• Journal of Surface Science and Engineering
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• v.53 no.3
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• pp.124-129
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• 2020

This study is for the development of high temperature ALD SiO₂ film process, optimized for gap-fill process in manufacturing memory products, using a space-divided PE-ALD system equipped with an independent control dual plasma system and orbital moving unit. Space divided PE-ALD System has high productivity, and various applications can be applied according to Top Lid Design. But space divided ALD system has a limitation to realize concentric deposition map due to process influence due to disk rotation. In order to solve this problem, we developed an orbit rotation moving unit in which disk and wafer. Also we used Independent dual plasma system to enhance thin film properties. Improve productivity and film density for gap-fill process by having deposition and surface treatment in one cycle. Optimize deposition process for gap-fill patterns with different depths by utilizing our independently controlled dual plasma system to insert N₂and/or He plasma during surface treatment, Provide void-free gap-fill process for high aspect ratio gap-fill patterns (up to 50:1) with convex curvature by adjusting deposition and surface treatment recipe in a cycle.

• Steel and Composite Structures
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• v.33 no.6
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• pp.767-776
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• 2019

In this article, a simple and robust multi-objective assessment method to control design angles and node positions connected among steel outrigger truss members is proposed to approve both structural safety and economical cost. For given outrigger member layouts, the present method utilizes general-purpose prototypes of outrigger members, having resistance to withstand lateral load effects directly applied to tall buildings, which conform to variable connecting node and design space deposition. Outrigger layouts are set into several initial design conditions of height to width of an arbitrary given design space, i.e., variable design space. And then they are assessed in terms of a proposed multi-objective function optimizing both minimal total displacement and material quantity subjected to design impact factor indicating the importance of objectives. To evaluate the proposed multi-objective function, an analysis model uses a modified Maxwell-Mohr method, and an optimization model is defined by a ground structure assuming arbitrary discrete straight members. It provides a new robust assessment model from a local design point of view, as it may produce specific optimal prototypes of outrigger layouts corresponding to arbitrary height and width ratio of design space. Numerical examples verify the validity and robustness of the present assessment method for controlling prototypes of outrigger truss members considering a multi-objective optimization achieving structural safety and material cost.

• 한국초전도학회:학술대회논문집
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• v.10
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• pp.145-145
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• 2000

Large area YBCO - films are series produced by thermal co-evaporation using a deposition scheme known as Garching process, which allows intermittent oxygen supply in a high vacuum ambient by an oxygen cup spaced closely underneath the moving substrates. The deposition area of 9" diameter is capable to handle very large wafers up to 8" diam. or numerous smaller wafers. The large distance between substrates and boat sources and an elaborate heater design guarantee excellent film uniformity over the entire deposition area. YBCO - films deposited by this technique are commercially fabricated for a variety of applications - the most prominent are resistive fault current limiters and microwave filters for mobile or satellite communications. IMUX and OMUX - filters are currently space qualined by Robert Bosch GmbH and are expected to be launched and installed on an experimental platform of the international space station ALPHA in 2001. Both of the above applications require quite different film specifications on the one hand, but at the same time extremely high uniformity and reproducibility on the other hand, since hundreds of YBCO - films are combined to large systems or have to be approved for manned space missions. The success of such projects is direct evidence that the technique of thermal evaporation is readily capable to meet these high demands and has become the major deposition technique to support the emerging HTS market.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.336-339
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• 2007

The enhanced control of OLED deposition processes by Organic Vapor Phase Deposition $(OVPD^{(R)})$ is discussed. $OVPD^{(R)}$ opens a wide space of process control parameters. It allows the accurate and individual control of deposition layer properties like morphology and precise mixing of multi component layers (co-deposition) in comparison to conventional deposition manufacturing processes like e. g. VTE (vacuum thermal evaporation).

• Tunnel and Underground Space
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• v.9 no.2
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• pp.102-113
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• 1999

Two-dimensional and three-dimensional DEM programs, UDEC and 3DEC, were used to investigate the mechanical stability of the conceptual design of deposition drift and deposition holes constructed in a crystalline rock mass. From the simulations, the influence of discontinuities, the number of deposition holes, and deposition hole interval on the stability of deposition drift and deposition holes could be determined. From the two-dimensional and three-dimensional analysis. it was concluded that three-dimensional analysis should be carried 7ut fur deriving reliable conclusions. Even though the deposition hole interval changed from 8 m to 3 m, which did not damage the mechanical stability of the deposition drift.

