• 전자공학회논문지A
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• 제28A권11호
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• pp.894-901
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• 1991

Contact-type linear image sensors have been fabricated by means of RF glow discharge decomposition method of silane and hydrogen mixtures. The dependences of the electrical and optical properties of these sensor on thickness, RF power, substrate temperature and ambient gas pressure have been investigated. the ITO/i-a-Si:H/Al structure film shows photosensitivity of 0.85 and photocurrent to dark current ratio ($I_{ph}/I_{d}$) of 150 at 5V bias voltage under 200${\mu}W/cm^[2}$ red light intensity. Under 200${\mu}W/cm^[2}$ green light intensity, the ratio is 100. In order to investigate photocarrier transport mechanism and to obtain ${\mu}{\gamma}$ product we have measured the I-V characteristics of these sensors favricated with several different deposition parameters under various light sources. The linear inage sensor for document reading has been operated under reverse bias condition with green light source, resulting in ${\mu}{\gamma}$ product of about 1.5$[\times}10^{-9}cm^{2}$/V.

• 한국표면공학회지
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• 제43권2호
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• pp.91-96
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• 2010

SCM440 steels were nitrided using pulsed dc plasma combined with inductively coupled plasma (ICP) generated by 13.56 MHz rf power in order to enhance case hardening depth. The case hardening depth was increased with rf power. The effective case-depth with ICP at 900 watt was as 1.6 times as that nitrided without ICP. The hardening depth was also increased up to 1.45 times. The compound layers formed on top surface were dense and thin when pulsed dc plasma was combined with ICP.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2000년도 하계학술대회 논문집 C
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• pp.2032-2034
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• 2000

The performance of ac plasma display panels (PDP) is influenced strongly by the surface glow discharge characteristics on the MgO thin films. This paper deals with the surface slew discharge characteristics and some physical properties of MgO thin films prepared by reactive RF planar unbalanced magnetron sputtering in connection with ac PDP. The samples prepared with the do bias voltage of -10V showed lower discharge voltage and lower erosion rate by ion bombardment than those samples prepared by conventional magnetron sputtering or E-beam evaporation. The main factor that improves the discharge characteristics by bias voltage is considered to be due to the morphology changes or crystal structure of the MgO thin film by ion bombardment during deposition process.

• 한국재료학회지
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• 제28권3호
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• pp.159-165
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• 2018

In order to increase the efficiency of the sputtering method widely used in thin film fabrication, a dc sputtering apparatus which supplies both high frequency and magnetic field from the outside was fabricated, and cobalt thin film was fabricated using this apparatus. The apparatus can independently control the applied voltage, the target-substrate distance, and the target current, which are important parameters in the sputtering method, so that a stable glow discharge is obtained even at a low gas pressure of $10^{-3}$ Torr. The fabrication conditions using the sputtering method were mainly performed in $Ar+O_2$ mixed gas containing about 0.6 % oxygen gas under various Ar gas pressures of 1 to 30 mTorr. The microstructure of Co thin films deposited using this apparatus was examined by electron diffraction pattern and X-ray techniques. The magnetic properties were investigated by measuring the magnetization curves. The microstructure and magnetic properties of Co thin films depend on the discharge gas pressure. The thin film fabricated at high gas pressure showed a columnar structure containing a large amount of the third phase in the boundary region and the thin film formed at low gas pressure showed little or no columnar structure. The coercivity in the plane was slightly larger than that in the latter case.

• 센서학회지
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• 제4권2호
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• pp.58-63
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• 1995

$SiH_{4}$와 $NH_{3}$의 RF 글로우방전 분해에 의한 PECVD법으로 a-SiNx:H박막을 제조하고 기판온도, RF 전력, 그리고 $NH_{3}/SiH_{4}$ 유량비 등의 변화에 따른 a-SiNx:H 박막의 유전상수와 광학적 밴드갭 등을 조사하였다. a-SiNx:H막의 유전상수와 광학적 밴드갭은 기판온도, RF 전력 및 $NH_{3}/SiH_{4}$ 유량비 등의 증착변수에 따라 크게 변화하였다. 기판온도가 증가할수록 a-SiNx:H막의 유전상수는 증가하였으며 광학적 밴드갭은 감소하였다. 기판온도, RF 전력, 가스압력, $NH_{3}/SiH_{4}$ 유량비 및 두께를 각각 $250^{\circ}C$, 20 W, 500 mTorr, 10 및 $1500\;{\AA}$로 하였을 때 a-SiNx:H막의 유전상수, 절연파괴전장 및 광학적 밴드갭은 각각 4.3, 1 MV/cm 및 2.9 eV로 나타났다.

