• 제목/요약/키워드: spacer layer

검색결과 75건 처리시간 0.026초

Development of Cobalt Sulfide-graphene Composite for Supercapacitor Applications

  • Jana, Milan;Samanta, Pranab;Murmu, Naresh Chandra;Kim, Nam Hoon;Kuila, Tapas;Lee, Joong Hee
    • Composites Research
    • /
    • 제29권4호
    • /
    • pp.167-172
    • /
    • 2016
  • $Co_9S_8/reduced$ graphene (CSRG) has been prepared by a facile two step hydrothermal method and used as a supercapacitor electrode material. It is anticipated that the $Co_9S_8$ and reduced graphene oxide (RGO) would serve as a spacer material to each other to stop the agglomeration and simultaneous contribution of electrical double layer capacitance (RGO) and pseudocapacitance ($Co_9S_8$) would provide high electrochemical properties. The chemical analysis has been done by Fourier transform infrared spectroscopy and the morphology is characterised by field emission scanning electron microscopy. CSRG shows a high electrical conductivity of $98S\;m^{-1}$. The symmetric supercapacitor shows a specific capacitance of ${\sim}728F\;g^{-1}$ with a current density of $2A\;g^{-1}$. CSRG also showed an energy density of $25.2Wh\;kg^{-1}$ with a power density of $1000W\;kg^{-1}$.

콜레스테릭 액정의 합성과 광학필름용 편광성분으로서의 응용 (Synthesis of Cholesteric Liquid Crystal and Its Application as a Polarizing Component on the Optical Film)

  • 김용석;이광연;안철흥;김건중
    • 공업화학
    • /
    • 제19권6호
    • /
    • pp.661-667
    • /
    • 2008
  • 본 연구에서는 LCD 백라이트용 휘도향상 편광필름으로 사용하기 위해, 콜레스테릭 액정(CLC)을 합성하여 네미틱 액정과 혼합한 다음 이들이 충진된 모듈을 제작하였다. 광확산필름에 의해 면광원화된 빛을 통과시킬 때, LCD 백라이트상에서 이들의 투과광 증폭 및 편광능력에 대한 특성을 연구하였다. 합성된 콜레스테릭 액정의 특성은 UV/Visible 스펙트럼과 편광현미경(POM) 등으로 평가하였다. 여러 종류의 선형 카르복실산을 콜레스테롤 분자에 도입하여 콜레스테릭 메소젠 사이의 유연격자를 이루도록 유도하여 각 층에서 일정한 방향성을 유지하도록 하였다. 또한 CLC필름을 적층하여 가시광선대에서 편광능력, 휘도향상 및 투과파장영역을 넓히고 백라이트 유니트의 밝기를 향상시키는 모듈로 적용할 수 있었다.

Non-volatile Molecular Memory using Nano-interfaced Organic Molecules in the Organic Field Effect Transistor

  • 이효영
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
    • /
    • pp.31-32
    • /
    • 2010
  • In our previous reports [1-3], electron transport for the switching and memory devices using alkyl thiol-tethered Ru-terpyridine complex compounds with metal-insulator-metal crossbar structure has been presented. On the other hand, among organic memory devices, a memory based on the OFET is attractive because of its nondestructive readout and single transistor applications. Several attempts at nonvolatile organic memories involve electrets, which are chargeable dielectrics. However, these devices still do not sufficiently satisfy the criteria demanded in order to compete with other types of memory devices, and the electrets are generally limited to polymer materials. Until now, there is no report on nonvolatile organic electrets using nano-interfaced organic monomer layer as a dielectric material even though the use of organic monomer materials become important for the development of molecularly interfaced memory and logic elements. Furthermore, to increase a retention time for the nonvolatile organic memory device as well as to understand an intrinsic memory property, a molecular design of the organic materials is also getting important issue. In this presentation, we report on the OFET memory device built on a silicon wafer and based on films of pentacene and a SiO2 gate insulator that are separated by organic molecules which act as a gate dielectric. We proposed push-pull organic molecules (PPOM) containing triarylamine asan electron donating group (EDG), thiophene as a spacer, and malononitrile as an electron withdrawing group (EWG). The PPOM were designed to control charge transport by differences of the dihedral angles induced by a steric hindrance effect of side chainswithin the molecules. Therefore, we expect that these PPOM with potential energy barrier can save the charges which are transported to the nano-interface between the semiconductor and organic molecules used as the dielectrics. Finally, we also expect that the charges can be contributed to the memory capacity of the memory OFET device.[4]

