• 제목/요약/키워드: vacuum process

검색결과 2,247건 처리시간 0.031초

Rapid Tooling of Porous Ceramic Mold Using Slip Casting (슬립 캐스팅을 이용한 통기성 세라믹형의 쾌속 제작)

  • Chung, Sung-Il;Jeong, Du-Su;Im, Yong-Gwan;Jeong, Hae-Do;Cho, Kyu-Kap
    • Journal of the Korean Society for Precision Engineering
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    • 제16권5호통권98호
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    • pp.98-103
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    • 1999
  • The application field of porous mold is more and more expended. A mixture of alumina and cast iron is used for making porous mold using slip and vacuum casting method in this study. Slip casting is a process that slurry is poured into silicon rubber mold, dried in vacuum oven, debinded and sintered in furnace, In this procedure, slurry is composed of powder, binder, dispersion agent, and water. Vacuum casting is a technique for removing air bubbles existed in the slurry under vacuum condition. Since ceramics has a tendency of over-shrinkage after sintering, cast iron is used to compensate dimensional change. The results shows that sintering temperature has a great effect on characteristics of alumina-cast iron composite sintered parts. Finally ceramic-metal composite sintered mold can be used for aluminum alloy casting of shoe mold using this process.

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Highly Improved Electrical Properties of A1/CaF2/Diamond MISFET Fabricated by Ultrahigh Vacuum Process and Its Application to Inverter Circuit (초고진공 프로세스에 의해 제작된 A/CaF2/Diamond MISFET의 개선된 전기적 특성과 인버터회로에의 응용)

  • Yun, Young
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • 제14권5호
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    • pp.536-541
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    • 2003
  • In order to avoid oxygen contamination on the diamond surface as far as possible during the device process, the A1/Ca $F_2$/diamond MISFET(metal-insulator-semiconductor field-effect transistor) was prepared by ultrahigh vacuum process and its electrical properties were investigated. The surface conductive layer of fluorinated diamond surface was employed for the conducting channel of the MISFET. The observed effective mobility(${\mu}$e$\_$ff/) of the MISFET was 300 c $m^2$/Vs, which is the highest value obtained until now in the diamond FET. Besides, the measured surface state density of the device was ∼10$\^$11//c $m^2$ eV, which is comparable with conventional Si MOSFET$\_$s/(metal-oxide-semiconductor field-effect-transistors). This work is the first report of the fluorinated diamond MISFET prepared by ultrahigh vacuum process and its application to inverter circuit.

A study on Resin Filling Analysis and Experiment by VAP and VaRTM Processes (VaRTM과 VAP 공정의 수지 충진실험 및 해석에 관한 연구)

  • Dong-Hwan Yoon;Kyeong-Ho Seo;Yu-Jung Kwon;Jin-Ho Choi
    • Composites Research
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    • 제36권5호
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    • pp.310-314
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    • 2023
  • VaRTM(Vacuum assisted resin transfer molding) and VAP(Vacuum assisted process) processes are a type of RTM(Resin transfer molding) process, and are typical out-of-autoclave (OOA) processes that can manufacture large structures at low cost. In this paper, a resin filling test was conducted to compare the VaRTM and VAP processes, and the filling process and dimensional stability were compared. In addition, an analysis method to simulate the filling process was developed, and a dielectric sensor was used to detect the flow front of the resin, which was compared with the analysis results. From the resin filling test, the total filling time of the composite plate was measured to be 48 minutes for the VAP process and 145 minutes for the VaRTM process, and the filling time by the VAP process was reduced by about 67%. In addition, it was confirmed that the VAP process was superior to the VaRTM process in the thickness control ability and uniformity of the composite plate.

Reaction process in electrochromism of tungsten oxide thin films

  • An, Il-Sin;Lee, Chang-Hyo;Lim, Won-Taeg
    • Journal of Korean Vacuum Science & Technology
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    • 제2권2호
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    • pp.85-91
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    • 1998
  • The electrochromic behaviors of de-magnetron sputtered tungsten oxide thin films were investigated during coloration and bleach cycles using in situ real-time spectroscopic ellipsometry. Effective medium approximation and least-squares regression analyses were employed to investigate the electrochromic process. The optical properties of the tungsten oxide film were analyzed using the oscillator model and the evolution of the process using a reaction-limited model. In these analyses, we found that two different reaction rates were associated with the process. We ascribe this behavior to the microstructure of this films.

