• 한국안전학회지
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• 제36권4호
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• pp.62-70
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• 2021

Representative systematic accident analysis methods proposed so far include AcciMap, STAMP, and FRAM. This study used these three techniques to analyze a fire accident case that occurred during routine manufacturing work in a domestic chemical plant and compared the results. The methods used different approaches to identify the cause of the accident, but they all highlighted similar causal factors. In addition to technical issues, the three accident analysis methods identified factors related to safety education, risk assessment, and the operation of the process safety management system, as well as management philosophy and company culture as problems. The AcciMap and STAMP models play complementary roles because they use hierarchical structures, while FRAM is more effective in analyses centered on human and organizational functions than in technical analyses.

• 한국산업보건학회지
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• 제33권2호
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• pp.188-205
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• 2023

Objectives: Methanol poisoning accidents in smartphone parts manufacturing facilities were analyzed using a systemic accident analysis method, and the necessity and possibility of the application of this systemic method in the field of occupational health were reviewed. Methods: A STAMP model for accident analysis was created based on the previously published literature. CAST analysis was performed to find the causal factors of the components and between the components. Results: The STAMP model visually showed the abstract and complex system control structure. The CAST analysis results could include all the causal factors from the previously published literature, and presented them holistically. Additional causal factors that were not presented in the literature were found. Conclusions: The holistic accident analysis results in this study will be helpful to establish comprehensive measures to prevent methanol or other chemical poisoning accidents. Therefore, it will be necessary to use systemic accident analysis methods in the field of occupational health.

• 제어로봇시스템학회논문지
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• 제10권7호
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• pp.604-610
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• 2004

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising method for cost-effectively defining nanoscale structures at room temperature and low pressure. Since the resolution of transferred nanostructures depends strongly upon that of nanostamps, the nanostamp fabrication technology is a key technology to UV-NIL. In this paper, a $5\times5\times0.09$ in. quartz stamp whose critical dimension is 377 nm was fabricated using the etching process in which a Cr film was employed as a hard mask for transferring nanostructures onto the quartz plate. To effectively apply the fabricated 5-in. stamp to UV-NIL on a 4-in. Si wafer, we have proposed a new UV-NIL process using a multi-dispensing method as a way to supply resist on a wafer. Experiments have shown that the multi-dispensing method can enable UV-NIL using a large-area stamp.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2003년도 춘계학술대회
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• pp.1069-1072
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• 2003

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising nanoimprint method for cost-effectively defining nanometer scale structures at room temperature and low pressure. Nanostamp fabrication technology is a key technology for UV-NIL because fabricating a high resolution nanostamp is the first step for defining high resolution nanostructures in a substrate. We used quartz as an UV transparent stamp material for the UVNIL. A $5{\times}5{\times}0.09$ inch stamp was fabricated using the quartz etch process in which Cr film was used as a hard mask for transferring nanostructures into the quartz. In this paper, we describe the quartz etching process and discuss the results including SEM images.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 춘계학술대회 논문집
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• pp.199-202
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• 2003

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising method for cost-effectively defining nanoscale structures at room temperature and low pressure. Since the resolution of nanostructures depends strongly upon that of nanostamps, the nanostamp fabrication technology is a key technology to UV-NIL. In this paper, a 5$\times$5$\times$0.09 in. quartz stamp whose critical dimension is 377 nm was fabricated using the etch process in which a Cr film was employed as a hard mask for transferring nanostructures onto the quartz plate. To effectively apply tile fabricated 5-in. stamp to UV-NIL on a 4-in. Si wafer, we have proposed a new UV-NIL process using a multi-dispensing method as a way to supply resist on a wafer Experiments have shown that the multi-dispensing method can enable UV-NIL rising a large-area stamp.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 춘계학술대회 논문집
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• pp.624-627
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• 2003

Microcontact printing (uCP) of alkanethiols on gold was the first representative of soft-lithography processes. This is an attempt to enhance the accuracy of classical to a precision comparable with optical lithography, creating a low-cost, large-area, and high-resolution patterning process. Microcontact printing relies on replication of a pattered PDMS stamp from a master to form an elastic stamp that can be inked with a SAM solution(monolayer -forming ink) using either immersion inking or contact inking. The inked PDMS stamp is then used to print a pattern that selectively protects the gold substrate during the subsequent etch.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.173-173
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• 2008