• 접착 및 계면
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• 제6권3호
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• pp.1-9
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• 2005

본 연구에서는 대기압 플라스마 공정으로 표면 처리 시 PMMA 시편의 표면 자유 에너지에 영향을 주는 인자인 radio frequency (RF) 플라즈마 전압(W), 처리시간(s), 방전 글로우와 시료와의 간격(mm) 그리고 아르곤 가스의 유량(LPM)에 대해 실험 계획법(Design of Experiment, DOE)을 적용한 최적화 실험을 실시하였다. 실험 결과, PMMA의 표면 자유 에너지 증가에 가장 큰 영향을 미치는 인자는 플라즈마 방전 글로우와 시료와의 간격(mm), 처리시간(t), 플라즈마 전압(W) 순으로 확인되었다. 또한 표면에 상호 영향을 미치는 플라즈마 전압과 처리시간에 대한 복합매개변수 형태의 power dose (J)에 따른 의존성을 확인했을 때 1500 J에서 최대의 표면 에너지 증가를 보임을 확인하였다. XPS, AFM 분석을 통해 플라즈마 처리 후 PMMA 표면에 새로운 관능기의 도입과 표면 거칠기 변화를 관찰하였다. 플라즈마 처리에 의한 PMMA plate의 표면 자유 에너지의 변화는 플라즈마 처리에 의한 관능기의 도입과 표면적의 변화에 영향을 받는 것으로 생각된다.

• 한국염색가공학회지
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• 제16권6호
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• pp.30-34
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• 2004

Polyacrylontrile fiber was modified with argon low temperature plasma by RF glow discharge at 240 mTorr, 40 W to investigate the surface morphological changes and mechanical characteristics such as elongation, tenacity, and modulus. Analysis of the SEM images revealed that the plasma treatment resulted in significant ablation on the surfaces rendering a severe crack formation. The morphological changes were evident with short treatment time of argon plasma although longer treatment time damaged the surface more severely. The mechanical characteristics such as tenacity and elongation were deteriorated due to the plasma treatment. The tenacity of the fiber treated with argon-plasma for 5 min showed a decreased value up to 21.9 % when compared to the untreated fiber. While the corresponding initial modulus(0 - 1 %) increased markedly up to 44.3 %.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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• pp.644-647
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• 2004

Recently, the environmental problem has received considerable attention. so, many lamps have been developing for environmental requirement and energy efficiency, also, at glow discharge lamp researchers try to reduce energy spending that is power saving lamp. this kind requirement agree with strong points of electrodeless fluorescent lamp has received to now lighting sauce. In this paper, at the research and development of Electrodeless Fluorescent Lamp phase, according to ferrite C.F.D(Computational Fluid Dynamics) Simulation and lamp brightness character are measured to find optimization design requirements of RF antenna which is impotent for emission of lamp.

• Macromolecular Research
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• 제10권5호
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• pp.273-277
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• 2002

Ultra-thin polymer films containing cobalt(II) meso-tetraphenylporphyrin(CoTPP) have been prepared by vacuum codeposition of the metal complex and trans-2-butene as an organic monomer using an inductively coupled RF glow discharge operating at 7-9 Watts. The polymer films were characterized by sorption measurements. Sorption data obtained for polymer films containing CoTPP indicate that the CoTPP molecules are capable of reversibly binding oxygen molecules. It was found that the adjacent CoTPP molecules in the aggregated metal complex phase could irreversibly share the oxygen molecules. A dispersion of the metal complex molecules in the polymer matrix was made to maintain the reversible reactivity of the metal complex molecules with oxygen in the polymer films via vacuum evaporation process. The Henry mode solubility constant, the Langmuir mode capacity constant, the amount of binding oxygen, and the dissociation equilibrium in the dual mode sorption theory were discussed.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1987년도 전기.전자공학 학술대회 논문집(I)
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• pp.497-500
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• 1987

Photoconductive properties of B-doped hydrogenated amorphous silicon thin films prepared by the RF glow discharge decomposition of $SiH_4-B_2H_6$ gas mixtures have been investigated. Experimental results showed that the B-doped hydrogenated amorphous silicon thin films have high photosensitivity and good optical absorption. Therefore these thin films can be used for the photoconductive layer of the vidicon target.