• Journal of Advanced Marine Engineering and Technology
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• 제22권5호
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• pp.702-711
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• 1998

The characteristics of corrosion resistance for the surface of medium high carbon steels and low alloy steels utilizing as manufacturing the machinery structures and machining tools and treating by plasma/ion nitriding process have been studied in terms of electrochemical polarization behav-iors including corrosion potential(Ecorr) anodic polarization trends and polarization resistance(Rp) The seven base materials showed a clear passivation behavior for the polarization tests in the ASTM standard solution 1N ${H_2){SO_4}$ Although the treated surface by plasma nitriding for the seven test materials showed a significant increase in hardness the treatment gave a detri-mental effect in corrosion resistance. The various characteristics including corrosion potential polarization curves microstructures corrosion current polarization resistance among non-treat-ed nitriding and/or soft-nitriding treated specimens have been investigated and some of the mechanisms discussed.

• 한국환경과학회지
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• 제23권6호
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• pp.1165-1173
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• 2014

For the field application of dielectric barrier discharge plasma reactor in nutrient solution culture, a filtration-DBD (dielectric barrier discharge) plasma reactor was investigated for the Ralstonia solanacearum which causes bacterial wilt in aquiculture. The filtration-DBD plasma reactor system of this study was consisted of filter, plasma reactor, reservoir. The DBD plasma reactor consisted of a quartz dielectric tube, discharge electrode (inner) and ground electrode (outer). The experimental results showed that the inactivation of R. solanacearum with filter media type in filter reactor ranked in the following order: anthracite > fiber ball > sand > ceramic ball > quartz ceramic. In filtration + plasma process, disinfection effect with the voltage was found to small. In disinfection time of 120 minutes, residual R. solanacearum concentration was 1.17 log (15 CFU/mL). When the continuous disinfection time was 120 minute, disinfection effect was thought to keep the four days. In sporadic operation mode of 30 minutes disinfection - 24 hours break, residual R. solanacearum concentration after five days was 0.3 log (2 CFU/mL). It is considered that most of R. solanacearum has been inactivated substantially.

• 반도체디스플레이기술학회지
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• 제21권3호
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• pp.74-79
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• 2022

In this study, the plasma corrosion resistance and the change in the number of contamination particles generated using the plasma etching process and cleaning process of coating parts for semiconductor plasma etching equipment were investigated. As the coating method, atmospheric plasma spray (APS) was used, and the powder materials were Y₂O₃ and Y₃Al₅O₁₂ (YAG). There was a clear difference in the densities of the coatings due to the difference in solubility due to the melting point of the powdered material. As a plasma environment, a mixed gas of CF₄, O₂, and Ar was used, and the etching process was performed at 200 W for 60 min. After the plasma etching process, a fluorinated film was formed on the surface, and it was confirmed that the plasma resistance was lowered and contaminant particles were generated. We performed a surface cleaning process using piranha solution(H₂SO₄(3):H₂O₂(1)) to remove the defect-causing surface fluorinated film. APS-Y₂O₃ and APS-YAG coatings commonly increased the number of defects (pores, cracks) on the coating surface by plasma etching and cleaning processes. As a result, it was confirmed that the generation of contamination particles increased and the breakdown voltage decreased. In particular, in the case of APS-YAG under the same cleaning process conditions, some of the fluorinated film remained and surface defects increased, which accelerated the increase in the number of contamination particles after cleaning. These results suggest that contaminating particles and the breakdown voltage that causes defects in semiconductor devices can be controlled through the optimization of the APS coating process and cleaning process.

• 한국건축시공학회:학술대회논문집
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• 한국건축시공학회 2020년도 가을 학술논문 발표대회
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• pp.52-53
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• 2020

The thermal spray coating process is being used to protect the metals and alloys from wear, abrasion, fatigue, tribology, and corrosion failure. Therefore, in the present study, Al and Zn was deposited by plasma arc thermal spray process onto the steel substrate and their performance was assessed. The bond adhesion result shows that Al coating has higher value attributed to compact, dense, and less porous compared to Zn coating which contain defects/pores and uneven morphology assessed by scanning electron microscopy (SEM). Electrochemical results show that the Al coating exhibited higher impedance value compared to Zn in artificial ocean water solution at prolonged exposure periods. However, both coatings show the increment in polarization resistance with exposure periods which reveal that porosity of coatings is filled by the corrosion products.

• 한국표면공학회지
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• 제51권3호
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• pp.179-184
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• 2018

In this study, Ni and tungsten carbide (WC) nanoparticles are simultaneously synthesized with the mesoporous carbon nanoparticles (CNP) using a solution plasma processing (SPP) in the benzene. The Ni and WC nanoparticles were formed through the sputtering effect of electrodes during discharge, and mean time CNP were formed through reduction reaction. TEM observation showed that loaded Ni and WC nanoparticles were evenly dispersed on the CNP. The results of electrochemical analysis demonstrated that an introduction of Ni nanoparticles promoted to improve catalytic activity for oxygen reduction reaction (ORR). Moreover, Ni-WC/CNP lead to fast electron transfer process compared to that of WC/CNP. Therefore, the inexpensive Ni-WC/CNP might be a promising as catalytic material for cathodes in fuel cell applications.

