• Korean Chemical Engineering Research
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• 제49권6호
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• pp.804-809
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• 2011

$Ba_{0.5}Sr_{0.5}Co_{0.8}Fe_{0.2}O_{3-{\delta}}$ 조성의 관형 분리막을 압출 성형 방법으로 제조하였다. 압출성형 직후 분리막의 TGA 분석결과 3단계의 무게감소로 첨가제와 탄산염이 분해되었고, 건조 수축율은 68 h 경과 후 변화가 없었으며 외경이 큰 분리막에서 높게 나타났다. 소결 후 분리막의 XRD 및 SEM 분석결과, 분리막은 단일상의 페롭스카이트 구조를 갖는 치밀한 막을 보였고, EDS 분석을 통해 $Ba_{0.5}Sr_{0.5}Co_{0.8}Fe_{0.2}O_{3-{\delta}}$와 유사한 성분함량을 가짐을 확인하였다. 두께 0.95 mm $Ba_{0.5}Sr_{0.5}Co_{0.8}Fe_{0.2}O_{3-{\delta}}$ 관형 분리막의 압환강도(radial crushing strength)는 5.7 kgf/$mm^2$이였으며, $950^{\circ}C$에서 산소투과량은 146.85 mL/min($Jo_2$=2.33 mL/$min{\cdot}cm^2$)를 나타냈었다. 투과 측의 진공펌프 사용이 쓸개 가스를 활용한 것보다 산소 투과량 증진에 효과가 있음을 알 수 있었다.

• Korean Chemical Engineering Research
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• 제43권2호
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• pp.318-323
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• 2005

초임계수 산화는 난분해성 유기화합물의 분해를 위한 공정으로 각광받고 있다. 본 연구에서는 연속반응기에서 온도 $387-500^{\circ}C$, 압력 250 bar의 초임계수 조건하에서(EDTA 분해효율) 체류시간 15.9-88.9초의 범위의 EDTA 분해효율을 측정하였다. 이때 산화제로는 과산화수소($H_2O_2$)를 사용하였다. EDTA의 분해효율은 온도 및 산화제투입량의 증가에 따라 상승하였으며, 반응물 도입유속의 감소 즉, 체류시간의 증가에 따라서 상승하였다. 본 연구결과 온도 $500^{\circ}C$, 압력 250 bar, 산화제 투입량 400%의 조건에서 최대 99.6%의 분해효율을 나타내었다. 분해효율에 미치는 온도의 영향이 산화제 투입량 증가의 영향보다 컸으며, 5,000 mg/L의 EDTA($COD_{Cr}$로서 3,063 mg/L)의 99% 이상 분해효율은 온도 $500^{\circ}C$와 압력 250 bar의 초임계수 산화조건에서 산화제투입량 200% 이상 및 체류시간 40.1초 이상에서 얻을 수 있었다.

• 한국태양에너지학회 논문집
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• 제25권4호
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• pp.1-11
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• 2005

The stoichiometric mixture of evaporating materials for the $CuInSe_2$ single crystal thin film was prepared from horizontal furnace. Using extrapolation method of X-ray diffraction patterns for the polycrystal $CuInSe_2$, it was found tetragonal structure whose lattice constant $a_0$ and $c_0$ were $5.783\;{\AA}$ and $11.621\;{\AA}$, respectively. To obtain the $CuInSe_2$ single crystal thin film, $CuInSe_2$ mixed crystal was deposited on throughly etched GaAs(100) by the HWE(Hot Wall Epitaxy) system. The source and substrate temperature were $620^{\circ}C$ and $410^{\circ}C$ respectively. The crystalline structure of $CuInSe_2$ single crystal thin film was investigated by the double crystal X-ray diffraction(DCXD). Hall effect on this sample was measured by the method of Van der Pauw and studied on carrier density and mobility depending on temperature. From Hall data, the mobility was likely to be decreased by impurity scattering in the temperature range 30 K to 100 K and by lattice scattering in the temperature range 100 K to 293 K. The temperature dependence of the energy band gap of the $CuInSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)=1.1851\;eV-(8.99{\times}10^{-4}\;eV/K)T^2/(T+153\;K)$. The open-circuit voltage, short current density, fill factor, and conversion efficiency of $n-CdS/p-CuGaSe_2$ heterojunction solar cells under $80\;mW/cm^2$ illumination were found to be 0.51V, $29.3\;mA/cm^2$, 0.76 and 14.3 %, respectively.

