• Title/Summary/Keyword: substrate condition

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바탕면 함수조건에 따른 마그네시아 인산칼륨 시멘트 모르타르의 부착성능 (Bond Performance of Magnesium Potassium Phosphate Cement Mortar according to Moisture Condition of Substrate)

  • 강석표;김재환
    • 한국구조물진단유지관리공학회 논문집
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    • 제21권1호
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    • pp.15-22
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    • 2017
  • 본 논문은 바탕면의 함수조건에 따른 보수재료로서 MKPC의 인발 부착강도, 전단 부착강도, 계면 부착강도를 폴리머 시멘트 모르타르, 에폭시 모르타르와 비교 분석하였다. 그 결과 MKPC는 PC 및 MKPC와 비교하여 바탕면 함수조건에 따른 부착성능의 변화가 상대적으로 작은 것으로 나타났다. 또한 MKPC의 경우 절건 바탕면에서의 부착성능은 무기계 보수재료인 폴리머 시멘트 모르타르와 비교하여 우수한 특성을 지니고 있으며, 습윤 바탕면에서의 부착성능은 폴리머 시멘트 모르타르와 유사한 수준을 보이고 있으나 에폭시 모르타르와 비교하여 우수한 특성을 지니는 것으로 나타났다.

폭로환경하에서 규산질미분말혼합 시멘트계 도포방수재가 바탕모르터의 투수성과 세공구조에 미치는 영향 (Properties of Water Permeability and Porosity of Cement Mortar Substrate Coated with Siliceous Slurry Coating under Exposure Enviorment)

  • 김형무;오상근
    • 한국콘크리트학회:학술대회논문집
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    • 한국콘크리트학회 1996년도 가을 학술발표회 논문집
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    • pp.175-182
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    • 1996
  • This paper deals with the properties of water permeability and porosity of cement mortar substrate coated with siliceous slurry coating under the exposure environment. Conditions of exposure enviornment are four kinds of in constant temperature water and humidity box, in indoor and outdoor exposure. Coated mortar substrate was expected continually increase in water and humidity condition, but was not in dry condition. Watertightness effect of siliceous coating was better in the condition of humidity then the dry condition, and the pore volume was decreased in that condition.

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UASB 공정에서 기질농도 및 기질주입 기간비가 슬러지 입상화에 미치는 영향 (Effect of Substrate Concentration and Feeding Period Ratio on Sludge Granulation in UASB Process)

  • 최영근;이헌모
    • 한국환경과학회지
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    • 제6권2호
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    • pp.113-124
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    • 1997
  • The basic mechanism of the granular sludge formation which is the most important factor in the start-up and stable operators is not confirmed yet. In this study, the effect of granular sludge formation was investigated with the different substrate concentrations and the various ratios of substrate supply/deficiency. The granular sludge formation in the UASB reactor was closely related to the substrate concentrations and the ratio of substrate supply/deficlency The granular sludge formation was not accelerated at low substrate concentration. It was convinced that granular sludge formation was accelerated when the substrate supply with high concentration was stopped at UASB reactor. From this experiment, it was estimated that granular sludge was formed by the combination of hydrogen utilizing bacteria that form hydrogen condition and acid forming bacteria at substrate deficit condition by mutual symbiosis. Though the removal efficiency of organic matter was decreased as the influent substrate concentration was Increased, the higher the influent substrate the better the granular sludge formation.

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탈질 조건에서 투과매질 내 미생물 성장에 관한 연구

  • 최영화;오재일;배범한
    • 한국지하수토양환경학회:학술대회논문집
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    • 한국지하수토양환경학회 2002년도 추계학술발표회
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    • pp.366-369
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    • 2002
  • Subsurface biobarrier technology has potential applications to contain contaminated groundwater and/or to degrade toxic pollutants in groundwater. Most biobarrier studies were conducted under aerobic condition, however there were several obstacles to make aerobic condition. Thus, In this study, we examined biobarrier formation under denitrifying condition by using nitrate as an electron acceptor. Experiments were performed with a sand column inoculated with activated sludge from the nearby WWTP. The substrate medium was pumped to the sand column in an upflow mode. During the low substrate loading rate period, the extent of reduction rate in hydraulic conductivity was found similar throughout the column, and permeability became relatively stable after couple of days. However, during the high substrate loading rate period, the column demonstrated a gradient of permeability reduction, with the greatest reduction in sections nearest the column inlet. Rapid growth of microorganisms near the column inlet resulted in the unbalanced reduction of hydraulic conductivity throughout the sand column. As a result, at this denitrifying condition the thickness of biobarrier could be controlled by adjusting the medium conditions of microbial growth.

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TEXTURE AND RELATED MICROSTRUCTURE AND SURF ACE TOPOGRAPHY OF VAPOR DEPOSITS

  • Lee, Dong-Nyung
    • 한국표면공학회지
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    • 제29권5호
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    • pp.301-313
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    • 1996
  • The texture of vapor deposits(PVD and CVD) changes from the orientation that places the lowest energy lattice plane parallel to the substrate under the condition of low atom or ion concentration adjacent to the deposit, to the orientation that places the higher energy crystal planes parallel to the substrate as the atom or ion concentration adjacent to the deposit increases. However, in the early stage of deposition, the deposit-substrate interface energy and the surface energy constitute the most important energies of the system. Therefore, if the lattice match is established between the substrate and the deposit without generating much strain energy, the epitaxial growth takes place to reduce the interfacial energy. When the epitaxial growth does not take place, the surface energy is dominant in the early stage of deposition and the lowest energy crystal plane tends to be placed parallel to the substrate up to a critial thickness. The thickness depends on the deposition condition. If the deposition condition does not favor placing the lowest energy crystal plane parallel to the substrate, the initial texture will change to that compatible with the deposition condition as the film thickness increases, and the texture turnover thickness will be short. The microstructure and surface topography of deposits are related to their texture.

