• 한국전자파학회:학술대회논문집
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• 한국전자파학회 2002년도 종합학술발표회 논문집 Vol.12 No.1
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• pp.352-355
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• 2002

본 논문에서는 series-shunt type의 PIN diode를 사용하여 8 ㎓ (7.7㎓ - 8.3㎓) 에서 사용 가능한 switch를 설계 제작하였다 스위치의 중요한 사양인 격리도 (-50㏈ 미만) 삽입손실(-1.5㏈ 미만) 입력전력 허용치 (평균전력 0.5 watt 이상 ) 입출력 정재파비 (1.3:1) 등을 고려하여 설계하였으며, 제작은 인텍웨이브사의 알루미나 기판을 이용한 thin film 공정을 이용하였으며, 측정 또한 이 네 가지에 중점을 두었다. 격리도는 중심 주파수 근방에서 비교적 넓은 대역을 가지고 -50㏈ 미만이었으며, 삽입손실은 -1.3㏈-1.6㏈였다. 입출력 정재파비는 1 -1.4였다.

• 한국전기전자재료학회논문지
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• 제15권7호
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• pp.634-639
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• 2002

Using laser ablation technique carbon thin films were deposited on Si(100) substrate as a function of substrate temperature. In this study, the surface morphologic, structural and field emission properties of these carbon thin films were investigated using Raman spectroscopy, scanning electron microscopy, and a diode technique, respectively. With increasing of the substrate temperature, the surface morphologies were changed significantly. Moreover, the intensity of D-band and the full width at half maximum of these bands were dependent on substrate temperatures. As the substrate temperature was increased, the field emission properties were improved. As the result, we find that the field emission properties of the films were changed significantly with the substrate temperature and structural features of carbon than films.

• 한국전기전자재료학회논문지
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• 제24권10호
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• pp.817-821
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• 2011

We have proposed an optical thin film and micro lens to improve the luminance of organic light emitting device. The first method, optical thin film was calculated refractive index of dielectric layer material that was modulated refractive index of organic material, ITO (indium tin oxide)and glass. The second method, microlens was applied with lenses on the organic device. Optical thin films were designed with Macleod Simulator and Micro Lenses were calculated by FDTD (finite-difference time-domain) solution. The structure of thin film was designed in organic material/ITO/dielectric layer/glass. The lenses size, height and distance were 5 ${\mu}m$, 1 ${\mu}m$, 1 ${\mu}m$, respectively. The material of micro lenses used silicon dioxide. Result, The highest luminance of OLED which applied with microlens was 11,185 $cd/m^2$, when approval voltage was 14.5 V, applied thin film was 5,857 $cd/m^2$. The device efficiency applying microlens increased 3 times than the device which does not apply microlens.

• 한국자기학회지
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• 제5권5호
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• pp.636-640
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• 1995

FeN thin films were deposited on glass by RF diode reactive sputtering. The films were annealed in the air and in vacuum. The film annealed in the air showed sharp decrease of saturation magnetization and change of easy axis direction to hard axis direction and vice versa after $300^{\circ}C$ anneal. The coercivity decreased down to 0.5 Oe after $400^{\circ}C$ anneal. After $450^{\circ}C$ anneal, the film showed ${\varepsilon}-Fe_{2-3}N$ phase. The films annealed in vacuum showed coercivity increase after $300^{\circ}C$ anneal for the film deposited with initial substrate temperature of $35^{\circ}C$ and after $400^{\circ}C$ anneal for the film deposited with initial substrate temperatue of $170^{\circ}C$. These films showed $Fe_{16}N_{2}$ X-ray peaks after $450^{\circ}C$ anneal.

