Etch characteristics of ITO(Indium Tin Oxide)using ${SF_6}/{O_2}$ -gas ECR(Electron Cyclotron Resonance) plasmas
(ECR을 이용한 ${SF_6}/{O_2}$ 가스 플라즈마에 의한 ITO의 식각 특성연구)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.13 no.7
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- pp.563-567
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- 2000