• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.255-255
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• 2013

WC-Co 초경합금은 실온경도, 고온경도, 강도, 내마모, 내충격 등 기계적 특성이 우수하여 공구재료, 절삭공구 및 고압용 부품 등 다양한 응용분야를 가지고 있으며 WC-Co 분말 코팅같은 경우 항공분야, 일반 공업 분야에 내마모 특성 및 내열특성 향상을 위한 코팅용 소재로서 활용되어 지고 있다. 활용분야가 넓은 WC-Co 초경합금의 제조방법은 WC, Co 분말을 혼합하여 약 900도에서 1차 예비소결 후 원하는 형상 가공 후 약 1,300~1,600도에서 2차 소결을 진행한다. 지금 현재 초경분말의 조성, 크기와 같은 변수들에 따른 초경합금의 기계적 특성 변화에 대한 연구가 계속적으로 진행되고 있다. 본 연구에서는 WC-Co 분말의 소결 특성을 향상시키고자 Planetary ball mill 장비를 활용하여 볼 밀링 공정을 진행하였고 Spark plasma sintering 장비를 활용하여 빠른 소결을 진행하였다. WC-Co 분말의 미세구조, 입도, 조성 및 분산의 변화를 관찰하기 위해 볼 밀링 전, 후 분말을 분석하였고 제조된 분말의 소결 특성을 확인하기 위해 상용화 된 WC-Co 분말의 소결 특성과 비교 평가하였다. 분석 결과 볼 밀링 공정 후 분말은 약 15 ${\mu}m$에서 4.4 ${\mu}m$로 미세해지는 것을 확인하였고 밀링 후 분말로 초경합금을 제작하였을 때 기존 상용화 초경합금제작 온도보다 약 100~400도 낮아지면서 경도 값은 약 20% 향상된 것을 확인할 수 있었다.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.143-143
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• 1999

Co/Ti 다층 박막을 제조하기 위해 직류원 마그네트론 스퍼터링 시스템을 이용하여 (100)실리콘 단결정 기판위에 Co와 Ti층을 각각 2/2, 5/5, 10/10 nm 정도의 두께로 조절하여 세가지 조성의 Co/Ti 다층 박막을 제조하였다. 이러한 Co/Ti 다층 박막의 후속 열처리는 Ar 가스분위기 하에서 Tube furnace를 이용하여 20$0^{\circ}C$와 30$0^{\circ}C$, 40$0^{\circ}C$의 온도에서 진행하였다. 증착초기에서부터 후속 열처리 공정을 진행하는 동안, Co/Ti 다층 박막에서의 계면반응을 미세 구조 변화 및 전기, 자기적 특성변화와 연관지어 관찰하였다. Co/Ti 다층 박막의 결정 구조와 미세 구조 변화를 관찰하기 위해 각각 X-선 회절기와 투과 전자 현미경을 사용하였고, 다층 박막의 전기적, 자기적 특성 변화를 관찰하기 위해 각각 4점 탐침기, 진동 시료형 자속계를 이용하였다. Co/Ti 다층 박막을 20$0^{\circ}C$의 저온에서 열처리를 한 경우에는 증착 초기의 계면반응에 의해 형성된 비정질 층이 성장하였고, 30$0^{\circ}C$와 40$0^{\circ}C$의 고온에서 열처리를 하는 경우에는 비정질 측의 성장보다는 새로운 화합물 CoTi 결정상이 형성되면서 비정질상은 오히려 감소하였다. 즉, Co/Ti 다층 박막의 계면 반응은 결정질 Co와 Ti을 계면 반응물로 소모시키면서 비정질 층을 성장시키는 비정질화 반응이 활발히 일어났다. 특히, 소모된 계면 반응물로 소모시키면서 비정질 층을 성장시키는 비정질화 반응일 활발히 일어났다. 특히, 계면 반응물로 소모시키면서 비정질 층을 성장시키는 비정질화 반응일 활발히 일어났다. 특히, 소모된 계면 반응물 Co와 Ti 중에서 Ti의 소모속도가 더 빠르게 관찰되었다. 이로부터 Ti 이 증착초기에서 저온 열처리 과정동안 Co/Ti 다층 박막의 계면에서 일어나는 비정질화 반응의 주 확산자로 작용했다는 것을 알 수 있다. 한편, 30$0^{\circ}C$와 40$0^{\circ}C$의 고온에서 열처리한 Co/Ti 다층 박막의 계면 반응은, 비정질 반응에 의한 비정질층의 형성보다는 새로운 화합물 결정질 CoTi상을 형성시키는 결정화 반응이 우세했다. Co/Ti 다층 박막의 전기적 저항은, 열처리에 의한 비정질 층의 생성 및 성장으로 인해 증가하였고 새로운 저저항 CoTi 결정상의 형성으로 인해 감소하는 것을 알 수 있었다. 또한 Co/Ti 다층 박막의 포화 자화값은, 열처리에 의한 계면에서의 비정질화 반응과 CoTi 결정화 반응으로 인해 강자성체인 Co 결정상이 감소됨에 따라 감소하는 경향을 나타냈다.

