• 제목/요약/키워드: surface fluorination

검색결과 58건 처리시간 0.021초

Methanesulfonyl Chloride의 전해불소화 반응 중 유해가스의 생성 및 제어 (Properties and Controls of hazardous gases from Electrochemical fluorination of Methanesulfonyl chloride)

  • 태범석;이종일;박영우
    • 한국안전학회지
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    • 제11권3호
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    • pp.126-136
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    • 1996
  • Synthesis of perfluoromethanesulfonyl fluoride(PFMSF) which is a valuable precursor of perfluoro-chemicals such as surface modifier and fine chemicals was studied by electrochemical fluorination (ECF). In order to determine the termination of preelectrolysis, it was carried to monitor the variation of current during preelectrolysis by means of constant cell voltage operation. In a batch cell, chronopotentiometric electrolysis and various chemical analysis such as GC, GC/MS and If were used to understand the potential change of electrode and synthesis and control of hazardous gases products. Termination of preelectrolysis was determinated by measurement the current and/or detection of $F_2$ gas generation. And during the preelectrolysis, an amount of generated $OF_2$ was shown that a lot of moisture was absorbed from air when a cell was filled with anhydrous hydrogen fluoride( AHF ). Above 4V cell voltage, $F_2$ gas was generated and acted on any form of fluorinating agents. In the ECF of MSC (methane sulfonyl chloride) by constant current operation, the potential of anode was intimately relation with generation of $SO_2F_2$. Exchange of Cl to F was dominatly occured in a initial stage. There were various gaseous products including PFMSF as main product and $C_4$ compounds.

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플루오르 화합물을 플라즈마 처리한 PET 직물의 표면특성 (Surface Property of PET Fabric Treated with $CF_4$ Plasma and $C_2F_6$ Plasma)

  • 김태년;모상영
    • 한국염색가공학회지
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    • 제11권1호
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    • pp.25-33
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    • 1999
  • PET fabric was grafted with $CF_4$ or $C_2F_6$ plasmas generated by glow discharge. The water repellency of plasma-treated fabrics were evaluated with contact angle meter. The change in surface morphologies was observed by SEM, and the change of surface chemical characteristics were analyzed by FT-IR, ESCA and microchemical analysis technique. The results obtained are as follows : 1) The contact angle of plasma-treated fabric was over $150^\circ{C}$. 2) It was observed by SEM that the surface of treated substrate was over coated with thin film formed by the fluorocarbon plasma treatment. 3) According to ESCA analysis, there were prevailing -CHF-, $-CF_2$- and a little $-CF_3$ components on fluorocarbon plasma treated substrate. -CHF- and $-CF_2$- components were reduced by washing, and $-CF_2$- component was recovered by heat treatment. 4) In consideration of quantitative analysis of fluorine and F/C ratio by ESCA, we found that fluorination reached to the inner of substrate.

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기상 불소화법을 이용한 WO3-xFx 광촉매의 합성 및 광분해 특성 (Synthesis and Photocatalytic Activity of WO3-xFx Photocatalysts Using a Vapor Phase Fluorination)

  • 이혜련;임채훈;이란은;이영석
    • 공업화학
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    • 제32권6호
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    • pp.632-639
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    • 2021
  • 본 연구에서는 WO3 광촉매의 활성을 증대시키기 위하여 불소 도핑을 수행하고, 메틸렌블루 염료를 이용하여 광분해 특성을 고찰하였다. 본 연구를 통해 제조된 WO3-xFx 광촉매는 WCl6 전구체로부터 WO3 광촉매를 제조하기 위한 소결과정 중에 기상 불소화 방법을 이용하여 제조하였다. 불소 도핑 후 WO3 광촉매의 밴드갭이 2.95 eV에서 2.54 eV로 감소하였고, 산소 결핍 자리 영역이 약 55% 증가하였다. 또한 제조한 광촉매의 초기 염료 분해 성능은 불소 도핑 전과 비교하였을 때 10%에서 60%로 불소 도핑 후 6배 증가하였다. 이는 불소가 도핑되어 광촉매의 밴드갭이 감소하여 적은 에너지로 촉매 활성 반응을 가능하게 하고, 또한 산소 결핍이 생성된 표면 결함이 WO3 광촉매의 가시광선 흡수영역을 증대시켜 광촉매 활성이 증가한 것으로 사료된다. 본 연구에서는 후처리 공정이 불필요한 원스텝 기상 불소화 반응을 이용하여 손쉬운 방법으로 광촉매활성이 뛰어난 불소가 도핑된 WO3-xFx 광촉매를 제조할 수 있음을 확인하였다.

