ITO Wet Etch Properties in an In-line Wet Etch/Cleaning System by using an Alternating Movement of Substrate (기판의 왕복 운동을 이용한 인라인 식각세정장치 내 ITO 식각특성)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.21 no.8
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- pp.715-718
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- 2008