• Macromolecular Research
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• v.10 no.5
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• pp.273-277
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• 2002

Ultra-thin polymer films containing cobalt(II) meso-tetraphenylporphyrin(CoTPP) have been prepared by vacuum codeposition of the metal complex and trans-2-butene as an organic monomer using an inductively coupled RF glow discharge operating at 7-9 Watts. The polymer films were characterized by sorption measurements. Sorption data obtained for polymer films containing CoTPP indicate that the CoTPP molecules are capable of reversibly binding oxygen molecules. It was found that the adjacent CoTPP molecules in the aggregated metal complex phase could irreversibly share the oxygen molecules. A dispersion of the metal complex molecules in the polymer matrix was made to maintain the reversible reactivity of the metal complex molecules with oxygen in the polymer films via vacuum evaporation process. The Henry mode solubility constant, the Langmuir mode capacity constant, the amount of binding oxygen, and the dissociation equilibrium in the dual mode sorption theory were discussed.

• Journal of the Korean Vacuum Society
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• v.1 no.1
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• pp.106-114
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• 1992

Abstract-Quantitative surface analysis of Co-Ni and Au-Cu alloys by XPS and SIMS was studied. For Co-Ni alloy, quantitative XPS analysis could be done within 1-2% relative error with pure element standards without any correction. For Au-Cu, quantitative XPS analysis was not possible without any correction. But it could be done with standard alloys of various composition within 1-2% relative error. Without standard alloys, Au-Cu alloys could be analyzed by XPS within 10% relative error with pure element standards. For SIMS analysis of Co-Ni alloys, the relative secondary ion yields of Co+/Nit has linear relation with ratio of each composition so that quantitative SIMS analysis was possible for Co-Ni alloys. Preliminary results of XPS round robin test of VAMAS-SCA Japan Project are given.

• The KSFM Journal of Fluid Machinery
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• v.20 no.1
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• pp.5-14
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• 2017

A fan-motor assembly in a vacuum cleaner is analyzed through system-level analysis method. This system consisted of three components, a fan, motor, and the flow resistance of the motor, or of the vacuum cleaner. System-level analysis method is characterized by the combination of torque matching at a constant throttling condition between the fan and the motor and the pressure drop at a constant flow rate due to the flow resistance of the motor, or of the vacuum cleaner. The performance characteristics of the fan-motor assembly and the vacuum cleaner system could be predicted over the whole range of operation, based on the characteristics of each component. The predicted performance of the vacuum cleaner system through system-level analysis agreed well with the experimental results within 4.5% difference of pressure and 6% difference of the efficiency. The effect of flow resistance of a motor is investigated and it is found that the efficiency decrease of fan-motor assembly at the constant flow rate due to the flow resistance of a motor is determined by the flow resistance ratio(FRR), which is defined as a ratio of flow resistance of motor and the flow resistance of a constant throttling condition of a given point. The fan-motor assembly(S2 model) was modified to reduce the FRR from 9.0% to 2.4% and the experimental result shows that the efficiency of S2 model was improved by about 3% at best efficiency point.

• Journal of the Korean institute of surface engineering
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• v.52 no.6
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• pp.283-288
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• 2019

MCrAlY overaly coatings are used as oxidation barrier coatings to prevent degradation of the underlying substrate in high temperature and oxidizing environment of the hot section of gas turbines. Therefore, oxidation resistance in high temperature is important property of MCrAlY coatings. Also, coefficients of thermal expansion (CTE) of MCrAlY have middle value of that of Ni-based superalloys and oxides, which have the effect of preventing the delamination of the surface oxides. Cyclic oxidation test is one of the most useful methods for evaluating the high temperature durability of coatings used in gas turbines. In this study, NiCoCrAlY overlay coatings were formed on Inconel 792(IN 792) substrates by vacuum plasma spraying process. Vacuum plasma sprayed NiCoCrAlY coatings and IN 792 susbstrates were exposed to 1000℃ one-hour cyclic oxidation environment. NiCoCrAlY coatings showed lower weight gain in short-term oxidation. In long-term oxidation, IN 792 substrates showed higher weight loss due to delamination of surface oxide but NiCoCrAlY coatings showed lower weight loss. X-ray diffraction (XRD) analysis showed α-Al2O3 and NiCr₂O₄ was formed during the cyclic oxidation test. Through cross-section observation using scanning electron microscopy (SEM) and electron back scatter diffraction (EBSD) analysis, thermally grown oxide (TGO) layer composed of α-Al₂O₃ and NiCr₂O₄ was formed and the thickness of TGO increased during 1000℃ cyclic oxidation test. β phase in upper side of NiCoCrAlY coating was depleted due to oxidation of Al and outer beta depletion zone thickness also increased as the cyclic oxidation time increased.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.178.1-178.1
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• 2015