  • PDF

Structure and Physical Properties of Fe/Si Multiayered Films with Very Thin Sublayers

  • Baek, J.Y;Y.V.Kudryavtsev;J.Y.Rhee;Kim, K.W.;Y.P.Le
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
    • /
    • pp.173-173
    • /
    • 2000
  • Multilayered films (MLF) consisting of transition metals and semiconductors have drawn a great deal of interest because of their unique properties and potential technological applications. Fe/Si MLF are a particular topic of research due to their interesting antiferromagnetic coupling behavior. although a number of experimental works have been done to understand the mechanism of the interlayer coupling in this system, the results are controversial and it is not yet well understood how the formation of an iron silicide in the spacer layers affects the coupling. The interpretation of the coupling data had been hampered by the lack of knowledge about the intermixed iron silicide layer which has been variously hypothesized to be a metallic compound in the B2 structure or a semiconductor in the more complex B20 structure. It is well known that both magneto-optical (MO0 and optical properties of a metal depend strongly on their electronic structure that is also correlated with the atomic and chemical ordering. In order to understand the structure and physical properties of the interfacial regions, Fe/Si multilayers with very thin sublayers were investigated by the MO and optical spectroscopies. The Fe/si MLF were prepared by rf-sputtering onto glass substrates at room temperature with a totall thickness of about 100nm. The thicknesses of Fe and Si sublayers were varied from 0.3 to 0.8 nm. In order to understand the fully intermixed state, the MLF were also annealed at various temperatures. The structure and magnetic properties of Fe/Si MLF were investigated by x-ray diffraction and vibrating sample magnertometer, respectively. The MO and optical properties were measured at toom temperature in the 1.0-4.7 eV energy range. The results were analyzed in connection with the MO and optical properties of bulk and thin-film silicides with various structures and stoichiometries.

  • PDF

Optical Characteristics of Near-monolayer InAs Quantum Dots

  • 김영호;김성준;노삼규;박동우;김진수;임인식;김종수
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
    • /
    • pp.293-294
    • /
    • 2011
  • It is known that semiconductor quantum-dot (QD) heterostructures have superior zero-dimensional quantum confinement, and they have been successfully applied to semiconductor laser diodes (QDLDs) for optical communication and infrared photodetectors (QDIPs) for thermal images [1]. The self-assembled QDs are normally formed at Stranski-Krastanov (S-K) growth mode utilizing the accumulated strain due to lattice-mismatch existing at heterointerfaces between QDs and cap layers. In order to increase the areal density and the number of stacks of QDs, recently, sub-monolayer (SML)-thick QDs (SQDs) with reduced strain were tried by equivalent thicknesses thinner than a wetting layer (WL) existing in conventional QDs (CQDs) by S-K mode. Despite that it is very different from CQDs with a well-defined WL, the SQD structure has been successfully applied to QDIP[2]. In this study, optical characteristics are investigated by using photoluminescence (PL) spectra taken from self-assembled InAs/GaAs QDs whose coverage are changing from submonolayer to a few monolayers. The QD structures were grown by using molecular beam epitaxy (MBE) on semi-insulating GaAs (100) substrates, and formed at a substrate temperature of 480$^{\circ}C$ followed by covering GaAs cap layer at 590$^{\circ}C$. We prepared six 10-period-stacked QD samples with different InAs coverages and thicknesses of GaAs spacer layers. In the QD coverage below WL thickness (~1.7 ML), the majority of SQDs with no WL coexisted with a small amount of CQDs with a WL, and multi-peak spectra changed to a single peak profile. A transition from SQDs to CQDs was found before and after a WL formation, and the sublevel of SQDs peaking at (1.32${\pm}$0.1) eV was much closer to the GaAs bandedge than that of CQDs (~1.2 eV). These revealed that QDs with no WL could be formed by near-ML coverage in InAs/GaAs system, and single-mode SQDs could be achieved by 1.5 ML just below WL that a strain field was entirely uniform.

  • PDF