• 제목/요약/키워드: thin film diode

검색결과 268건 처리시간 0.033초

Green Light-emitting diode using a germyl-substituted PPV derivative

  • Hwang, Do-Hoon;Lee, Jeong-Ik;Cho, Nam-Sung;Shim, Hong-Ku
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
    • /
    • pp.582-584
    • /
    • 2004
  • The light-emitting properties of poly(2-triethylgermyl-1,4-phenylenevinylene) (TEG-PPV) are compared with those of the silyl-substituted PPV homologue, poly(2-trimethylsilyl-1,4phenylenevinylene) (TMS-PPV). The precursor polymer is solution-processable. After carrying out thermal elimination on the precursor polymer film, the resulting fully conjugated polymer film was found to exhibit high thermal stability in air, and absorption that is shifted to the longer wavelength region owing to the extension of the n-conjugated system. TEG-PPV exhibits efficient green light emission; the maximum PL emission of a TEG-PPV thin film was found to be at 515 nm. The HOMO and LUMO energy levels were also determined using photo-emission spectroscopy. The performance of the TEG-PPV EL device was found to be comparable to that of the TMS-PPV device.

  • PDF

Sol-Gel 공정을 이용한 ZnO 쇼트키 다이오드의 제작 및 특성평가 (Fabrication and Characterization of ZnO Schottky Diode Using Sol-Gel Process)

  • 이득희;김경원;박기호;김상식;이상렬
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
    • /
    • pp.390-390
    • /
    • 2010
  • We fabricate Schottky diodes with the contact between a sol-gel derived ZnO layer and Au that guarantees the expected Schottky contact due to the high work function. The formed single metal Schottky barrier shows characteristics comparable to the barrier formed by alloys. Au is deposited by thermal evaporation on a ZnO thin film that is optimally formed under sol-gel process conditions of a 1-mol zinc acetate concentration and a 3000-rpm coating speed. Possible defects. which can provide deleterious current paths. are minimized by patterning the deposited Au. The I-V curve verifies the formation of a Schottky contact. Measurements showed that the Schottky barrier height and leakage current at -5 V were 0.6 eV and $1{\times}10^{-12}A$. respectively.

  • PDF

나노-펄스 노출에 따른 질소 첨가한 $Ge_2Sb_2Te_5$ 박막의 결정화 속도 평가 (An evaluation on crystallization speed of N doped $Ge_2Sb_2Te_5$ thin films by nano-pulse illumination)

  • 송기호;백승철;김흥수;이현용
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
    • /
    • pp.134-134
    • /
    • 2009
  • In this work, we report that crystallization speed as well as the electrical and optical properties about the N-doped $Ge_2Sb_2Te_5$ thin films. The 200-nm-thick N-doped $Ge_2Sb_2Te_5$ thin film was deposited on p-type (100) Si and glass substrate by RF reactive sputtering at room temperature. The amorphous-to-crystalline phase transformation of N-doped $Ge_2Sb_2Te_5$ thin films investigated by X-ray diffraction (XRD). Changes in the optical transmittance of as-deposited and annealed films were measured using a UV-VIS-IR spectrophotometer and four-point probe was used to measure the sheet resistance of N-doped $Ge_2Sb_2Te_5$ thin films annealed at different temperature. In addition, the surface morphology and roughness of the films were observed by Atomic Force Microscope (AFM). The crystalline speed of amorphous N-doped $Ge_2Sb_2Te_5$ films were measured by using nano-pulse scanner with 658 nm laser diode (power : 1~17 mW, pulse duration: 10~460 ns). It was found that the crystalline speed of thin films are decreased by adding N and the crystalline temperature is higher. This means that N-dopant in $Ge_2Sb_2Te_5$ thin film plays a role to suppress amorphous-to-crystalline phase transformation.

  • PDF

Ku-대역 위성중계기용 전압제어형 PIN 다이오드 감쇄기 및 온도보상회로 설계 (Voltage-Controlled PH Diode Attenuator and Temperature Compensation Circuit for Ku-band Satellite Payload)

  • 장병준;염인복;이성팔
    • 한국전자파학회논문지
    • /
    • 제13권5호
    • /
    • pp.484-491
    • /
    • 2002
  • 본 연구에서는 Ku-대역 위성통신 중계기에 사용되는 전압제어형 PIN 다이오드 감쇄기를 설계, 제작, 측정하고 이 감쇄기의 온도 특성 변화를 보상하기 위한 온도보상회로를 제안하였다. PIN 다이오드 감쇄기는 박막 하이브리드 기술을 이용하여 설계되었으며 PIN 다이오드 감쇄기를 전압제어형으로 사용할 경우 최대 선형 특성을 얻을 수 있는 부하 저항(R$_{L}$)의 값을 Simulation 및 실험에 의해 결정되었다. 최적의 부하 저항값은 사용한 PIN 다이오드의 특성에 의해 달라지며, 본 논문에서 사용한 APD-0805의 경우 150$\Omega$의 부하저항으로 PIN 다이오드 한 개에 10 dB 까지 선형 감쇄범위를 얻을 수 있었다. 또한 부하 저항을 포함한 PM 다이오드 감쇄기의 온도 특성을 측정하였고, 측정결과 관찰된 PIN 다이오드 감쇄기가 전압제어형으로 사용되어질 경우의 가장 큰 단점인 온도 특성의 심각한 변화를 보상할 수 있는 온도보상회로를 제안하였다. 제안된 온도보상회로를 갖는 PIN 다이오드 감쇄기는 동작온도에 대해 선형적인 특성을 보이며 동작온도 범위에 걸쳐 0.6 dB 이하의 오차만을 가짐을 확인하였다.