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티탄과 알루미늄의 마찰용접에서 발생하는 잔류응력.소성변형 (Features of Residual Stress and Plastic Strain in Titanium/Aluminium Friction Welds)

  • 김유철;박정웅
    • Journal of Welding and Joining
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    • 제18권5호
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    • pp.84-89
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    • 2000
  • Friction welding of titanium and aluminium is numerically modeled by the axisymmetric thermal elastic-plastic analysis. In titanium/aluminium friction welding, heat transfers into the titanium substrate to a distance of z=10(mm) on the side of the bondline and into the whole region of the aluminium substrate having the large thermal conductivity. Adjacent to the bondline, $^{\sigma}r\;and\;^{\sigma\theta}$ are tensile in the substrate whose thermal shrinkage is large, and are compressive in the substrate whose thermal shrinkage is small. $\sigma_z$ along the radial direction is large tensile at the periphery of the component. Plastic strain occurs only close to the bondline in the aluminium substrate. In the components of plastic strain, $\varepsilon^p_r\;and\;\varepsilon^p_{\theta}$ have positive values and $\varepsilon^p_r$ has large negative value. However, $\varepsilon^p_r$ is produced not because of the severity of the mechanical restraint condition, but on purpose to satisfy the condition of the volume constant. A plastic work is proposed as a measure to evaluate the mechanical severity. The plastic work is larger in the aluminium substrate than that in the titanium substrate. The mechanical condition is severer in the aluminium substrate.

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Different formation of carbon nanofilaments as a function of the gap between the substrate and the microwave plasma

  • Kim Sung-Hoon
    • 한국결정성장학회지
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    • 제16권1호
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    • pp.20-24
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    • 2006
  • Iridium-catalyzed carbon nanofilaments were formed on MgO substrate as a function of the gap between the substrate and the plasma using microwave plasma-enhanced chemical vapor deposition method. Under the remote plasma condition, carbon nanofibers were formed on the substrate. Under the adjacent plasma condition, on the other hand, carbon nanotubes-like materials instead of carbon nanofibers could be formed. When the substrate immersed into the plasma, any carbon nanofilaments formation couldn't be observed. During the reaction, the substrate temperatures were measured as a function of the gap. Based on these results, the cause for the different carbon nanofilaments formation according to the gap was discussed.

RF 바이어스 조건하에서 증착된 a-C:H 박막을 이용한 네마틱 액정의 배향 효과 (Alignment Effects for Nematic Liquid Crystal using a-C:H Thin Films Deposited at Rf Bias Condition)

  • 황정연;박창준;서대식;안한진;백홍구
    • 한국전기전자재료학회논문지
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    • 제17권5호
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    • pp.526-529
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    • 2004
  • The nematic liquid crysta](NLC) aligning capabilities using a-C:H thin film deposited at the three kinds of rf bias condition were investigated. A high pretilt angle of NLC on low substrate rf bias applied a-C:H thin films was observed and the low pretilt angle of the NLC on high substrate rf bias applied a-C:H thin films was observed. Consequently, the high NLC pretilt angle and the good aligning capabilities of LC alignment by the IB alignment method on the a-C:H thin film deposited at 1 W rf bias condition can be achieved. It is considered that pretilt angle of the NLC may be attributed to substrate rf bias condition and IB energy time. Therefore, LC alignment is affected by topographical structure forming strong IB energy.

고정밀 얼라인을 위한 하이브리드 조작 장치의 개발 (Development of a Hybrid Substrate Handler for Precision Alignment)

  • 이동은;김숙한;이응기
    • 반도체디스플레이기술학회지
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    • 제6권1호
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    • pp.1-6
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    • 2007
  • In order to raise productivity of the OLED and realization of the OLED TV, the enlargement of the mother glass substrate is required. The large-size glass substrate has some difficulties regarding its deflection during handling operation due to its thin thickness (0.5$\sim$0.7t) which is not even enough to stand its mass itself. This paper is demonstrating a new solution of this difficult through clamping and bending boundary condition, which helps to minimize the deflection of the glass substrate. Based on the developed method, the experiments had been done for verifying the proposed method to minimize the glass-deflection. With the developed method, the new design of glass substrate handler can be proposed to allow the large OLED displays be manufactured.

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Si 기판과 일정방향관계를 갖는 근사단결정 다이아몬드 박막 합성 (Highly Oriented Textured Diamond Film on Si Substrate)

  • 백영준;은광용
    • 한국세라믹학회지
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    • 제31권4호
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    • pp.457-463
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    • 1994
  • The growth condition of highly oriented textured diamond film on a (100) Si substrate was investigated as a function of texture orientation. The growth process consisted of biased enhanced nucleation (BEN) and texture growth. The substrate was under the plasma of 6% CH4-94% H2 with negative bias of 200V during the BEN which grounded during the texture growth. The texture orintation changed from <100> to <110> by increasing substrate temperature. The nearly perfect match between textured diamond grains and the Si substrate could be obtained under the condition of <100> texture. The degree of tilt mismatch increased with the increase of deviation of texture orientation from <100>. The degree of twist mismatch appeared to increase abruptly beyond the critical deviation of texture orientation from <100> because the nuclei having the same orientation as the substrate were no more preferred grains for texture formation.

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