• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.630-630
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• 2013

Recently, atomically smooth hexagonal boron nitride(h-BN) known as a white graphene has drawn great attention since the discovery of graphene. h-BN is a III-V compound and has a honeycomb structure very similar to graphene with smaller lattice mismatch. Because of strong covalent sp2bonds like graphene, h-BN provides a high thermal conductivity and mechanical strength as well as chemical stability of h-BN superior to graphene. While graphene has a high electrical conductivity, h-BN has a highly dielectric property as an insulator with optical band gap up to 6eV. Similar to the graphene, h-BN can be applied to a variety of field, such as gate dielectric layers/substrate, ultraviolet emitter, transparent membrane, and protective coatings. However, up until recently, obtaining and controlling good quality monolayer h-BN layers have been too difficult and challenging. In this work, we investigate the controlled synthesis of h-BN layers according to the growth condition, time, temperature, and gas partial pressure. h-BN is obtained by using chemical vapor deposition on Cu foil with ammonia borane (BH3NH3) as a source for h-BN. Scanning Transmission Electron Microscopy (STEM, JEOL-JEM-ARM200F) is used for imaging and structural analysis of h-BN layer. Sample's surface morphology is characterized by Field emission scanning electron microscopy (SEM, JEOL JSM-7100F). h-BN is analyzed by Raman spectroscopy (HORIBA, ARAMIS) and its topographic variations by Atomic force microscopy (AFM, Park Systems XE-100).

• Korean Journal of Chemical Engineering
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• 제35권12호
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• pp.2379-2383
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• 2018

We report a facile one-pot aqueous-phase synthesis of PdAu bimetallic nanoparticles with different Pd/Au ratio. The synthesis was conducted by co-reduction of Pd and Au precursor using ascorbic acid as a reducing agent and in the presence of polyallylamine hydrochloride (PAH). By high-angle annular dark field scanning transmission electron microscopy (HAADF-STEM) and energy-dispersive X-ray spectrometry (EDS) analyses, we found that the synthesized nanoparticles had an onion-like core/shell/shell/shell structure with Au-rich core, Pd-rich shell, Au-rich shell, and Pd shell, respectively. We also investigated the catalytic performance of the synthesized PdAu nanoparticles toward hydrogen peroxide generation reaction.

• Applied Microscopy
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• 제33권1호
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• pp.17-23
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• 2003

습식 산화 분위기에서 vapor-solid process를 통해 금속 촉매를 사용하지 않고도 낮은 온도에서 산화 인듐나노선을 성공적으로 합성하였다. 나노선은 x-선 회절(XRD), 분산 x-선 분광 분석기(EDS)를 갖춘 주사전자현미경(SEM), 투과전자현미경(TEM)을 통해 분석되었다. XRD 결과는 합성된 산화 인듐 나노선이 입방정 구조를 갖는다는 것을 보여준다. 이러한 나노선들은 두 가지 형태를 갖는다. 하나는 줄기에 약 500 nm 크기의 각진 나노입자가 형성된 형태이고 다른 하나는 나노입자가 형성되지 않은 형태이다. 나노선의 길이는 수 마이크로미터 범위이고, 두께는 약 10 nm에서 250 nm 범위이다. 나노선은 결함을 포함하지 않았으며 표면에 5 nm 이하의 비정질 층을 가지고 있었다. TEM 분석 결과 대부분의 나노선의 성장 방향은 <100> 방향이었으나 나노입자를 포함한 나노선은 <110> 방향으로 자랐다는 것이 발견되었다. 이러한 성장 방향은 이전의 문헌에서 보고되지 않은 새로운 결과이다. 일반적인 성장 방향과는 다른 새로운 방향으로 나노선이 자랄 수 있었던 것은 본 연구에서 산화물 합성 시 산소의 공급원으로 사용된 습식 분위기와 비교적 낮은 온도가 원인인 것으로 생각된다. 따라서 습식 산화 분위기에서의 나노선 합성법을 다른 여러 산화물의 나노선 합성에 응용한다면 낮은 온도에서 새로운 형태 및 성장 방향을 갖는 나노선을 얻을 수 있을 것으로 예상된다.

• 한국재료학회지
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• 제4권6호
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• pp.644-650
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• 1994

Electrohydrodynamic Atomization 급냉응고장치를 이용하여 고순도 실리콘 미세분말을 제조하여 투과전자현미경으로 미세조직과 그 응고상을 조사한 결과 직경이 60nm 이하인 분말에서 비장질상이 발견되었다. 비정질 실리콘의 원자구조를 분석하기 위하여 비정질 분말에서 얻은 전자회절 데이타를 이용하여 radial distribution function을 계산하여 해석한 결과, 실리콘의 결정구조인 다이아몬드 입방격자에서 발견되는 기본적 정사면체 배열이 비정질 실리콘의 2번째 근접원자간 거기까지 유지됨을 알 수 있었으며 이로부터 비정질 실리\ulcorner이 단범위 규칙성을 갖는 tetrahedrally coordinated random network 원자배열로 이루어짐을 알았다.

