• 제목/요약/키워드: textured film

검색결과 131건 처리시간 0.022초

A study of the light trapping mechanism in periodically honeycomb texture-etched substrate for thin film silicon solar cells

  • Kim, Yongjun;Shin, Munghun;Park, Hyeongsik;Yi, Junsin
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.147.2-148
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    • 2016
  • Light management technology is very important for thin film solar cells, which can reduce optical reflection from the surface of thin film solar cells or enhance optical path, increasing the absorption of the incident solar light. Using proper light trapping structures in hydrogenated amorphous silicon (a-Si:H) solar cells, the thickness of absorber layers can be reduced. Instead, the internal electric field in the absorber can be strengthened, which helps to collect photon generated carriers very effectively and to reduce light-induced loss under long-term light exposure. In this work, we introduced a chemical etching technology to make honey-comb textures on glass substrates and analyzed the optical properties for the textured surface such as transmission, reflection and scattering effects. Using ray optics and finite difference time domain method (FDTD) we represented the behaviors of light waves near the etched surfaces of the glass substrates and discussed to obtain haze parameters for the different honey-comb structures. The simulation results showed that high haze values were maintained up to the long wavelength range over 700 nm, and with the proper design of the honey-comb structure, reflection or transmission of the glass substrates can be enhanced, which will be very useful for the multi-junction (tandem or triple junction) thin film a-Si:H solar cells.

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MOCVD 법에 의해 제조된 $CeO_2$ 버퍼층 증착 거동의 기판 의존성 (Substrate dependence of the deposition behavior of $CeO_2$ buffer layer prepared by MOCVD method)

  • 전병혁;최준규;정우영;이희균;홍계원;김찬중
    • Progress in Superconductivity
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    • 제7권2호
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    • pp.130-134
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    • 2006
  • Buffer layers such as $CeO_2\;and\;Yb_2O_3$ films for YBCO coated conductors were deposited on (100) $SrTiO_3$ single crystals and (100) textured Ni substrates by a metal organic chemical vapor deposition (MOCVD) system of the hot-wall type. The substrates were moved with the velocity of 40 cm/hr. Source flow rate, $Ar/O_2$ flow rate and deposition temperature were main processing variables. The degree of film epitaxy and surface morphology were investigated using XRD and SEM, respectively. On a STO substrate, the $CeO_2$ film was well grown epitaxially above the deposition temperature of $450^{\circ}C$. However, on a Ni substrate, the XRD showed NiO (111) and (200) peaks due to Ni oxidation as well as (111) and (200) film growth. For the films deposited with $O_2$ gas as oxygen source, it was found that the NiO film was formed at the interface between the buffer layer and the Ni substrate. The NiO layer interrupts the epitaxial growth of the buffer layer. It seems that the epitaxial growth of the buffer layer on Ni metal substrates using $O_2$ gas is difficult. We are considering a new method avoiding Ni oxidation with $H_2O$ vapor instead of $O_2$ gas.

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Hybrid PVD로 제조된 Ti-Me-N (Me=V, Si 및 Nb) 나노 박막의 미세구조와 마모특성 (Microstructure and Wear Resistance of Ti-Me-N (Me=V, Nb and Si) Nanofilms Prepared by Hybrid PVD)

  • 양영환;곽길호;이성민;김성원;김형태;김경자;임대순;오윤석
    • 한국표면공학회지
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    • 제44권3호
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    • pp.95-104
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    • 2011
  • Ti based nanocomposite films including V, Si and Nb (Ti-Me-N, Me=V, Si and Nb) were fabricated by hybrid physical vapor deposition (PVD) method consisting of unbalanced magnetron (UBM) sputtering and arc ion plating (AIP). The pure Ti target was used for arc ion plating and other metal targets (V, Si and Nb) were used for sputtering process at a gas mixture of Ar/$N_2$ atmosphere. Mostly all of the films were grown with textured TiN (111) plane except the Si doped Ti-Si-N film which has strong (200) peak. The microhardness of each film was measured using the nanoindentation method. The minimum value of removal rate ($0.5{\times}10^{-15}\;m^2/N$) was found at Nb doped Ti-Nb-N film which was composed of Ti-N and Nb-N nanoparticles with small amount of amorphous phases.

