• 제목/요약/키워드: van der walls (VDW)

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Washing Effects on Generation of Pretilt Angle in NLC, 5CB, on a Polyimide Surface with Trifluoromethyl Moieties

  • Lee, Sang-Keuk;Hwang, Jeoung-Yeon;Seo, Dae-Shik
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 춘계학술대회 논문집 디스플레이 광소자분야
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    • pp.133-135
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    • 2003
  • The washing effects on pretilt angle generation in a nematic liquid crystal (NLC), 4-n-pentyl-4’-cyanobiphenyl (5CB) on a rubbed polyimide (PI) surface with trifluoromethyl moiety have been successfully studied. The pretilt angle of 5CB is increased by the washing process on the rubbed PI surface. The surface tension on the rubbed PI surface increases with the rubbing strength RS and then saturated above RS=150 mm. The pretilt angle of 5CB for all washing processes on the rubbed PI surface decreases with the surface tension. We have found that the pretilt angle of 5CB on the rubbed PI surface may be attributed van der walls (VDW) dispersion interaction between the LC molecules and the polymer surfaces having trifluoromethyl moieties.

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Washing Effects on Generation of Pretilt Angle in NLC, 5CB, on a Polyimide Surface with Trifluoromethyl Moieties

  • Lee, Sang-Keuk;Han, Jeong-Min;Hwang, Jeoung-Yeon;Seo, Dae-Shik
    • Transactions on Electrical and Electronic Materials
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    • 제4권1호
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    • pp.21-23
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    • 2003
  • The washing effects on pretilt angle generation in a nematic liquid crystal (NLC), 4-n-pentyl-4'-cyanobiphenyl (5CB) on a rubbed polyimide (PI) surface with trifluoromethyl moiety have been successfully studied. The pretilt angle of 5CB is increased by the washing process on the rubbed PI surface. The surface tension on the rubbed PI surface increases with the rubbing strength RS and then saturated above RS: 150 mm. The pretilt angle of 5CB for all washing processes on the rubbed PI surface decreases with the surface tension. We have found that the pretilt angle of 5CB on the rubbed PI surface may be attributed van der walls (VDW) dispersion interaction between the LC molecules and the polymer surfaces having trifluoromethyl moieties.