• 한국태양에너지학회 논문집
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• 제38권1호
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• pp.25-36
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• 2018

The stoichiometric mixture of evaporating materials for the $CaAl_2Se_4$: Co single crystal thin film was prepared from horizontal furnace. Using extrapolation method of X-ray diffraction patterns for the polycrystal $CaAl_2Se_4$, it was found orthorhomic structure whose lattice constant $a_0$, $b_0$ and $c_0$ were 6.4818, $11.1310{\AA}$ and $11.2443{\AA}$, respectively. To obtain the $CaAl_2Se_4$: Co single crystal thin film, $CaAl_2Se_4$: Co mixed crystal was deposited on throughly etched Si (100) by the HWE (Hot Wall Epitaxy) system. The source and substrate temperature were $600^{\circ}C$ and $440^{\circ}C$ respectively. The crystalline structure of $CaAl_2Se_4$: Co single crystal thin film was investigated by the double crystal X-ray diffraction (DCXD). Hall effect on this sample was measured by the method of Van der Pauw and studied on carrier density and mobility depending on temperature. From Hall data, the mobility was likely to be decreased by impurity scattering in the temperature range 30 K to 100 K and by lattice scattering in the temperature range 100 K to 293 K. The temperature dependence of the energy band gap of the $CaAl_2Se_4$: Co obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)=3.8239eV-(4.9823{\times}10^{-3}eV/K)T_2/(T+559K)$. The open-circuit voltage, short current density, fill factor, and conversion efficiency of $p-Si/p-CaAl_2Se_4$: Co heterojunction solar cells under $80mW/cm^2$ illumination were found to be 0.42 V, $25.3mA/cm^2$, 0.75 and 9.96%, respectively.

• Bulletin of the Korean Chemical Society
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• 제24권11호
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• pp.1659-1663
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• 2003

$Al_2O_3$ thin films were grown on H-terminated Si(001) substrates using dimethylaluminum isopropoxide [DMAl: $(CH_3)_2AlOCH(CH_3)_2$], as a new Al precursor, and water by atomic layer deposition (ALD). The selflimiting ALD process by alternate surface reactions of DMAI and $H_2O$ was confirmed from measured thicknesses of the aluminum oxide films as functions of the DMAI pulse time and the number of DMAI-$H_2O$ cycles. Under optimal reaction conditions, a growth rate of ~1.06 ${\AA}$ per ALD cycle was achieved at the substrate temperature of $150\;^{\circ}C$. From a mass spectrometric study of the DMAI-$D_2O$ ALD process, it was determined that the overall binary reaction for the deposition of $Al_2O_3\;[2\;(CH_3)_2AlOCH(CH_3)_2\;+\;3\;H_2O\;{\rightarrow}\;Al_2O_3\;+\;4\;CH_4\;+\;2\;HOCH(CH_3)_2]$can be separated into the following two half-reactions: where the asterisks designate the surface species. Growth of stoichiometric $Al_2O_3$ thin films with carbon incorporation less than 1.5 atomic % was confirmed by depth profiling Auger electron spectroscopy. Atomic force microscopy images show atomically flat and uniform surfaces. X-ray photoelectron spectroscopy and cross-sectional high resolution transmission electron microscopy of an $Al_2O_3$ film indicate that there is no distinguishable interfacial Si oxide layer except that a very thin layer of aluminum silicate may have been formed between the $Al_2O_3$ film and the Si substrate. C-V measurements of an $Al_2O_3$ film showed capacitance values comparable to previously reported values.