• 대한전기학회논문지:전력기술부문A
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• 제53권11호
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• pp.619-623
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• 2004

We proposed the bridge type superconducting fault current limiter(SFCL) using switching operation of high-Tc superconducting(HTSC) thin film. The proposed bridge type SFCL consists of HTSC thin film, a diode bridge and a dc reactor. The controller for the operation of an interrupter is required in the conventional bridge type SFCL to prevent the continuous increase of fault current after a fault happens. On the other hand, the proposed bridge type SFCL can limit the fault current without the interrupter and the controller for its operation by the resistance generated when the gradually increased fault current exceeds HTSC thin film's critical current. We calculated the time when the gradually increased fault current started to be limited by the resistance generated in HTSC thin film after a fault happened and confirmed that it could be dependent on the amplitude of source voltage. The experimental results well agreed with the calculated ones from simulation.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2004년도 춘계학술대회 논문집 전기기기 및 에너지변환시스템부문
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• pp.83-85
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• 2004

We proposed the bridge type fault current limiter(FCL) using switching operation of high-Tc superconducting(HTSC) thin film. The proposed bridge type FCL consists of HTSC thin film, a diode bridge and a dc reactor. The controller for the operation of an interrupter is required in the conventional bridge type FCL to prevent the continuous increase of fault current after a fault happens. On the other hand, the proposed bridge type FCL can limit the fault current without the interrupter and the controller for its operation by the resistance generated when the gradually increased fault current exceeds HTSC thin film's critical current. We calculated the time when the gradually increased fault current started to be limited by the resistance generated in HTSC thin film after a fault happened and confirmed that it could be dependent on the amplitude of source voltage. The experimental results well agreed with the calculated ones from simulation.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 추계학술대회 논문집
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• pp.65-65
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• 2009

High temperature silicon carbide Schottky diode was fabricated with Au deposited on poly 3C-SiC thin film grown on p-type Si(100) using atmospheric pressure chemical vapor deposition. The charge transport mechanism of the diode was studied in the temperature range of 300 K to 550 K. The forward and reverse bias currents of the diode increase strongly with temperature and diode shows a non-ideal behavior due to the series resistance and the interface states associated with 3C-SiC. The charge transport mechanism is a temperature activated process, in which, the electrons passes over of the low barriers and in turn, diode has a large ideality factor. The charge transport mechanism of the diode was analyzed by a Gaussian distribution of the Schottky barrier heights due to the Schottky barrier inhomogeneities at the metal-semiconductor interface and the mean barrier height and zero-bias standard deviation values for the diode was found to be 1.82 eV and $s_0$=0.233 V, respectively. The interface state density of the diode was determined using conductance-frequency and it was of order of $9.18{\times}10^{10}eV^{-1}cm^{-2}$.

• 한국재료학회지
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• 제18권7호
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• pp.379-383
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• 2008

We report on the light-emitting diode (LED) characteristics of core-shell CdSe/ZnS nanocrystal quantum dots (QDs) embedded in $TiO_2$thin films on a Si substrate. A simple p-n junction could be formed when nanocrystal QDs on a p-type Si substrate were embedded in ${\sim}5\;nm$ thick $TiO_2$ thin film, which is inherently an n-type semiconductor. The $TiO_2$ thin film was deposited over QDs at $200^{\circ}C$ using plasma-enhanced metallorganic chemical vapor deposition. The LED structure of $TiO_2$/QDs/Si showed typical p-n diode currentvoltage and electroluminescence characteristics. The colloidal core-shell CdSe/ZnS QDs were synthesized via pyrolysis in the range of $220-280^{\circ}C$. Pyrolysis conditions were optimized through systematic studies as functions of synthesis temperature, reaction time, and surfactant amount.

• Journal of Electrical Engineering and Technology
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• 제11권5호
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• pp.1323-1331
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• 2016

• 한국응용과학기술학회지
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• 제20권2호
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• pp.148-153
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• 2003

Electron transfer through an Langmuir-Blodgett(LB) monolayer film sandwiched between metal electrodes. We used an eicosanoic acid material and the material was very famous as a thin film insulating material. Eicosanoic acid monolayer was deposited by Langmuir-Blodgett(LB) technique and a subphase was a $CdCl_2$ solution as a 2${\times}10^{-4}$ mol/L. Also we used a bottom electrode as an Al/$Al_2O_3$ and a top electrode as a Al and Ti/Al. Here, the $Al_2O_3$ on the bottom electrode was deposited by thermal evaporation method. The $Al_2O_3$ layer was acted on a tunneling barrier and insulating layer in tunnel diode. It was found that the proper transfer surface pressure for film deposition was 25 mN/m and the limiting area per molecule was about 24 ${\AA}^2$/molecule. When the positive and negative bias applied to the molecular device, the behavior shows that a tunnel switching characteristics. This result were analyzed regarding various mechanisms.