• Journal of the Korean Ceramic Society
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• v.32 no.10
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• pp.1103-1110
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• 1995

Silicon carbide (SiC) films have been deposited on the isotropic graphite by chemical vapor deposition. Change of deposition parameters affected significantly the microstructure and preferred orientation of SiC films. Preferred orientation of SiC films was (111) or (220), and microstructure showed the startified structure consisting of small crystallite or faceted columnar structure depending on the deposition parameters. For microhardness, (111) oriented film and stratified structure were superior to (220) oriented film and faceted columnar structure, respectively. Surface of (111) oriented films was less rough than that of (220) oriented films. Adhesion force between graphite substrate and SiC films was above 100N for crystalline films and 49N for amorphous film.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.11a
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• pp.246-250
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• 2000

Reactive radio frequency (RF)magnetron sputter has been used to deposit AlN thin film on a Si substrate. (002)Preferred orientation of AlN thin film has been obtained at low sputtering pressure and high $\textrm{N}_2$ concentration. Also it has been shown that properties of AlN thin film are affected by presputtering time. As presputtering time increased aluminum and nitride concentration of AlN thin film decreased. But oxygen concentration and grain size increased. The good preferred orientation was shown with the short presputtering time.

• Journal of the Korean institute of surface engineering
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• v.36 no.6
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• pp.444-454
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• 2003

The effect of trace metallic additives of Al-Fe-X on microstructure, glossiness and hardness of Zn electrodeposits was investigated by using sulfate bath. The preferred orientation of Zn deposits with Al-Fe additives was (10 l)(l:3,4,2), while that of Zn deposits with Al-Fe-X(Ni,Co) additives was either (002) or (002)＋(103)ㆍ(104) mixed orientation. The preferred orientation of Zn deposits with Al-Fe-Cr additives changed from (002)+(10 l) to (10 l) orientation with increasing amount of Al additive. The surface morphology of the Zn deposits was closely related to the preferred orientation of the deposits. The glossiness of Zn deposits with Al-Fe additives increased in comparison with that of pure Zn deposit. That of the Zn deposits with Al-Fe-X additives was related to the morphology of the deposits and changed according to type of additives. The hardness of Zn deposits with Al-Fe-X(Ni,Co,Cr) additives was noticeably higher than that of Zn deposits with Al-Fe additives.

• Journal of the Korean Vacuum Society
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• v.15 no.6
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• pp.619-623
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• 2006

The most important factor which determines resonance characteristics of FBAR(Film Bulk Acoustic Resonator) is the piezoelectricity of piezoelectric film. The piezoelectric properties of ZnO thin films which is strong as FBAR piezoelectric film is determined by the degree of c-axis preferred orientation with (002) plan. Therefore, many researchers have been interested in the study on the preferred orientation of the piezoelectric thin film. This paper has studied the preferred orientation of ZnO piezoelectric thin films using the helped seed layer of ZnO. The result shows that the c-axis ZnO thin films with columnar grains that the value of standard $deviation(\sigma)$ of XRD rocking curve is of $\sigma=1.15^{\circ}$ have the excellent piezoelectric property.

• Journal of the Korean institute of surface engineering
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• v.16 no.4
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• pp.173-187
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• 1983

Zinc was electrodeposited at temperature from 20$^{\circ}C$ to 60$^{\circ}C$ over the ranges of the current density from 2 to 20 A/dm2 in acid chloride bath. The cathode overpotentials increased with increasing current density and decreasing tem-perature. The (10$.$3)-(10$.$2) preferred orientation developed at cathode overpotentials below about 450mV, the (10$.$3)(10$.$2)-(10$.$1) texture developed at overpotentials between 500mV and 950mV, and the (00$.$1) (10$.$3) texture developed at cathode overpotentials about 1000mV. The (00$.$1) (10$.$3) preferred orientation was also formed at the lower potentials between 400mV and 850mV at temperatures above 40$^{\circ}C$. The preferred orientations of the zinc deposits was discussed was discussed with both cathode overpo-tential and surface energy of deposit lattice planes. The pyramid type of structure with macrostep developed at low cathode overpotentials and the truncated pyramidal type developed at higher overpotenial.