• 한국재료학회지
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• 제18권4호
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• pp.222-227
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• 2008

In this study, $BaTiO_3$ thin films were grown by RF-magnetron sputtering, and the effects of a post-annealing process on the structural characteristics of the $BaTiO_3$ thin films were investigated. For the crystallization of the grown thin films, post-annealing was carried out in air at an annealing temperature that varied from $500-1000^{\circ}C$. XRD results showed that the highest crystal quality was obtained from the samples annealed at $600-700^{\circ}C$. From the SEM analysis, no crystal grains were observed after annealing at temperatures ranging from 500 to $600^{\circ}C$; and 80 nm grains were obtained at $700^{\circ}C$. The surface roughness of the $BaTiO_3$ thin films from AFM measurements and the crystal quality from Raman analysis also showed that the optimum annealing temperature was $700^{\circ}C$. XPS results demonstrated that the binding energy of each element of the thin-film-type $BaTiO_3$ in this study shifted with the annealing temperature. Additionally, a Ti-rich phenomenon was observed for samples annealed at $1000^{\circ}C$. Depth-profiling analysis through a GDS (glow discharge spectrometer) showed that a stoichiometric composition could be obtained when the annealing temperature was in the range of 500 to $700^{\circ}C$. All of the results obtained in this study clearly demonstrate that an annealing temperature of $700^{\circ}C$ results in optimal structural properties of $BaTiO_3$ thin films in terms of their crystal quality, surface roughness, and composition.

• 한국태양에너지학회 논문집
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• 제23권2호
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• pp.59-70
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• 2003

A stoichiometric mixture of evaporating materials for $CuGaSe_2$ single crystal thin films was prepared from horizontal electric furnace. Using extrapolation method of X-ray diffraction patterns for the polycrystal $CuGaSe_2$, it was found tetragonal structure whose lattice constant $a_0$ and $c_0$ were $5.615{\AA}$ and $11.025{\AA}$, respectively. To obtain the single crystal thin films, $CuGaSe_2$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperatures were $610^{\circ}C$ and $450^{\circ}C$, respectively. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of $CuGaSe_2$ single crystal thin films measured with Hall effect by van der Pauw method are $5.01\times10^{17}cm^{-3}$ and $245cm^2/V{\cdot}s$ at 293K. respectively. The temperature dependence of the energy band gap of the $CuGaSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g$(T)=1.7998 eV-($8.7489\times10^{-4}$ eV/K)$T^2$/(T+335K). After the as-grown $CuGaSe_2$ single crystal thin films was annealed in Cu-, Se-, and Ga-atmospheres, the origin of point defects of $CuGaSe_2$ single crystal thin films has been investigated by the photoluminescence(PL) at 10 K. The native defects of $V_{CU},\;V_{Se},\;Cu_{int}$ and $Se_{int}$ obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the Cu-atmosphere converted $CuGaSe_2$ single crystal thin films to an optical n-type. Also, we confirmed that Ga in $CuGaSe_2$/GaAs did not form the native defects because Ga in $CuGaSe_2$ single crystal thin films existed in the form of stable bonds.

• 한국재료학회지
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• 제12권9호
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• pp.706-711
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• 2002