• 공업화학
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• 제3권1호
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• pp.24-34
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• 1992

이원금속 촉매의 작용원리와 응용에 대한 최근의 연구를 고찰하였다. 이원금속 촉매는 납사접촉개질반응, CO 수소환원반응 및 자동차 3원촉매 전환반응 등에 공업적으로 크게 영향을 미쳤다. 이들 반응에 대찬 이원금속 촉매의 작용은 "ensemble", 전자적인 영향 및 표면 구조적인 면으로 설명될 수 있다. 첨가 금속의 작용을 잘 평가하기 위하여 다양한 금속쌍 조합이 고려되었다. 또한 촉매의 선택성을 조절하기 위해서는 표면에 한 금속이 더 편중되는 것이 밝혀졌다. 일반적으로 담지촉매 제조과정상의 여러 요인들의 영향에 대해서도 특별히 TPR법같은 방법에 의해 명확해졌다. 이원금속 촉매의 구조에 관한 정보는 화학흡착이나 반응속도 측정같은 화학적 방법이나 EXAFS, STEM 및 Xe-NMR 같은 물리적 방법에 의해서 얻어지고 있다.

• 한국재료학회지
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• 제22권4호
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• pp.202-206
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• 2012

$CoSi_2$ was formed through annealing of atomic layer deposition Co thin films. Co ALD was carried out using bis(N,N'-diisopropylacetamidinato) cobalt ($Co(iPr-AMD)_2$) as a precursor and $NH_3$ as a reactant; this reaction produced a highly conformal Co film with low resistivity ($50\;{\mu}{\Omega}cm$). To prevent oxygen contamination, $ex-situ$ sputtered Ti and $in-situ$ ALD Ru were used as capping layers, and the silicide formation prepared by rapid thermal annealing (RTA) was used for comparison. Ru ALD was carried out with (Dimethylcyclopendienyl)(Ethylcyclopentadienyl) Ruthenium ((DMPD)(EtCp)Ru) and $O_2$ as a precursor and reactant, respectively; the resulting material has good conformality of as much as 90% in structure of high aspect ratio. X-ray diffraction showed that $CoSi_2$ was in a poly-crystalline state and formed at over $800^{\circ}C$ of annealing temperature for both cases. To investigate the as-deposited and annealed sample with each capping layer, high resolution scanning transmission electron microscopy (STEM) was employed with electron energy loss spectroscopy (EELS). After annealing, in the case of the Ti capping layer, $CoSi_2$ about 40 nm thick was formed while the $SiO_x$ interlayer, which is the native oxide, became thinner due to oxygen scavenging property of Ti. Although Si diffusion toward the outside occurred in the Ru capping layer case, and the Ru layer was not as good as the sputtered Ti layer, in terms of the lack of scavenging oxygen, the Ru layer prepared by the ALD process, with high conformality, acted as a capping layer, resulting in the prevention of oxidation and the formation of $CoSi_2$.

• 한국표면공학회지
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• 제50권5호
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• pp.339-344
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• 2017

Highly corrosion resistance performance of CrAlSiN coatings were obtained by applying ultrathin $Al_2O_3$ thin films using atomic layer deposition (ALD) method. CrAlSiN coatings were prepared on Cr adhesion layer/SUS304 substrates by a hybrid coating system of arc ion plating and high power impulse magnetron sputtering (HiPIMS) method. And, ultrathin $Al_2O_3$ passivation layer was deposited on the CrAlSiN/Cr adhesion layer/SUS304 sample to protect CrAlSiN coatings by encapsulating the whole surface defects of coating using ALD. Here, the high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM) and energy dispersive X-ray spectrometry (EDX) analysis revealed that the ALD $Al_2O_3$ thin films uniformly covered the inner and outer surface of CrAlSiN coatings. Also, the potentiodynamic and potentiostatic polarization test revealed that the corrosion protection properties of CrAlSiN coatings/Cr/SUS304 sample was greatly improved by ALD encapsulation with 50 nm-thick $Al_2O_3$ thin films, which implies that ALD-$Al_2O_3$ passivation layer can be used as an effect barrier layer of corrosion.

• 대한금속재료학회지
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• 제48권4호
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• pp.297-304
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• 2010

The microstructure and hardness of $CO_2$ laser welds were investigated in the Ti-stabilized ferritic stainless steel 409L. The observed specimen was welded in a fully penetrated condition in which the power was 5 kW and the welding speed 5 m/min. The grain structure near the bond line of the laser welds was produced by epitaxial growth. The grain size was the largest in the fusion zone, and HAZ showed nearly the same grain size as that of the base metal. The HAZ microstructure consisted of subgrains and precipitates that were less than 100 nm in size and that were located along the subgrain boundaries. On the other hand, the hardness was the highest in the fusion zone due to the large amount of small precipitates present. These were composed of TiN, Ti(C,N) and $TiO_2$+Ti(C,N). The hardness decreased continuously from the fusion zone of the base metal. The HAZ hardness was slightly greater than that of the base metal due to the existence of subgrains and precipitates in the subgrain boundary.