• 반도체디스플레이기술학회지
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• 제17권4호
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• pp.97-100
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• 2018

$NF_3$ Plasma etching of silicon was conducted by injecting only $NF_3$ gas into reactive ion etching. $NF_3$ Plasma etching was done in intermediate pressure. Silicon etching by $NF_3$ plasma in reactive ion etching was diagnosed through residual gas analyzer and optical emission spectroscopy. In plasma etching, optical emission spectroscopy is generally used to know what kinds of species in plasma. Also, residual gas analyzer is mainly to know the byproducts of etching process. Through experiments, the results of optical emission spectroscopy during silicon etching by $NF_3$ plasma was analyzed with connecting the results of etch rate of silicon and residual gas analyzer. It was confirmed that $NF_3$ plasma etching of silicon in reactive ion etching accords with the characteristic of reactive ion etching.

• 한국진공학회지
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• 제17권4호
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• pp.262-269
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• 2008

진공시스템 안의 잔류가스를 측정하여 공정제어에 이용되는 잔류가스분석기의 주요부품인 이온원, 사중극자질량분석기, 이온검출부의 작동원리와 사용 상 발생될 수 있는 문제점 및 가능한 해결방법을 소개한다.

• 전기학회논문지
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• 제68권1호
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• pp.102-107
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• 2019

This paper proposes a method to improve the mass spectral detection performance of the residual gas analyzer. By improving the mode estimation method for setting the threshold value and improving the additive noise elimination method, it is possible to detect mass spectrums having low peak values of the threshold level difficult to distinguish from noise. Ion signal blocks for each mass index with noise removed by the improved method are effective for eliminating invalid ion signals based on the linear and quadratic fittings. The mass spectrum can be obtained from the quadratic fitted curves for the reconstructed ion signal block using only the valid ion signals. In addition, the resolution of the mass spectrum can be improved by correcting the error caused by the shift of the spectral peak position. To verify the performance of the proposed method, computer simulations were performed using real ion signals obtained from the residual gas analysis system under development. The simulation results show that the proposed method is valid.

• 한국진공학회지
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• 제16권2호
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• pp.91-98
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• 2007

한국표준과학연구원 진공기술센터에서 잔류기체분석기 교정장치를 개발하였으며, 이 장치를 이용하여 서로 다른 구조를 가진 두개의 사중극 질량분석기 (quadrupole mass spectrometer)의 질소, 아르곤, 헬륨에 대한 기체감도를 측정하였다. 그 결과 기체감도는 QMS 구조와 상관없이 기체의 질량이 클수록 높게 나타났고 압력에 따라서도 다른 특성을 보였으므로 정확한 사용을 위해서는 기체감도를 꼭 보정해야 함을 알 수 있었다.

• 반도체디스플레이기술학회지
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• 제23권2호
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• pp.129-134
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• 2024

This study aims to talk about the necessity of solving the PFC gas emission problem raised by the recent development of the semiconductor industry and the remote plasma source method monitoring system used in the semiconductor industry. The 'monitoring system' means that the researchers applied machine learning to the existing monitoring technology and modeled it. In the process of this study, Residual Gas Analyzer monitoring technology and linear regression model were used. Through this model, the researchers identified emissions of at least 12700mg CO2 to 75800mg CO2 with values ranging from ion current 0.6A to 1.7A, and expect that the 'monitoring system' will contribute to the effective calculation of greenhouse gas emissions in the semiconductor industry in the future.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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• pp.104.2-104.2
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• 2013

A residual gas analyzer (RGA) system has been developed in this laboratory. Characteristics of the RGA system parts such as ion source, quadrupole mass filter and sensitivity are introduced. Some efforts have been made to improve performance of the two types of ion sources, open ion source (OIS) and closed ion source (CIS). A metal mesh was placed onto the electron beam entrance of the CIS anode tube to block the filament field penetration. Sensitivity of the CIS ion sources with and without the mesh was compared by mass spectra of SF6 gas (97% He base) introduced into the CIS anode through a needle valve. About ten-times improvement in the RGA sensitivity was observed for the CIS with the mesh in the electron entrance. Computer simulation showed an axi-symmetric anode potential distribution and improved focusing of the electron beam inside the anode tube with the mesh.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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• pp.50-50
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• 2000

당사는 1970년 제우스 콤 상사로부터 출발하여 1988년 12우러 주식회사 제우스로 법인 전환한 후 현재 한국반도체 산업협회 및 회원으로 등록 활동하고 있다. 이번 발표에서는 회사에 대한 소개와 함께 취급품목을 설명하고자 한다. 취급품목은 Ion beam sources(CSC), E-beam evaporator & E-beam source(Temescal), Residual Gas Analyzer(SPECTRA), Cryopump & Waterpump(CTI-Cryogenics), Thickness Monitor & Controller, Electrical Feedthrough, RTP system, Thin Film Analyzer, PECVD, RIE 등이다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.51-51
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• 2008

Carbon nanotubes (CNTs) have long been reported as an ideal material due to their excellent electrical conductivity and chemical and mechanical stability as well as their high aspect ratios for field emission devices. CNT emitters made by screen printing the organic binder-based CNT paste may act as a source to release gases inside a vacuum panel. These residual gases may cause a catastrophic damage by electrical arcing or ion bombardment to the vacuum microelectronic devices and may change their physical or electrical properties by adsorbing on the CNT emitter surface. In this study, we analyzed the composition of residual gases inside the vacuum-sealed panel by residual gas analyzer (RGA), investigating the effects of individual gases of different kinds at several pressures on the field emission characteristics of CNT emitters. The residual gases included $H_2$, CO, $CO_2$, $N_2$, $CH_4$, $H_2O$, $C_2H_6$, and Ar. Effect of residual gases on the field emission was studied by observing the variation of the pulse voltages with the duty ratio of3.3% to keep the constant emission current of $28{\mu}A$. Each gas species was introduced to a vacuum chamber up to three different pressures ($5\times10^{-7}$, $5\times10^{-6}$, and $5\times10^{-5}$ torr) each for 1 h while electron emission was continued. The three different pressure regions were separated by keeping a high vacuum of $\sim10^{-8}$ torr for a 1 h. The emission was terminated 6 h after the third gas exposure was completed. Field emission characteristics under residual gases will be discussed in terms of their adsorption and desorption on the surface of CNTs and the resultant change of work function.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제37회 하계학술대회 초록집
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• pp.217-217
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• 2009

• 한국진공학회지
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• 제17권1호
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• pp.1-8
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• 2008

포항가속기연구소 저장링에 설치된 방사광 차단용 진공부품에서 냉각수가 누설되었을 때의 진공도 분포, 압력 변화, 잔류 기체의 변화 등을 측정하여 그 특성을 분석하였다. 냉각수 누설 시에 압력 상승은 국부적으로 나타났으며 잔류 기체의 변화 양상은 누설 위치로부터 잔류기체 분석기까지 거리와 이온펌프 및 전자빔의 On/Off에 따라서 크게 달랐으며 특정 기체의 선택적 상승도 나타났다. 냉각수 누설의 발견은 전압변화 측정으로 가능하였으며 잔류기체 분석기로는 물분자를 직접 측정하기보다는 $CH_4$, CO, NO 등 특성 기체의 증가를 분석함으로 누설 여부를 판단할 수 있었다.