• Journal of the Korean institute of surface engineering
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• v.28 no.6
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• pp.352-360
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• 1995

The effect of electrolysis conditions on the composition, the magnetic properties and the preferred orientation of Ni-Fe-Co alloy deposits was investigated using the sulfate-chloride bath paddle agitated. Cathode current efficiency increases with the current density, showing the different tendency of the variation from that of the Ni-Fe electrodeposits. The Co content of the deposits decreases with increasing current density, while the content of Ni and Fe is shown to be minimum or maximum at 3A/$dm^2$ respectively. The Ni/Fe ratio of the alloy deposits is lower than that of Ni-Fe deposits. The coercive force($H_c$) of the deposits increases with the Co content in deposit, showing the relatively low value in the range of 1.8~5.0Wt.% Co. The anisotropy field ($H_k$) of the deposits is higher than that of Ni-Fe alloy deposits, The preferred orientation of the deposits is generally (200), but the orientation factor(R) changes with both the increase of current density and the magnetic field applied during deposition.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.07a
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• pp.395-398
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• 2000

Reactive radio frequency (RF)magnetron sputter with incident angle has been used to deposit AlN thin film on a crystalline Si substrate. (002)Preferred orientation of AlN thin film has been obtained at low sputtering pressure. Also it has been shown that depostion rate of AIN thin film is affected by fraction Ar and $N_2$ partial pressure. But substrate temperature didn't affect depostion rate of AIN thin film . As sputtering pressure increased preferred orientation degraded. The internal stress changed from tensile stress to compressive stress as fraction of $N_2$ partial pressure increased. At low nitrogen partial pressure cermet$^{[1]}$ AIN thin film is obtained.

• Journal of the Korean Ceramic Society
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• v.50 no.1
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• pp.43-49
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• 2013

${\beta}$-SiC was deposited onto a graphite substrate by a LPCVD method and the effect of the crystallographic orientation on mechanical properties of the deposited SiC was investigated. The deposition was performed at $1300^{\circ}C$ in a cylindrical hot-wall LPCVD system by varying the deposition pressure and total flow rate. The texture and crystallographic orientation of the SiC were evaluated by XRD. The deposition rate increased linearly with the gas flow rate from 800 sccm to 1600 sccm. It also increased with the pressure but became saturated above a total pressure of 3.3 kPa. In the range of 3.3 - 10 kPa, the preferred orientation changed from the (220) and (311) planes to the (111) plane. The hardness and elastic modulus showed maximum values when the SiC had the (111) preferred orientation, though it gradually decreased upon a change to the (220) and (311) preferred orientations.

• Journal of the Korean Ceramic Society
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• v.41 no.2
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• pp.106-110
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• 2004

Nickel oxide (NiO) thin films were prepared on Si(100) substrates at room temperature by RF magnetron sputtering using a NiO target. The effects of oxygen flow ratio for the plasma gas on the preferred orientation and surface morphology of the NiO films were investigated. Highly crystalline NiO film with (100) orientation was obtained when it was deposited in pure Ar gas. For NiO film deposited in pure O$_2$ gas, on the other hand, the orientation of the film changed from (100) to (111) and its deposition rate decreased. The origin of the preferred orientation of the films was discussed. NiO films also showed different surface morphologies and roughnesses with the oxygen flow ratio.

• The Research Journal of the Costume Culture
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• v.21 no.2
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• pp.167-182
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• 2013

The purposes of this study were to identify dimensions of shopping orientation and preferences of fashion trade areas, to test differences in the preference factors and usage levels of fashion trade areas as determined by shopping orientation and demographic characteristics. Questionnaires were administered to 406 adults in their twenties and thirties visited major fashion trade area in Seoul. The results of the study were as follows. First, five groups were identified based on shopping orientation: combined value-oriented group, convenience-oriented group, hedonic value trend-oriented group, economic-value oriented group and brand-oriented group. Second, the most frequently visited trade area was Myungdong, and there were significant differences in the usage levels of the trade areas except Dongdaemun, Samsung station COEX, Jamsil and Gangnam Express Bus Terminal among the groups determined by shopping orientation. Sinsa Garosoogil, Apgujeong Chungdam and Samsung Station COEX were preferred by hedonic value trend-oriented group. Daehakro and Myungdong were preferred by combined value-oriented group and convenience-oriented group. Third, significant differences were also found in all groups in the preference factors of the trade area as determined by shopping orientation groups when purchasing clothing. Forth, female preferred Gangnam Express Bus Station and Jamsil than male did. Those who in their early twenties preferred Daehakro and Myungdong the most and those who in early thirties and late twenties concerned service policy the most. The results imply that the consumers tend to visit the nearest fashion trade area by their residence(or work, school) and consider the location and accessibility of the trade area as the most important factor.