이전 까진 기판용 imprinting공법 기술 개발 과제를 하면서 imprint공정 진행시 일축형프레스를 이용하여 실험을 하면서 전면적의 균일한 압력을 가하여 절연필름의 Residue film 적게 남는것이 가장 이상적이지만, stamp두께가 전면이 똑같은 두께가 아니고 편차가 있어서 imprint를 하고나면 stamp 편차가 두꺼운 쪽은 많은 압력이 가해지고, 적은 쪽은 압력전달이 적게되어 Demolding을 하고나면 기판위에 패턴은 고르게 전사되지만 Cross section을 보게 되면 한쪽은 Residue film이 많이 남고 다른 한쪽은 적게 남게 되어 디스미어 공법시 패턴에 손상이 가지 않게 완전한 Residue film 제어가 쉽지 않고, 여러장을 동시에 한판에 imprint가 불가능 하고 기판 size가 커지면 Residue film의 편차가 심해서 더 이상 공정 진행이 불가능 했다. 하지만 Easyclave장비로 imprint를 하면 공기의 압으로 stamp전면에 똑같은 압력이 가해져 Residue film의 편차가 거의 없이 공정 진행이 가능했으며, 두께가 서로 틀려도 여러장의 기판을 동시에 imprint를 할수 있게 되었다, 일축형 프레스와 Easyclave의 실험결과를 비교하여 Easyclave장비의 imprint가능성과 이로운점을 발표하고자 한다.

• 한국해양공학회지
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• 제13권1호통권31호
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• pp.29-38
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• 1999

In this paper the forming simulation of circular bulge by using PAM-STAMP has been performed to estimate the sheet metal forning and the plastic deformation characteristic of circular bulge. The uniaxial tension tests adn bulge tests are carried out for studying the forming characteristics of materials, and also Moire experiment are carried out for measuring the radius of curvature of the bulge and the polar compressive thickness strain. In order to compare the simulation results with the experiment and Hills theory, the relationships between redius of curvature adn polar height of the bulge, between hydraulic pressure and polar height, and between polar compressive thickness strain and polar height, are used. According to this study, the results of simulation and Hills theory are good agreement to the experiment. So, the results of simulation by using PAM-STAMP and Hills theory will give engineers good information to assess the formagbility and plastic deformation characteristic of hydraulic circular bulge test.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.87-87
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• 2010

We report a new patterning technique of inorganic materials by using thin-film transfer printing (TFTP) with atomic layer deposition. This method consists of the atomic layer deposition (ALD) of inorganic thin film and a nanotransfer printing (nTP) that is based on a water-mediated transfer process. In the TFTP method, the Al2O3 ALD growth occurs on FTS-coated PDMS stamp without specific chemical species, such as hydroxyl group. The CF3-terminated alkylsiloxane monolayer, which is coated on PDMS stamp, provides a weak adhesion between the deposited Al2O3 and stamp, and promotes the easy and complete release of Al2O3 film from the stamp. And also, the water layer serves as an adhesion layer to provide good conformal contact and form strong covalent bonding between the Al2O3 layer and Si substrate. Thus, the TFTP technique is potentially useful for making nanochannels of various inorganic materials.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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• pp.265.1-265.1
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• 2013

Nanoporous anodic aluminum oxide (AAO), a self-ordered hexagonal array has various applications for nanofabrication such as nanotemplate, and nanostructure. In order to obtain highly-ordered porous alumina membranes, Masuda et al. proposed a two-step anodization process however this process is confined to small domain size and long hours. Recently, alternative methods overcoming limitations of two-step process were used to make prepatterned Al surface. In this work, we confirmed that there is a specific tendency used a PDMS stamp to obtain a pre-patterned Al surface. Using the nanoindentaions of a PDMS stamp as chemical carrier for wet etching, we can easily get ordered nanoporous template without two-step process. This chemical etching method using a PDMS stamp is very simple, fast and inexpensive. We use two types of PDMS stamps that have different intervals (800nm, 1200nm) and change some parameters have influenced the patterning of being anodized, applied voltage, soaking and stamping time. Through these factors, we demonstrated the patterning effect of large scale PDMS stamp.