In and Ga doped ZnO (IGZO) thin films were prepared by radio frequency magnetron sputtering without intentional substrate heating on glass substrate and TiO2-deposited glass substrates to consider the effect of a thin TiO2 buffer layer on the optical and electrical properties of the films. The thicknesses of the TiO2 buffer layer and IGZO films were kept constant at 5 and 100 nm, respectively. Since the IGZO/TiO2 bi-layered films show the higher FOM value than that of the IGZO single layer films, it is supposed that the IGZO/TiO2 bi-layered films will likely perform better in TCO applications than IGZO single layer films.

• Journal of the Korean Society of Safety
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• v.31 no.3
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• pp.42-46
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• 2016

In LCD Display or semiconductor manufacturing processes, the anti-static technology of glass substrates and wafers becomes one of the most difficult issues which influence the yield of the semiconductor manufacturing. In order to overcome the problems of wafer surface contamination various issues such as ionization in decompressed vacuum and inactive gas(i.e. $N_2$ gas, Ar gas, etc.) environment should be considered. Soft X ray radiation is adequate in air and $O_2$ gas at atmospheric pressure while UV radiation is effective in $N_2$ gas Ar gas and at reduced pressure. At this point of view, the "vacuum ultraviolet ray ionization" is one of the most suitable methods for static elimination. The vacuum ultraviolet can be categorized according to a short wavelength whose value is from 100nm to 200nm. this is also called as an Extreme Ultraviolet. Most of these vacuum ultraviolet is absorbed in various substances including the air in the atmosphere. It is absorbed substances become to transit or expose the electrons, then the ionization is initially activated. In this study, static eliminator based on the vacuum ultraviolet ray under the above mentioned environment was tested and the results show how the ionization performance based on vacuum ultraviolet ray can be optimized. These vacuum ultraviolet ray performs better in extreme atmosphere than an ordinary atmospheric environment. Neutralization capability, therefore, shows its maximum value at $10^{-1}{\sim}10^{-3}$ Torr pressure level, and than starts degrading as pressure is gradually reduced. Neutralization capability at this peak point is higher than that at reduced pressure about $10^4$ times on the atmospheric pressure and by about $10^3$ times on the inactive gas. The introductions of these technology make it possible to perfectly overcome problems caused by static electricity and to manufacture ULSI devices and LCD with high reliability.

• Journal of Powder Materials
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• v.3 no.2
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• pp.97-103
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• 1996

The densification of the compacts of pure Co, Fe+50%.Co and Fe+25% Co sintered under H$_2$ gas or in vacuum was investigated. The effects of AL, Nb, Ti, and V additions on the densification were also studied. The sintered compact of Co was fully-dense when the density of the compact was lower than $Dg^c$. However, above $Dg^{c}$, it was never fully-dense regardless of sintering atmosphere, temperature, and time. The densification of sintered compacts of Fe-50% Co and Fe-25% Co were always incomplete. While the addition of AL made all compacts fully-dense, the addition of Ti was effective for the compacts of Co and Fe-25% Co. V was effective only for the Fe-25% Co. These results tell us that the particle size of Co powder, the amount of Fe, and the amount of additives forming stable oxides play on important role for the complete densification. Therefore it is desirable to reduce or eliminate the equilibrium pressure of H$_{2}$O or CO in isolated pores to obtain a fully-dense sintered compact.

• Journal of the Korean Vacuum Society
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• v.9 no.4
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• pp.335-340
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• 2000

We investigated the role of the capping layers in the formation of the cobalt silicide in Co/Si systems with TiN and Ti capping layers and without capping layers. The Co/Si interfacial reactions and the phase transformations by the rapid thermal annealing (RTA) processes were observed by sheet resistance measurements, XRD, SIMS and TEM analyses for the clean silicon substrate as well as for the chemically oxidized silicon substrate by $H_2SO_4$. We observed the retardation of the cobalt disilicide formation in the Co/Si system with Ti capping layers. In the case of Co/$SiO_2$/Si system, cobalt silicide was formed by the Co/Si reaction due to with the dissociation of the oxide layer by the Ti capping layers.