In-line APCVD에 의해 제작된 $SnO_2(:F)$ film의 특성 (Properties of fluorine-doped $SnO_2$ films perpared by the in-line APCVD system)

  • Sei Woong Yoo;Byung Seok Yu;Jeong Hoon Lee
    • 한국결정성장학회지
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    • 제4권2호
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    • pp.157-168
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    • 1994
  • APCVD에 의한 $SnO_2(:F)$ 박막 형성시 HF와 $H_2O$량의 변화에 따른 증착 조건이 전기적, 광학적 특성 그리고 textured $SnO_2(:F)$ 박막의 표면형상에 미치는 영향을 관찰하였다. HF의 bubbling량이 0.9 slm 이상일 경우에는 전자농도(electron concentration)가 $3{\Times}10^{20}/cm^3$에 도달 하였으며, 비저항값은 $7{\Times}10^4~9{\Times}10^4{Omega}cm$ 범위이었고, mobility 값은 $18~25 cm^{-2}/V.sec$이었다. 결정 grain의 형태는$H_2O$를 첨가시키지 않으며 증착시킨 경우 끝이 뾰족한 예각을 가진 pyramid 형태였으며, $H_2O$를 첨가시키며 증착시킨 경우에는 끝이 둥근 hemispherical 형이었다.

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실리콘 기판 표면 형상에 따른 반사특성 및 광 전류 개선 효과 (Effect of Surface Microstructure of Silicon Substrate on the Reflectance and Short-Circuit Current)

  • 연창봉;이유정;임정욱;윤선진
    • 한국재료학회지
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    • 제23권2호
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    • pp.116-122
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    • 2013
  • For fabricating silicon solar cells with high conversion efficiency, texturing is one of the most effective techniques to increase short circuit current by enhancing light trapping. In this study, four different types of textures, large V-groove, large U-groove, small V-groove, and small U-groove, were prepared by a wet etching process. Silicon substrates with V-grooves were fabricated by an anisotropic etching process using a KOH solution mixed with isopropyl alcohol (IPA), and the size of the V-grooves was controlled by varying the concentration of IPA. The isotropic etching process following anisotropic etching resulted in U-grooves and the isotropic etching time was determined to obtain U-grooves with an opening angle of approximately $60^{\circ}$. The results indicated that U-grooves had a larger diffuse reflectance than V-grooves and the reflectances of small grooves was slightly higher than those of large grooves depending on the size of the grooves. Then amorphous Si:H thin film solar cells were fabricated on textured substrates to investigate the light trapping effect of textures with different shapes and sizes. Among the textures fabricated in this work, the solar cells on the substrate with small U-grooves had the largest short circuit current, 19.20 mA/$cm^2$. External quantum efficiency data also demonstrated that the small, U-shape textures are more effective for light trapping than large, V-shape textures.

초전도 박막선재용 IBAD-MgO 박막 증착 (Deposition of IBAD-MgO for superconducting coated conductor)

  • 하홍수;김호겸;양주생;고락길;김호섭;오상수;송규정;박찬;유상임;주진호;문승현
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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    • pp.282-283
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    • 2005
  • Ion beam assisted deposition(IBAD) technique was used to produce biaxially textured polycrystalline MgO thin films for high critical current YBCO coated conductor. Hastelloy tapes were continuous electropolished with very smooth surface for IBAD-MgO deposition, RMS roughness of Hastelloy tape values below 2 nm and local slope of less than $1^{\circ}$. After the polishing of the tape an amorphous $Y_2O_3$ and $Al_2O_3$ are deposited Biaxially textured MgO was deposited on amorphous layer bye-beam evaporation with a simultaneous bombardment of high energy ions. We had developed the RHEED to measure in-situ biaxial texture of film surface as thin as tens angstrom. And also ex-situ characterization of buffer layers was studied using XRD and SEM. The full-width at half maximum(FWHM) out of plane texture of IBAD-MgO template is $4^{\circ}$.

