• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1999.11a
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• pp.578-581
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• 1999

Dot pattern print methods composed of a diffusion film and two prism sheets, have been generally used for backlighting systems of LCDs. However, this methods require complex structures and show high power consumption and optical loss. To improve these disadvantages of conventional backlight units, light guides using highly scattering optical transmissions (HSOT) polymer as scatters, have been introduced. In this study we analyzed multiple scattering effect in light guide by means of Monte carlo simulation based on Mie scattering theory and ray tracing method. As a result it was revealed that scattering intensity depends on the size of scatters. On the other hands, it was shown that scattering efficiency depends on the wavelength of fluorescent lamp as well as the size of scatters.

• Journal of the Microelectronics and Packaging Society
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• v.13 no.3 s.40
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• pp.13-17
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• 2006

Dense and periodic arrays of holes and tungsten none dots were fabricated on silicon oxide and silicon. The holes were approximately 25 nm wide, 40 nm deep, and 60 nm apart. To obtain nano-size patterns, self-assembling resists were used to produce layer of hexagonally ordered parallel cylinders of polymethylmethacrylate(PMMA) in polystyrene(PS) matrix. The PMMA cylinders were degraded and removed with acetic acid rinse to produce a PS mask for pattern transfer. The silicon oxide was removed by fluorine-based reactive ion etching(RIE). Selectively deposited tungsten nano dots were formed inside nano-sized trench by using a low pressure chemical vapor deposition(LPCVD) method. Tungsten nano dot and trenched silicon sizes were 26 nm and 30 nm, respectively.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2002.05a
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• pp.520-523
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• 2002

The o]d technique of sandblasting which has been used for paint or scale removing, deburring, and glass decorating has recently been developed into a powder blasting technique for brittle materials, capable of producing micro structures larger than $100\mu\textrm{m}$. In this study, we investigated the effect of the size of abrasive and the stand-off distance on the machinability of SUS 304. The varying parameters were the impact angle $90^{\circ}$, scanning times of nozzle 10 and the different nozzle height between 70mm and 140mm. The diameter of dot pattern were 0.2mm. The powder were alumina sharp particles, WA #600, #800 and #2000. The blasting pressure of powder at 0.3 Mpa.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2005.05a
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• pp.237-240
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• 2005

The demand of micro electrical mechanical system (MEMS) bio/chemical sensor is rapidly increasing. To prevent the contamination of sensing area, a filtration system is required in on-chip total analyzing MEMS bio/chemical sensor. A nano-filter was mainly applied in some application detecting submicron feature size bio/chemical products such as bacteria, fungi and so on. We suggested a simple nano-filter fabrication process based on replication process. The mother pattern was fabricated by holographic lithography and reactive ion etching process, and the replication process was carried out using polymer mold and UV-imprinting process. Finally the nano-filter is obtained after removing the replicated part of metal deposited replica. In this study, as a practical example of the suggested process, a nano-dot array was replicated to fabricate nano-filter fur bacteria sensor application.

• Proceedings of the Optical Society of Korea Conference
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• 2009.02a
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• pp.133-134
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• 2009

Cold temperature development (CTD) of electron beam (EB) patterned resists and subsequent dry etching were investigated for fabrication of nano-patterned Niobium (Nb). Bulky Nb fims on GaAs substrates were deposited with EB evaporation. Line patterns on Nb cathode were fabricated by EB patterning and reactive ion etching (RIE). Size deviations of nano-sized line patterns from CAD designed patterns are dependent on the EB total exposure, but it can be improved by CTD of EB-exposed resist. Line patterns of 10 to 300 nm widths of EB-exposed resist patterns were drawn under various exposure conditions of $0.2{\mu}s$/dot (total 240,000 dot) with a constant current (50 pA). Compared with room temperature development (RTD), the CTD improves pattern resolution due to the suppression of backscattering effect. RIE with $CF_4$ was performed for formation of several nano-sized line patterns on Nb. Each EB-resist patterned samples with RTDs and CTDs were etched with two different $CF_4$ gas pressures of 5 Pa. Nb etching rate increases while GaAs (or ZEP) etching rate decreases as the chamber pressure increases. This different dependent of the etching rate on the $CF_4$ pressure between Nb and GaAs (or ZEP) has a significant meaning because selective etching of nano-sized Nb line patterns is possible without etching of the underlying active layer.

