• Title/Summary/Keyword: semiconductor devices(OE.010

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The design of a single layer antireflection coating on the facet of buried channel waveguide devices using the angular spectrum method and field profiles obtained by the variational method (Variational 방법으로 구한 필드 분포와 Angular Spectrum 방법을 사용한 Buried채널 도파로 소자 단면의 단층 무반사 코팅 설계)

  • 김상택;김형주;김부균
    • Korean Journal of Optics and Photonics
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    • v.13 no.1
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    • pp.51-57
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    • 2002
  • We have calculated the optimum refractive index and normalized thickness of a single layer antireflection coating on the facet of buried channel waveguides as a function of waveguide width for several waveguide depths using the angular spectrum method and field profiles obtained by the effective index method (EIM) and the variational method (VM), respectively, and discussed the results. In the area of large waveguide width, the optimum parameters of a single layer antireflection coating obtained by both methods are almost the same. However, as waveguide width decreases, the parameters obtained by the VM approach those of a single layer antireflection coating between cladding layer and air, while those obtained by the EIM do not approach those, and the difference between the two parameters is large. The tolerance maps of the quasi-TE and quasi-TM modes obtained by the VM for square waveguides are located in almost the same area regardless of refractive index contrast, while those obtained by the free space radiation mode (FSRM) method for refractive index contrast of 10% are located in the different area. Thus, we think that the tolerance maps obtained by the VM are more exact than those obtained by the FSRM method.