• Title/Summary/Keyword: random access memory

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Random Access Memory utilizing Spin Tunneling Giant Magnetoresistance Effect (스핀 터널링 거대자기저항 효과를 이용한 랜덤 엑세스 메모리)

  • 박승영;최연봉;조순철
    • Proceedings of the IEEK Conference
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    • 1999.06a
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    • pp.950-953
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    • 1999
  • Spin tunneling giant magnetoresistance effect was studied to utilize in the application of random access memory. Ferromagnetic/Insulator/Ferromagnetic films were sputtered on glass substrates and perpendicular current was applied. Measurements of magneto- resistance of the junction showed 8.6% of MR ratio. Voltage output depends on the magnetization directions of the write line and read line, thus enabling the system to be used as a random access memory

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Technology of MRAM (Magneto-resistive Random Access Memory) Using MTJ(Magnetic Tunnel Junction) Cell

  • Park, Wanjun;Song, I-Hun;Park, Sangjin;Kim, Teawan
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.2 no.3
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    • pp.197-204
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    • 2002
  • DRAM, SRAM, and FLASH memory are three major memory devices currently used in most electronic applications. But, they have very distinct attributes, therefore, each memory could be used only for limited applications. MRAM (Magneto-resistive Random Access Memory) is a promising candidate for a universal memory that meets all application needs with non-volatile, fast operational speed, and low power consumption. The simplest architecture of MRAM cell is a series of MTJ (Magnetic Tunnel Junction) as a data storage part and MOS transistor as a data selection part. To be a commercially competitive memory device, scalability is an important factor as well. This paper is testing the actual electrical parameters and the scaling factors to limit MRAM technology in the semiconductor based memory device by an actual integration of MRAM core cell. Electrical tuning of MOS/MTJ, and control of resistance are important factors for data sensing, and control of magnetic switching for data writing.

Design of Asynchronous Nonvolatile Memory Module using Self-diagnosis Function (자기진단 기능을 이용한 비동기용 불휘발성 메모리 모듈의 설계)

  • Shin, Woohyeon;Yang, Oh;Yeon, Jun Sang
    • Journal of the Semiconductor & Display Technology
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    • v.21 no.1
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    • pp.85-90
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    • 2022
  • In this paper, an asynchronous nonvolatile memory module using a self-diagnosis function was designed. For the system to work, a lot of data must be input/output, and memory that can be stored is required. The volatile memory is fast, but data is erased without power, and the nonvolatile memory is slow, but data can be stored semi-permanently without power. The non-volatile static random-access memory is designed to solve these memory problems. However, the non-volatile static random-access memory is weak external noise or electrical shock, data can be some error. To solve these data errors, self-diagnosis algorithms were applied to non-volatile static random-access memory using error correction code, cyclic redundancy check 32 and data check sum to increase the reliability and accuracy of data retention. In addition, the possibility of application to an asynchronous non-volatile storage system requiring reliability was suggested.

SPIN ENGINEERING OF FERROMAGNETIC FILMS VIA INVERSE PIEZOELECTRIC EFFECT

  • Lee, Jeong-Won;Shin, Sung-Chul;Kim, Sang-Koog
    • Proceedings of the Korean Magnestics Society Conference
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    • 2002.12a
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    • pp.188-189
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    • 2002
  • One of the current goals in memory device developments is to realize a nonvolatile memory, i.e., the stored information maintains even when the power is turned off. The representative candidates for nonvolatile memories are magnetic random access memory (MRAM) and ferroelectric random access memory (FRAM). In order to achieve a high density memory in MRAM device, the external magnetic field should be localized in a tiny cell to control the direction of spontaneous magnetization. (omitted)

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An Overview of SiC as the Nonvolatile Random-Access Memory Material

  • Cheong, Kuan Yew
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.63-66
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    • 2004
  • The extraordinary intrinsic properties of SiC have made this material a suitable choice to use in high temperature, high frequency, and high voltage applications. In additional to these, SiC could be employed as the based material for nonvolatile memory applications, mainly due to its extremely low thermal-generation rate at room temperature. In this paper, the reasons of using this material in this particular application is presented and the development of the application over the past fifteen years is reviewed.