High-pure tantalum powder was fabricated through Na reduction process and has been produced by using $K_2$TaF$_{7}$, and KCI, KF for raw material and diluent, respectively. A raw material and diluent were charged at the hestalloy bomb by the weight rate of 1:2, 1:1, 1:0.5 and 1:0.25 each other, investigated properties of morphology, chemical composition and yield and particle size after reduced. Ta metal has been achieved by reduction of $K_2$$TaF_{7}$ 500g with 1% sodium in excess of stoichiometric amount in the charge at a reduction temperature of $850^{\circ}C$ for 3hours. According to amount of the diluent, a formation of the powder doesn't have an effect. The diluent prevented the temperature rising caused from the heat of reaction and it maintained the speed of reducing reaction. But in the mixture ratio of raw material and diluent in the 1 : 2 and 1 : 0.25, an oxide and partially not reacted K were detected. As the amount of diluent increased, the size of tantalum powder decreased. According as raw material and the mixture ratio of diluent change from 1:0.25 to 1:2, the size is decreased from 5$\mu\textrm{m}$ to 1$\mu\textrm{m}$, and a particle size distribution which is below 325 mesh in fined powder increases from 71% to 83%. In the case of average size of Tantalum powder which is the mixture ratio (1:0.5), we would get the Ta powder with grain size about 3$\mu\textrm{m}$, which come close to the average size (2~4$\mu\textrm{m}$) of tantalum powder which is used commonly in the present is Ta powder about 3$\mu\textrm{m}$.

• 한국재료학회지
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• 제10권4호
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• pp.270-275
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• 2000

Metal/ferroelectric/insulator/semiconductor(MFIS)-Field Effect Transistor을 위한 Pt/YMnO$_3$/Y$_2$O$_3$/Si 구조를 제조하여 MFIS 구조의 특성에 미치는 $Y_2$O$_3$박막의 영향을 고찰하였다. PLD법을 이용하여 p=type Si(111) 기판 위에 증착시킨 $Y_2$O$_3$박막은 증착온도와 관계없이 (111)방향으로의 우선배향성을 갖고 결정화 되었다. 실리콘 위에 바로 MOCVD법에 의해 강유전체 YMnO$_3$박막을 증착시킨 경우 실리콘과의 계면에서 Mn이 부족한 층이 형성되지만 $Y_2$O$_3$가 실리콘과 YMnO$_3$사이에 삽입된 경우는 $Y_2$O$_3$바로 위에서부터 화학양론비에 일치하는 양질의 YMnO$_3$박막을 얻을 수 있었다. 85$0^{\circ}C$, 100mtorr의 진공분위기에서 열처리한 YMnO$_3$박막은 $Y_2$O$_3$가 삽입된 경우 memory window 값이 $Y_2$O$_3$가 삽입되지 않은 경우보다 더 큰 값을 보였으며 5V에서 1.3V의 값을 보였다.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2005년도 춘계종합학술대회
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• pp.1013-1016
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• 2005

대기 중에서 Si 기판 상에 촉매를 사용하지 않고 Zn powder만을 사용하여 ZnO 나노 구조를 성장시켰다. 450$^{\circ}$C ${\sim}$ 600$^{\circ}C$의 성장 온도에서 형성된 ZnO 나노 구조는 다양한 측정 방법을 이용해 구조적, 광학적인 특성을 분석하였다. Scanning Electron Microscopy (SEM)로 관찰한 결과, 모든 성장 온도에서 tetrapod 형 나노 구조와 구형의 cluster가 관찰되었다. Tetrapod 형 나노 구조는 성장 온도에 의한 크기나 밀도에 큰 영향이 없었지만, 구형의 cluster의 경우 성장 온도에 따른 밀도와 크기의 변화가 관찰되었다. Energy Dispersive X-ray spectroscopy (EDX)로 각각의 구조의 원소 조성비를 분석한 결과, tetrapod는 Zn:O가 1:1인 화학양론적인 조성을 보였으나, cluster는 산소 결핍형의 조성비를 가지고 있었다. 성장된 모든 샘플은 실온에서 매우 강한 발광을 보였으며, 380nm 중심의 UV 발광 피크와 500nm 중심의 green 발광 피크 (G-밴드)가 관찰되었고, UV 발광의 강도에 대한 G-밴드의 강도는 성장 온도가 높아질수록 증가하였다. 이러한 두 가지 발광 피크의 기원을 조사하기 위해 Cathodoluminescence(CL) 측정이 이루어졌고, UV 발광은 주로 tetrapod 구조에서, G-밴드 발광은 주로 cluster 구조에서 기인한다는 사실을 알 수 있었다.