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The research of dependency between trigger condition and trigger geometry for triggered vacuum switch

  • Park, Ung-Hwa;Kim, Mu-Sang;Son, Yun-Gyu;Lee, Byeong-Jun
    • Proceedings of the Korean Vacuum Society Conference
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.228.2-228.2
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    • 2016
  • The triggered vacuum switch (TVS) discharges high current through two processes. In the first process, an igniting plasma is generated at a trigger system, and the next process that a main discharge is taken place sequentially at a six-gap rod electrode within a few microsecond. In general, a triggered voltage producing the igniting plasma is increased. However, after several hundred shots, it goes down and stable, in our experiment the trigger voltage is about 5 kV after 250 shots. This triggered characteristics comes from the ceramic insulator which is covered by an electrode material, therefore we have focused on the first igniting plasma process. The igniting plasma has been generated at the surface of a ceramic insulator under a strong electric field. The electric field can be increased through modifying geometries of trigger components which compose of a trigger pin, a ceramic insulator and an enclosed holder. We fabricated not only two types of trigger pin which are a plane head and an umbrella head type, but two different holders which are a concave and a convex type. In this paper the result that the dependency of geometries for these four combined types is included, but the study of the ceramic insulator is not. The research of the ceramic insulator will be announced in the other paper.

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Development of a Housing Component for an Auto-compressor Using Vacuum Ladling Die Casting (진공급탕식 다이캐스팅법을 이용한 자동차 콤프레서용 하우징 부품 개발)

  • Lee, H.S.;Park, J.S.
    • Transactions of Materials Processing
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    • 제21권3호
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    • pp.195-201
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    • 2012
  • A vacuum ladling die casting system is suggested as a means to obtain a high vacuum level. A high vacuum of 17.8 mmHg is obtained by sealing the inner space of the mould. The sample product is a rear-head housing for an auto-compressor, and the die-casting with 6-cavities was conducted. The flow analysis shows that the filling speed during vacuum ladling is faster than for a non-vacuum system. The air holes in the sample product were too small to be seen with the naked eye in X-ray films. Density tests show that the high vacuum ladling system reduces the internal porosity as much as 57.8% when compared to the non-vacuum system. A defective rate of only 0.17% was found from leak testing. The results of this research prove that the high vacuum die-casting process is useful for manufacturing of aluminium components under high internal pressure.

Simulation of Conductance Effects on Vacuum Characteristics of High Vacuum System for Semiconductor Processing (반도체공정 고진공시스템 진공특성에 대한 배기도관 컨덕턴스 영향 전산모사)

  • Kim, Hyung-Taek;Seo, Man-Jae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • 제23권4호
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    • pp.287-292
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    • 2010
  • Effect of conductance factors on performance of vacuum system was simulated for optimum design of vacuum system. In this investigation, the feasibility of modeling mechanism for VacSim$^{Multi}$ simulator was proposed. Application specific design of vacuum system is required to meet the particular process conditions for various industrial implementations of vacuum equipments. Geometry and length, diameter of exhaust pipeline were modeled as simulation modeling variables for conductance effects. Series vacuum system was modeled and simulated with varied dimensions and structures of exhaust pipeline. Variation of pipeline diameter showed the more significant effects on vacuum characteristics than that of pipeline length variations. It was also observed that the aperture structure of pipeline had the superior vacuum characteristics among the modeled systems.

Simulation of Vacuum Characteristics in Semiconductor Processing Vacuum System by the Combination of Vacuum Pumps (진공펌프 조합에 의한 반도체공정 진공시스템 진공특성 전산모사)

  • Kim, Hyung-Taek;Kim, Dae-Yeon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • 제24권6호
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    • pp.449-457
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    • 2011
  • Effect of pump combinations on the vacuum characteristics of vacuum system was simulated for optimum design of system. In this investigation, the feasibility of modelling mechanism for VacSimMulti simulator was proposed. Simulation results of various pumping combinations showed the possibilities and reliabilities of simulation for the performance of vacuum system in specific semiconductor processing. Simulation of roughing pump presented the expected pumping behaviors based on commercial specifications of employed pumps. Application of booster pump exhibited the high pumping efficiency for middle vacuum range. Combinations of optimum backing pump for diffusion and turbo vacuum system were obtained. And, the predictable characteristics of process application of both simulated systems were also acquired.