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Dynamic Data Migration in Hybrid Main Memories for In-Memory Big Data Storage

  • Mai, Hai Thanh;Park, Kyoung Hyun;Lee, Hun Soon;Kim, Chang Soo;Lee, Miyoung;Hur, Sung Jin
    • ETRI Journal
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    • v.36 no.6
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    • pp.988-998
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    • 2014
  • For memory-based big data storage, using hybrid memories consisting of both dynamic random-access memory (DRAM) and non-volatile random-access memories (NVRAMs) is a promising approach. DRAM supports low access time but consumes much energy, whereas NVRAMs have high access time but do not need energy to retain data. In this paper, we propose a new data migration method that can dynamically move data pages into the most appropriate memories to exploit their strengths and alleviate their weaknesses. We predict the access frequency values of the data pages and then measure comprehensively the gains and costs of each placement choice based on these predicted values. Next, we compute the potential benefits of all choices for each candidate page to make page migration decisions. Extensive experiments show that our method improves over the existing ones the access response time by as much as a factor of four, with similar rates of energy consumption.

Electrical characteristic of Phase-change Random Access Memory with improved bottom electrode structure (하부전극 구조 개선에 의한 상변화 메모리의 전기적 특성)

  • Kim, Hyun-Koo;Choi, Hyuk;Cho, Won-Ju;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.11a
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    • pp.69-70
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    • 2006
  • A detailed Investigation of cell structure and electrical characteristic in chalcogenide-based phase-change random access memory(PRAM) devices is presented. We used compound of Ge-Sb-Te material for phase-change cell. A novel bottom electrode structure and manufacture are described. We used heat radiator structure for improved reset characteristic. A resistance change measurement is performed on the test chip. From the resistance change, we could observe faster reset characteristic.

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Impact of gate protection silicon nitride film on the sub-quarter micron transistor performances in dynamic random access memory devices

  • Choy, J.-H.
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.14 no.2
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    • pp.47-49
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    • 2004
  • Gate protection $SiN_x$ as an alternative to a conventional re-oxidation process in Dynamic Random Access Memory devices is investigated. This process can not only protect the gate electrode tungsten against oxidation, but also save the thermal budget due to the re-oxidation. The protection $SiN_x$ process is applied to the poly-Si gate, and its device performance is measured and compared with the re-oxidation processed poly-Si gate. The results on the gate dielectric integrity show that etch damage-curing capability of protection $SiN_x$ is comparable to the re-oxidation process. In addition, the hot carrier immunity of the $SiN_x$ deposited gate is superior to that of re-oxidation processed gate.

A Finite Element Model for Bipolar Resistive Random Access Memory

  • Kim, Kwanyong;Lee, Kwangseok;Lee, Keun-Ho;Park, Young-Kwan;Choi, Woo Young
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.14 no.3
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    • pp.268-273
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    • 2014
  • The forming, reset and set operation of bipolar resistive random access memory (RRAM) have been predicted by using a finite element (FE) model which includes interface effects. To the best of our knowledge, our bipolar RRAM model is applicable to realistic cell structure optimization because our model is based on the FE method (FEM) unlike precedent models.

X-ray Photoelectron Spectroscopic Study of $Ge_{2}Sb_{2}Te_{5}$ and Its Etch Characteristics in Fluorine Based Plasmas

  • Jeon, Min-Hwan;Gang, Se-Gu;Park, Jong-Yun;Yeom, Geun-Yeong
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2009.05a
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    • pp.110-110
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    • 2009
  • 최근 차세대 비휘발성 메모리(NVM) 기술은 메모리의 성능과 기존의 한계점을 효과적으로 극복하며 활발한 연구를 통해 비약적으로 발전하고 있으며 특히, phase-change random access memory (PRAM)은 ferroelectric random access memory (FeRAM)과 magneto-resistive random access memory (MRAM)과 같은 다른 NVM 소자와 비교하여 기존의 DRAM과 구조적으로 비슷하고 상용화가 빠르게 진행될 수 있을 것으로 예상되는 바, PRAM에 사용되는 상변화 물질의 식각을 수행하고 X-ray photoelectron spectroscopy (XPS)를 통해 표면의 열화현상을 관찰하였다.

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