Pt-$SnO_2$-SiC 쇼트키 다이오드 구조를 갖는 CO 가스 감지특성에 관한 연구 (A study on monoxide gas sensing characteristics of Pt-$SnO_2$-SiC Schottky diode)

  • 이주헌;이재홍;장석원;이의식;김창교
    • 대한전기학회:학술대회논문집
    • /
    • 대한전기학회 2004년도 하계학술대회 논문집 C
    • /
    • pp.1555-1557
    • /
    • 2004
  • The Pt-doped $SnO_2$ thin film for CO sensor applications obtained by RF sputtering from a target of the same compound in an Ar-$O_2$ atmosphere. Pt-SnO2-SiC Schottky diode detection of CO gas Cause the remarkable change in electrical resistivity of the semiconductor. the good gas sensitivity is shown when annealing condition is 600$^{\circ}C$, 1hr in RTP and detected temperature is 350$^{\circ}C$.

  • PDF

High-Performance Q-Band MMIC Phase Shifters Using InGaAs PIN Diodes

  • Kim, Mun-Ho;Yang, Jung-Gil;Yang, Kyoung-Hoon
    • Journal of electromagnetic engineering and science
    • /
    • 제9권3호
    • /
    • pp.159-163
    • /
    • 2009
  • This paper presents the design and implementation of Q-band MMIC phase shifters using InGaAs PIN diodes. The topology using a thin-film microstrip line(TFMS) has been proposed to achieve the desired phase-shift as well as good loss characteristics. Five single-bit MMIC phase shifters have been implemented by using a developed BCB(benzocyclobutene)-based multi-layer fabrication technology. The developed phase shifters have less than 3.4 dB of insertion loss and better than 11 dB of input and output return loss in the frequency range of 43 to 47 GHz. To the authors' knowledge, this is the first demonstration of high-performance InGaAs PIN diode-based MMIC phase shifters operating at Q-band frequencies.

Implementation of Charge-Pump Active-Matrix OLED Panel with $64\;{\times}\;64$ Pixels Using $ITO/SiO_2/ITO$ Capacitors and a-Si:H Schottky Diodes

  • Na, Se-Hwan;Seo, Jong-Wook;Kwak, Mi-Young;Shim, Jae-Hoon
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
    • /
    • pp.1267-1270
    • /
    • 2006
  • Organic light-emitting diode (OLED) display panel with $64\;{\times}\;64$ pixels utilizing the charge-pump (CP) pixel addressing method was fabricated using conventional thin-film processes. Each pixel consists of a-Si:H Schottky diode and $ITO/SiO_2/ITO$ capacitor. It is shown that CP-OLED is technically feasible for information display and a driving voltage below $4V_{pp}$ is enough for nominal operation.

  • PDF

고온 가스센서용 Pd-다결정 3C-SiC 쇼트키 다이오드의 특성 (Characteristics of Pd/polycrystalline 3C-SiC Schottky diodes for high temperature gas sensors)

  • 안정학;정귀상
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
    • /
    • pp.275-275
    • /
    • 2008
  • This paper describe the fabrication of a Pd/polycrystalline 3C-SiC schottky diode and its characteristics, in which the polycrystalline 3C-SiC layer and Pd Schottky contact were deposited by using APCVD and sputter, respectively. Crystalline quality, uniformity, and preferred orientations of the Pd thin film were evaluated by SEM and XRD, respectively. Pd/poly 3C-SiC Schottky diodes were fabricated and characterized by I-V and C-V measurements. Its electric current density Js and barrier height voltage were measured as $2\times10^{-3}$ A/$cm^2$ and 0.58 eV, respectively. These devices were operated until about $400^{\circ}C$. Therefore, from these results, Pd/poly 3C-SiC Schottky devices have very high potential for high temperature chemical sensor applications.

  • PDF

레이저를 이용한 차세대 평판 디스플레이 공정 (Laser Microfabrications for Next-Generation Flat Panel Display)

  • 김광열
    • 한국재료학회지
    • /
    • 제17권7호
    • /
    • pp.352-357
    • /
    • 2007
  • Since a pattern defects "repair" system using a diode pumped solid state laser for Flat Panel Display (FPD) was suggested, a lot of laser systems have been explored and developed for mass-production microfabrication process. A maskless lithography system using 405 nm violet laser and Digital Micromirror Device (DMD) has been developed for PDP and Liquid Crystal Display (LCD) Thin Film Transistor (TFT) photolithography process. In addition, a "Laser Direct Patterning" system for Indium Tin Oxide (ITO) for Plasma Display Panel(PDP) has been evaluated one of the best successful examples for laser application system which is applied for mass-production lines. The "heat" and "solvent" free laser microfabrications process will be widely used because the next-generation flat panel displays, Flexible Display and Organic Light Emitting Diode (OLED) should use plastic substrates and organic materials which are very difficult to process using traditional fabrication methods.