• 한국표면공학회지
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• 제37권6호
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• pp.313-318
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• 2004

Vertically-aligned and uniformly-distributed CuO nanowires were formed on copper-coated Si substrates by wet chemical process, immersing them in a hot alkaline solution. The effects of hydrogen plasma treatment on the field emission characteristics of CuO nanowires were investigated. It was found that hydrogen plasma treatment enhanced the field emission properties of CuO nanowires by showing a decrease in turn-on voltage, and an increase in emission current density, and stability of current-voltage curves. However, the excessive hydrogen plasma treatment made the I-V curves unstable. It was confirmed by XPS (X-ray Photoelectron Spectroscopy) analysis that hydrogen plasma treatment deoxidized CuO nanowires, thereby the work function of the nanowires decreased from 4.35 eV (CuO) to 4.1 eV (Cu). It is thought that the decrease in the work function enhanced the field emission characteristics. It is well-known that the lower the work function, the better the field emission characteristics. The results suggest that the hydrogen plasma treatment is very effective in achieving enhanced field emission properties of the CuO nanowires, and there may exist an optimal hydrogen plasma treatment condition.

• 한국표면공학회지
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• 제56권6호
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• pp.386-392
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• 2023

In this work, we describe the reduction kinetics of gold nanoparticles synthesized by plasma discharge in aqueous solutions with varied voltages and precursor (HAuCl₄) concentrations. The reduction rate of [AuCl₄]^- was determined by introducing NaBr to the gold colloidal solution synthesized by plasma discharge, serving as a catalyst in the reduction process. We observed that [AuCl₄]^- was completely reduced when its characteristic absorption peak at 380 nm disappeared, indicating the absence of [AuCl₄]^- for ligand exchange with NaBr. The reduction rate notably increased with the rise in discharge voltage, attributable to the intensified plasma generated by ionization and excitation, which in turn accelerated the reduction kinetics. Regarding precursor concentration, a lower concentration was found to retard the reduction reaction, significantly influencing the reduction kinetics due to the presence of active H⁺ and H radicals. Therefore, the production of strong plasma with high plasma density was observed to enhance the reduction kinetics, as evidenced by optical emission spectroscopy.

• 자원리싸이클링
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• 제25권3호
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• pp.49-54
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• 2016

본 연구에서는, 아크 플라즈마 정련을 이용하여 지르콘샌드($ZrSiO_4$)를 지르코니아($ZrO_2$)와 실리카($SiO_2$)로 분리하였다. 실리카를 마이크로웨이브 침출을 통해 제거하고 고순도의 지르코니아를 얻었다. 플라즈마 퓨전은 두 가지 공정을 순차적으로 진행하였다. Ar 100% 분위기에서 환원 공정을 거친 후, Ar-$H_2$ 혼합 가스를 통해 정련과정을 거쳤다. 진공 챔버 내에서 냉각 후 지르코니아와 실리카로 이루어진 고상을 얻었다. 마이크로웨이브 침출을 위해 $240^{\circ}C$, 20% 황산용액을 사용하였다. 분석 결과 고순도(98.6%)의 지르코니아를 얻을 수 있었다.

• 한국환경과학회지
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• 제23권9호
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• pp.1601-1608
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• 2014

Plasma reactor was used for the inactivation of Phytophthora capsici which is phytophthora blight pathogen in aquiculture. Effects of first voltage, second voltage, air flow rate, pH, incubation water concentration were examined. At the low $1^{st}$ voltage, under 80 V, the lag phase was noticed within 30 sec, however, it was not shown over 100 V. The variation of optimum operation condition was not shown by the variation of microorganisms. However, the inactivation rate was different by the variation of species of microorganisms. The inactivation rate and efficiency were increased by the increase of $2^{nd}$ voltage. The highest initial inactivation rate was shown at pH 3 and the rate was decreased by the increase of pH. The inactivation rate increased by the increase of air flow rate, however, it was shown as similar at the rate of 4 L/min and 5 L/min. The inactivation rate was distinctly decreased at the three times concentration of incubation solution comparing at the distilled water and basic incubation solution.

• Journal of Welding and Joining
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• 제21권4호
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• pp.39-45
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• 2003

Nano-TiO$_2$ photocatalytic coatings were deposited on the stainless steel 304(50$\times$70$\times$3mm) by the APS(Atmospheric Plasma Spraying). Photocatlytic reaction was tested in MB(methylene blue) aqueous solution. For applying nano-TiO$_2$ powders by thermal spray, the starting nano-TiO$_2$ powder with 100% anatase crystalline was agglomerated by spray drying. Plasma second gas(H$_2$) flow rate and spraying distance were used as principal process parameters which are known to control heat enthalpy(heat input). The relationship between process parameters and the characteristics of microstructure such as the anatase phase fraction and grain size of the TiO$_2$ coatings were investigated. The photo-decomposition efficiency of TiO$_2$ coatings was evaluated by the kinetics of MB aqueous solution decomposition. It was found that the TiO$_2$ coating with a lower heat input condition had a higher anatase fraction, smaller anatase grain size and a better photo-decomposition efficiency.