• Journal of the Korean Ceramic Society
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• v.41 no.10 s.269
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• pp.788-791
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• 2004

We have studied the fabrication of silver micro lines using the silver nano sol on ITO substrate by an ink-jet method. The average particles size of $10wt\%$ silver nano sol synthesized with polyelectrolytes was smaller than 10 nm. The pattern formation of silver nano sol on the substrate closely related with the contact angle of the silver nano sol. The dot shaped of silver nano sol on bare ITO substrate was formed due to the high contact angle of silver nano sol. When ITO substrates was treated with 100 ppm polyethylenimine for silver nano sol patterning, fine silver micro lines of $60{\sim}100{\mu}m$ width was fabricated by ink-jet method.

• Transactions of Materials Processing
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• v.16 no.1 s.91
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• pp.42-47
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• 2007

LCD-BLU is one of kernel parts of LCD and it consists of several optical sheets: LGP, light source and mold frame. The LGP of LCD-BLU is usually manufactured by etching process and forming numerous dots with $50\sim300{\mu}m$ diameter on the surface. But the surface of the etched dots of LGP is very rough due to the characteristics of the etching process during the mold fabrication, so that its light loss is high along with the dispersion of light into the surface. Accordingly, there is a limit in raising the luminance of LCD-BLU. In order to overcome the limit of current etched dot patterned LGP, optical pattern with continuous microlens was designed using optical simulation CAE. Also, a mold with continuous micro-lens was fabricated by UV-LiGA reflow process and applied to 7 inch size of navigator LCD-BLU in the present study.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.432-432
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• 2007

We studied optical simulation method for ultra slim backlight system. We designed 0.7mm thickness light guide plate and combined 48 white color LEDs for 12 inch wide size TFT-LCD. We designed flat shape PMMA light guide plate with both side patterned. It have vertical prism shape on upper side and ellipse dot pattern on the other side. We targeted 4500 nit brightness and uniform emission characteristic without hot spot or dark area. At first, we designed uniform emission area with more high brightness in center area and then, debugged light entering hot spot zone and direction of outgoing light flux. Although it was designing step, we obtained good result with reverse prism optical sheet and it had good repeatability because it was based on the stamper method in injection process without laser engraving or micro groove engraving method.

• Journal of Adhesion and Interface
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• v.19 no.4
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• pp.163-166
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• 2018

Dip-pen nanolithography(DPN) is an atomic force microscope (AFM) based method of generating nano- or micro-patterns. This technique has been used to transfer various ink materials on the substrate through water meniscus formed between AFM tip and the substrate surface. In this study, the heptadecafluoro-1,1,2,2-tetrahydrodecyltrimethoxysilane (HDFDTMS) ink materials were coated on the pre-coated AFM tip surface with the HDFDTMS molecules. When the tip brought into contact with the hydroxyl-functionalized silicon surface, HDFDTMS ink molecules have been successfully transported from the tip onto the surface via water meniscus. The created array and passivation area showed stable structures on the surface, and the transport of ink materials from the AFM tip to the surface followed linear increase in pattern size with contact time.

• Design & Manufacturing
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• v.13 no.4
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• pp.40-44
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• 2019

The light diffusion component spreads the light from one point evenly over a large area. Various types of light diffusion parts such as films and lenses are applied in the high-tech industries such as LCD display devices, lighting devices, and solar energy generation. Among these, a diffuser sheet (Diffuser Sheet) has a function to uniformly distribute the light, and various studies have been conducted to improve its function. The shape of the conventional light diffusion pattern is mainly made of a dot or hemispherical shape. In this study, a rectangular cone-shaped structure having a light diffusion function and an advantage of controlling the angle of refraction of light was fabricated by using a solenoid indentation process. The change in shape of the indentation structure was analyzed.