극친수/극소수 표면에서 탄산용액의 기포 발생 촉진/억제 효과 분석 연구 (Effect of Promoting/Inhibiting Bubble Generation of Carbonate Solution on Superhydrophilic/Superhydrophobic Surfaces)

  • 이정원
    • 한국기계가공학회지
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    • 제21권7호
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    • pp.77-83
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    • 2022
  • When carbon dioxide in a liquid becomes supersaturated, carbon dioxide gas bubbles are generated in the liquid, and they ascend to the surface as they develop further. At this time, the inner wall of the cup with carbon gas attached is known as the entrapped gas cavity (EGS); once an EGS is established, it does not disappear and will continuously create carbon bubbles. This bubbling phenomenon can be activated or suppressed by changing the properties of the solid surface in contact with the carbonated liquid. In this study, the foaming of carbonated liquid is promoted or suppressed by modifying the wettability of the surface. A micro/nano surface structure is formed on the surface of an aluminum cup to produce a superhydrophilic surface, and a superhydrophobic surface similar to a lotus leaf is synthesized via fluorination. Experiment results show that the amount of carbon dioxide bubble generated differs significantly in the first few seconds depending on the surface, and that the amount of gas generated after it enters the stabilization period is the same regardless of the wettability of the cup surface.

A study of the NF3 plasma etching reaction with cobalt oxide films grown on an inorganic compounds

  • Jae-Yong Lee;Kyung-Min Kim;Min-Seung Ko;Yong-Soo Kim
    • Nuclear Engineering and Technology
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    • 제54권12호
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    • pp.4449-4459
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    • 2022
  • In this study, an NF3 plasma etching reaction with a cobalt oxide (Co3O4) films grown on the surface of inorganic compounds using granite was investigated. Experimental results showed that the etching rate can be up to 1.604 mm/min at 380 ℃ under 150 W of RF power. EDS and XPS analysis showed that main reaction product is CoF2, which is generated by fluorination in NF3 plasma. The etching rate of cobalt oxide films grown on inorganic compounds in this study was affected by surface roughness and etch selectivity. This study demonstrates that the plasma surface decontamination can effectively and efficiently remove contaminated nuclides such as cobalt attached to aggregate in concrete generated when decommissioning of nuclear power plants.

Removal of Metallic Cobalt Layers by Reactive Cold Plasma

  • Kim, Yong-Soo;Jeon, Sang-Hwan;Yim, Byung-Joo;Lee, Hyo-Cheol;Jung, Jong-Heon;Kim, Kye-Nam
    • 한국방사성폐기물학회:학술대회논문집
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    • 한국방사성폐기물학회 2004년도 학술논문집
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    • pp.32-42
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    • 2004
  • Recently, plasma surface-cleaning or surface-etching techniques have been focused in respect of the decontamination of spent or used nuclear parts and equipment. In this study the removal rate of metallic cobalt surface is experimentally investigated via its surface etching rate with a $CF_4-o_2$mixed gas plasma. Experimental results reveal that a mixed etchant gas with about 80% $CF_4$-20% $O_2$ (molar) gives the highest reaction rate and the rate reaches 0.06 ${\mu}m$/min at $380^{\circ}C$ and ion-assisted etching dramatically enhances the surface reaction rate. With a negative 300 V DC bias voltage applied to the substrate, the surface reaction initiation temperature lowers and the rate increases about 20 times at $350^{\circ}C$ and up to 0.43 ${\mu}m$/min at $380^{\circ}C$, respectively. Surface morphology analysis confirms the etching rate measurements. Auger spectrum analysis clearly shows the adsorption of fluorine atoms on the reacted surface. From the current experimental findings and the results discussed in previous studies, mechanistic understanding of the surface reaction, fluorination and/or fluoro-carbonylation reaction, is provided.

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