• Journal of Korean Society for Atmospheric Environment
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• v.16 no.6
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• pp.675-684
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• 2000

A novel dry and wet deposition collector, which can overcome the several problems such as water evaporation cartridge cracks and high costs founded in the previous collector systems, has been constructed. ENVI-18 SPE adsorption cartridge has been used to measure atmospheric deposition of polycylic aromatic hydrocarbons (PAHs). A surrogate surface, consisted of water and methanol, was filled in the dry deposition funnel to simulate dry deposition onto water surface. A water supply system in order to compensat evaporation of the surrogate surface was used and it was consisted of a piston pump, a tubing pump, a overflow tube and a chamber system. A novel water vaporizing system to supply water onto the wet SPE cartridge system with a constant flow rate was developed. The novel water vaporizing system, consisted of a vacuum pump, a water supply reserviour and tube and a mini space heater, could prevent the PAHs adsorption cartridge cracks occurred in the previous collector and effectively adsorb PAHs. The novel dry and wet deposition collector showed a good adsorption, desorption, and recovery rates of PAHs. By reducing the number of pumps used and employing polypyopylene (PP) instead of teflon as a material of collection funnel, the total construction costs were much reduced as compared with the previous dry and wet deposition collectors.

• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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• 2002.10b
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• pp.7-8
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• 2002

It is a time to introduce a concept of lubrication to space systems. Minimum amount of lubricant should be supplied to a contact interface instead of preparing too much lubricant on surfaces of the earth. In situ controllable lubrication method is wanted to overcome unexpected tribo-troubles in space. Tribo-coating, which forms a thin solid film in nm-scale by vacuum deposition during friction, is a promising lubrication method for space.

• Journal of the Korean Ceramic Society
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• v.53 no.3
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• pp.317-324
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• 2016

Continued miniaturization and increasingly exact requirements for thin film deposition in the semiconductor industry is driving the search for new effective, efficient, selective precursors and processes. The requirements of defect-free, conformal films, and precise thickness control have focused attention on atomic layer deposition (ALD). ALD precursors so far have been developed through a trial-and-error experimental approach, leveraging the expertise and tribal knowledge of individual research groups. Precursors can show significant variation in performance, depending on specific choice of co-reactant, deposition stage, and processing conditions. The chemical design space for reactive thin film precursors is enormous and there is urgent need for the development of computational approaches to help identify new ligand-metal architectures and functional co-reactants that deliver the required surface activity for next-generation thin-film deposition processes. In this paper we discuss quantum mechanical simulation (e.g. density functional theory, DFT) applied to ALD precursor reactivity and state-of-the-art automated screening approaches to assist experimental efforts leading toward optimized precursors for next-generation ALD processes.

• Proceedings of the Korean Vacuum Society Conference
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• 2001.02a
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• pp.23-24
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• 2001

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.22 no.7
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• pp.595-601
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• 2009

For the silicon oxide $(SiO_x)$ films prepared by using the facing target sputtering (FTS) apparatus that was manufactured to enhance the preciseness of the fabricated thin-film and sputtering yield rate by forming a higher-density plasma in the electrical discharge space for using it as a thin-film passivation system for flexible organic light emitting devices (FOLEDs). The deposition characteristics were investigated under various process conditions, such as array of the cathode magnets, oxygen concentration$(O_2/Ar+O_2)$ introduced during deposition, and variations of distance between two targets and working pressure. We report that the optimum conditions for our FTS apparatus for the deposition of the $SiO_x$ films are as follows: $d_{TS}\;and\;d_{TT}$ are 90mm and 120mm, respectively and the maximum deposition rate is obtained under a gas pressure of 2 mTorr with an oxygen concentration of 3.3%. Under this optimum conditions, it was found that the $SiO_x$ film was grown with a very high deposition rate of $250{\AA}$/min by rf-power of $4.4W/cm^2$, which was significantly enhanced as compared with a deposition rate (${\sim}55{\AA})$/min) of the conventional sputtering system. We also reported that the FTS system is a suitable method for the high speed and the low temperature deposition, the plasma free deposition, and the mass-production.