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코팅 조건에 따른 BST 박막의 표면 이미지 특성 (The Surface Image Properties of BST Thin Film by Depositing Conditions)

  • 홍경진;기현철;오수홍;조재철
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 춘계학술대회 논문집 센서 박막재료 반도체재료 기술교육
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    • pp.107-110
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    • 2002
  • The optical memory devices of BST thin films to composite $(Ba_{0.7}\;Sr_{0.3})TiO_{3}$ using sol-gel method were fabricated by changing of the depositing layer number on $Pt/Ti/SiO_{2}/Si$ substrate. The structural properties of optical memory devices to be ferroelectric was investigated by fractal analysis and 3-dimension image processing. The thickness of BST thin films at each coating numbers 3, 4 and 5 times was $2500[\AA]$, $3500[\AA]$ and $3800[\AA]$. BST thin films exhibited the most pronounced grain growth. The surface morphology image was roughness with coating numbers. The thin films increasing with coating numbers shows a more textured and complex configuration.

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Magnetic Properties and Microstructures of Co-Cr-(Pt)-Ta Magnetic Thin Films Sputtered on Self-textured Substrates

  • Shin, Kyung-Ho;Chang, Han-Sung;Lee, Taek-Dong;Park, Joong-Keun
    • E2M - 전기 전자와 첨단 소재
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    • 제11권10호
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    • pp.72-77
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    • 1998
  • The effects of Al micro-bumps on the magnetic properties of CoCr(Pt)Ta/Cr films deposited on glass substrates were investigated. The coercivity increased and the coercivity squareness decreased by incorporating Cr/Al underlayers. The cause of the coercivity increase is attributed to the reduction of Co(0002) texture, the increase of magnetic isolation of CoCr(Pt)/Ta grains, and the refinement of CoCr(Pt)/Ta grains deposited on Cr/Al underlayers. The effects of an Al overlayer on the magnetic properties of CoCr(Pt)Ta/Cr films were also studied. The decrease of coercivity squareness is ascribed to the magnetic isolation of CoCr(Pt)Ta grains.

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12m 길이의 YBCO 초전도선재 개발을 위한 새로운 증착방법 (Development of a new deposition system for a 12m long YBCO coated conductor)

  • 이병수;김호섭;염도준
    • 한국초전도학회:학술대회논문집
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    • 한국초전도학회 1999년도 High Temperature Superconductivity Vol.IX
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    • pp.319-321
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    • 1999
  • To solve the problems in the present ree1-to-reel deposition method, we have developed a new deposition system for a 12m long YBCO coated conductor. The system comprises two chambers, a reaction chamber and a evaporation chamber which are connected through window. A tan long fi tape textured by RABiTS was wound around a cylinderical sample holder of 20cm diameter. The cylinder was rotated in the reaction chamber during deposition of YBCO film by coevaporation. We'll describe the details of the performance of this system as well as the RABiTS process for a 12m long Ni tape.

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MOCVD 공정을 이용한 CeO2 박막 제조 (Fabrication of the Ce$O_{2}$ thin film by MOCVD process)

  • 김호진;주진호;전병혁;정충환;박해웅;김찬중
    • 한국초전도저온공학회:학술대회논문집
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    • 한국초전도저온공학회 2003년도 학술대회 논문집
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    • pp.133-136
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    • 2003
  • The CeO$_2$ thin films were deposited on the biaxially textured Ni substrates by MOCVD process. The (200) oriented CeO$_2$ films were formed at the deposition temperature(Td) of 500~52$0^{\circ}C$, the oxygen partial pressure(PO2) of 0.90~3.33 torr and the deposition time(t) of 3~25 min. The surface roughness and gain size rapidly increased at Td $\geq$ 52$0^{\circ}C$ due to the grain growth. The surface roughness also increased as the deposition time increased. The optimized deposition conditions of the CeO$_2$ films for the YBCO coated conductor were Td= 500~51$0^{\circ}C$, PO2= 2.30 torr and t= 10~12 min.

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