNT quality.

• 마이크로전자및패키징학회지
• /
• 제19권1호
• /
• pp.61-66
• /
• 2012

반도체 산업에서 회로의 고집적화와 다층구조를 형성하기 위해 화학적-기계적 연마(CMP: Chemical-Mechanical Planarization) 공정이 도입되었으며 반도체 패턴의 미세화와 다층화에 따라 화학적-기계적 연마 공정의 중요성은 더욱 강조되고 있다. 화학적-기계적 연마공정이란 화학적 반응과 기계적 힘을 동시에 이용하여 표면을 평탄화하는 공정으로, 화학적-기계적 연마 공정은 압력, 속도 등의 공정조건과, 화학적 반응을 유도하는 슬러리(Slurry), 기계적 힘을 위한 패드 등에 의해 복합적으로 영향을 받는다. 패드 컨디셔닝이란 컨디셔너가 화학적-기계적 연마 공정 중에 지속적으로 패드 표면을 연마하여 패드의 손상된 부분을 제거하고 새로운 표면을 노출시켜 패드의 상태를 일정하게 유지시키는 것을 말한다. 한편, 금속박막의 화학적-기계적 연마 공정에 사용되는 슬러리는 금속박막과 산화반응을 하기 위하여 산화제를 포함하는데, 산화제는 금속 컨디셔너 표면을 산화시켜 부식을 야기한다. 컨디셔너의 표면부식은 반도체 수율에 직접적인 영향을 줄 수 있는 스크래치(Scratch) 등을 발생시킬 뿐만 아니라, 컨디셔너의 수명도 저하시키게 되므로 이를 방지하기 위한 노력이 매우 중요하다. 본 연구에서는 컨디셔너 표면에 슬러리와 컨디셔너 표면 간에 일어나는 표면부식을 방지하기 위하여 유기박막을 표면에 증착하여 부식을 방지하고자 하였다. 컨디셔너 제작에 사용되는 금속인 니켈과 니켈 합금을 기판으로 하고, 증착된 유기박막으로는 자기조립단분자막(SAM: Self-Assembled Monolayer)과 불화탄소(FC: FluoroCarbon) 박막을 증착하였다. 자기조립단분자막은 2가지 전구체(Perfluoroctyltrichloro silane(FOTS), Dodecanethiol(DT))를 사용하여 기상 자기조립 단분자막 증착(Vapor SAM) 방법으로 증착하였고, 불화탄소막은 10 nm, 50 nm, 100 nm 두께로 PE-CVD(Plasma Enhanced-Chemical Vapor Deposition, SRN-504, Sorona, Korea) 방법으로 증착하여 표면의 부식특성을 평가하였다. 표면 부식 특성은 동전위분극법(Potentiodynamic Polarization)과 전기화학적 임피던스 측정법(Electrochemical Impedance Spectroscopy(EIS)) 등의 전기화학 분석법을 사용하여 평가되었다. 또한 측정된 임피던스 데이터를 전기적 등가회로(Electrical Equivalent Circuit) 모델에 적용하여 부식 방지 효율을 계산하였다. 동전위분극법과 EIS의 결과 분석으로부터 유기박막이 증착된 표면의 부식전류밀도가 감소하고, 임피던스가 증가하는 것을 확인하였다.

• 대한기계학회논문집A
• /
• 제32권3호
• /
• pp.209-216
• /
• 2008

The application of focused ion beam (FIB) depends on the optimal interaction of the operation parameters between operating parameters which control beam and samples on the stage during the FIB deposition process. This deposition process was investigated systematically in C precursor gas. Under the fine beam conditions (30kV, 40nm beam size, etc), the effect of considered process parameters - dwell time, beam overlap, incident beam angle to tilted surface, minimum frame time and pattern size were investigated from deposition results by the design of experiment. For the process analysis, influence of the parameters on FIB-CVD process was examined with respect to dimensions and constructed shapes of single and multi- patterns. Throughout the single patterning process, optimal conditions were selected. Multi-patterning deposition were presented to show the effect of on-stage parameters. The analysis have provided the sequent beam scan method and the aspect-ratio had the most significant influence for the multi-patterning deposition in the FIB processing. The bitmapped scan method was more efficient than the one-by-one scan type method for obtaining high aspect-ratio (Width/Height > 1) patterns.

• 대한기계학회:학술대회논문집
• /
• 대한기계학회 2005년도 창립60주년 기념 추계 학술대회
• /
• pp.230.2-230.2
• /
• 2005

• 한국표면공학회:학술대회논문집
• /
• 한국표면공학회 2009년도 춘계학술대회 논문집
• /
• pp.113-114
• /
• 2009

기존의 습식 및 건식 표면처리 공정의 단점을 극복하고, 마그네슘 합금의 가장 큰 문제점인 내식성개선을 위해 열화학기상증착(thermal Chemical Vapor Deposition)법을 이용하여 자기조직화 유기 단분자막(Self-Assembled organic Monolayer, SAM)을 제작하여 마그네슘 합금(AZ31)의 내식성을 검토하였다.

• 한국재료학회:학술대회논문집
• /
• 한국재료학회 2011년도 추계학술발표대회
• /
• pp.37.2-37.2
• /
• 2011

The growth of three-dimensional ZnO hybrid structures by metal-organic chemical vapor deposition was controlled through their growth pressure. Vertically aligned ZnO nanorods were grown on c-plane sapphire substrate at $600^{\circ}C$ and 400 Torr. ZnO film was then formed in-situ on the ZnO nanorods at $600^{\circ}C$ and 10 Torr. High-resolution X-ray diffraction and transmission electron microscopy measurements showed that the ZnO film on the nanorods/sapphire grew epitaxially, and that the ZnO film/nanorods hybrid structures had well-ordered wurtzite structures. The hybrid ZnO structure was shown to be about 5 ${\mu}m$ by field-emission scanning electron microscopy. The hybrid structure showed better crystalline quality than mono-layer film on sapphire substrate. Consequently, purpose of this work is developing high quality hybrid epi-growth technology using nano structure. These structures have potential applicability as nanobuilding blocks in nanodevices.

• 한국결정성장학회지
• /
• 제17권3호
• /
• pp.91-94
• /
• 2007

Vapor liquid solid 기구에 의한 열화학기상증착법을 이용하여 Si (001) 기판 위에 $SnO_2$ 나노와이어를 성장시켰다. Au 박막 (3 nm)을 성장을 위한 촉매로 사용하여 Si(001) 기판 이에 순수 SnO powder (purity, 99.9%)를 반응 원료로 대기압 하 $950{\sim}100^{\circ}C$ 온도 범위, $750{\sim}800\;sccm$ 아르곤 분위기에서 $SnO_2$ 나노와이어를 성장시켰다. X-ray diffraction 분석을 통해 성장한 $SnO_2$ 나노와이어가 tetragonal rutile 구조임을 확인하였고, transmission electron microscopy 분석을 통해 단일 나노와이어의 결정 특성을 분석하였다. 또한, 상온 photoluminescence 분석을 통해 나노와이어 샘플로부터 600 nm 부근에서 나타나는 defect level 천이에 의한 넓은 emission band를 확인함으로써 성장한 나노와이어 $SnO_2$임을 확인하였다.