• Korean Journal of Materials Research
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• v.24 no.2
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• pp.98-104
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• 2014

Vacuum kinetic spray(VKS) is a relatively advanced process for fabricating thin/thick and dense ceramic coatings via submicron-sized particle impact at room temperature. However, unfortunately, the particle velocity, which is an important value for investigating the deposition mechanism, has not been clarified yet. Thus, in this research, VKS average particle velocities were derived by numerical analysis method(CFD: computational fluid dynamics) connected with an experimental approach(SCM: slit cell method). When the process gas or powder particles are accelerated by a compressive force generated by gas pressure in kinetic spraying, a tensile force generated by the vacuum in the VKS system accelerates the process gas. As a result, the gas is able to reach supersonic speed even though only 0.6MPa gas pressure is used in VKS. In addition, small size powders can be accelerated up to supersonic velocity by means of the drag-force of the low pressure process gas flow. Furthermore, in this process, the increase of gas flow makes the drag-force stronger and gas distribution more homogenized in the pipe, by which the total particle average velocity becomes higher and the difference between max. and min. particle velocity decreases. Consequently, the control of particle size and gas flow rate are important factors in making the velocity of particles high enough for successful deposition in the VKS system.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.27 no.1
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• pp.22-27
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• 2017

$TiO_2$ films, thickness of $1{\sim}30{\mu}m$ were deposited on glass substrate at room temperature by room temperature granule spray in vacuum. The starting powder was calcinated at $600^{\circ}C$ for 4 h using $Al_2O_3$ crucible in the furnace. The particle size of the $TiO_2$, $1.5{\mu}m$ was measured by a particle size analyzer. The effect of different process parameters such as number of pass, gas flow rate and feeder voltage was studied. As the number of passes increased, the film thickness increased proportionally due to adequate kinetic energy conserved. The effect of three different flow rates (i.e. 15, 25, and 35 LPM) on deposited film was investigated. As gas flow rate increased, the film thickness increased up to 25 LPM and then decreased. Higher feeder voltage with low flow rate of 15 LPM resulted in unsufficient coating thickness due to insufficient kinetic energy. Microstructure of $TiO_2$ films was investigated by scanning electron microscope and high resolution tramission electron microscope.